JPS61147525A - 荷電粒子線応用装置 - Google Patents

荷電粒子線応用装置

Info

Publication number
JPS61147525A
JPS61147525A JP60278916A JP27891685A JPS61147525A JP S61147525 A JPS61147525 A JP S61147525A JP 60278916 A JP60278916 A JP 60278916A JP 27891685 A JP27891685 A JP 27891685A JP S61147525 A JPS61147525 A JP S61147525A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
deflection
amount
distortion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60278916A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6340018B2 (enExample
Inventor
Katsuhiro Kuroda
勝広 黒田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60278916A priority Critical patent/JPS61147525A/ja
Publication of JPS61147525A publication Critical patent/JPS61147525A/ja
Publication of JPS6340018B2 publication Critical patent/JPS6340018B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP60278916A 1985-12-13 1985-12-13 荷電粒子線応用装置 Granted JPS61147525A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60278916A JPS61147525A (ja) 1985-12-13 1985-12-13 荷電粒子線応用装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60278916A JPS61147525A (ja) 1985-12-13 1985-12-13 荷電粒子線応用装置

Publications (2)

Publication Number Publication Date
JPS61147525A true JPS61147525A (ja) 1986-07-05
JPS6340018B2 JPS6340018B2 (enExample) 1988-08-09

Family

ID=17603874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60278916A Granted JPS61147525A (ja) 1985-12-13 1985-12-13 荷電粒子線応用装置

Country Status (1)

Country Link
JP (1) JPS61147525A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5277573A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Magnetic field generating device
JPS5693253A (en) * 1979-12-27 1981-07-28 Fujitsu Ltd Electron beam deflecting device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5277573A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Magnetic field generating device
JPS5693253A (en) * 1979-12-27 1981-07-28 Fujitsu Ltd Electron beam deflecting device

Also Published As

Publication number Publication date
JPS6340018B2 (enExample) 1988-08-09

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