JPS5277573A - Magnetic field generating device - Google Patents
Magnetic field generating deviceInfo
- Publication number
- JPS5277573A JPS5277573A JP15331875A JP15331875A JPS5277573A JP S5277573 A JPS5277573 A JP S5277573A JP 15331875 A JP15331875 A JP 15331875A JP 15331875 A JP15331875 A JP 15331875A JP S5277573 A JPS5277573 A JP S5277573A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- generating device
- field generating
- responce
- fidelity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To provide generation of magnetic field in a good responce to frequency and on the axis of electron line with fidelity, by coating conductive material on the coil which has been wound on a bobbin formed of insulating material.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15331875A JPS5277573A (en) | 1975-12-24 | 1975-12-24 | Magnetic field generating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15331875A JPS5277573A (en) | 1975-12-24 | 1975-12-24 | Magnetic field generating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5277573A true JPS5277573A (en) | 1977-06-30 |
Family
ID=15559862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15331875A Pending JPS5277573A (en) | 1975-12-24 | 1975-12-24 | Magnetic field generating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5277573A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54128679A (en) * | 1978-03-29 | 1979-10-05 | Hitachi Ltd | Electron lens with deflector |
JPS585952A (en) * | 1981-07-03 | 1983-01-13 | Hitachi Ltd | Charged-particle focusing deflecting device |
JPS61147525A (en) * | 1985-12-13 | 1986-07-05 | Hitachi Ltd | Charged particle beam applying device |
JPH08124505A (en) * | 1994-10-27 | 1996-05-17 | Nikon Corp | Electromagnetic lens and manufacture thereof |
JP2005276819A (en) * | 2000-01-27 | 2005-10-06 | Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh | Objective lens for charged particle beam device |
WO2019043759A1 (en) * | 2017-08-28 | 2019-03-07 | 株式会社日立ハイテクノロジーズ | Multipole lens, aberration corrector using same, and charged particle beam device |
-
1975
- 1975-12-24 JP JP15331875A patent/JPS5277573A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54128679A (en) * | 1978-03-29 | 1979-10-05 | Hitachi Ltd | Electron lens with deflector |
JPS6244382B2 (en) * | 1978-03-29 | 1987-09-19 | Hitachi Ltd | |
JPS585952A (en) * | 1981-07-03 | 1983-01-13 | Hitachi Ltd | Charged-particle focusing deflecting device |
JPS61147525A (en) * | 1985-12-13 | 1986-07-05 | Hitachi Ltd | Charged particle beam applying device |
JPS6340018B2 (en) * | 1985-12-13 | 1988-08-09 | Hitachi Ltd | |
JPH08124505A (en) * | 1994-10-27 | 1996-05-17 | Nikon Corp | Electromagnetic lens and manufacture thereof |
JP2005276819A (en) * | 2000-01-27 | 2005-10-06 | Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh | Objective lens for charged particle beam device |
WO2019043759A1 (en) * | 2017-08-28 | 2019-03-07 | 株式会社日立ハイテクノロジーズ | Multipole lens, aberration corrector using same, and charged particle beam device |
US11004650B2 (en) | 2017-08-28 | 2021-05-11 | Hitachi High-Tech Corporation | Multipole lens, aberration corrector using the same, and charged particle beam apparatus |
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