JPS6113551Y2 - - Google Patents
Info
- Publication number
- JPS6113551Y2 JPS6113551Y2 JP10343481U JP10343481U JPS6113551Y2 JP S6113551 Y2 JPS6113551 Y2 JP S6113551Y2 JP 10343481 U JP10343481 U JP 10343481U JP 10343481 U JP10343481 U JP 10343481U JP S6113551 Y2 JPS6113551 Y2 JP S6113551Y2
- Authority
- JP
- Japan
- Prior art keywords
- heat
- heating element
- heating
- temperature
- cooling medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 20
- 239000002826 coolant Substances 0.000 claims description 8
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 108091008695 photoreceptors Proteins 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910018110 Se—Te Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10343481U JPS5812267U (ja) | 1981-07-14 | 1981-07-14 | 真空蒸着装置における支持体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10343481U JPS5812267U (ja) | 1981-07-14 | 1981-07-14 | 真空蒸着装置における支持体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5812267U JPS5812267U (ja) | 1983-01-26 |
| JPS6113551Y2 true JPS6113551Y2 (zh) | 1986-04-26 |
Family
ID=29898044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10343481U Granted JPS5812267U (ja) | 1981-07-14 | 1981-07-14 | 真空蒸着装置における支持体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5812267U (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1991009148A1 (en) * | 1989-12-11 | 1991-06-27 | Hitachi, Ltd. | Device for vacuum treatment and device for and method of film formation using said device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0329319Y2 (zh) * | 1984-09-21 | 1991-06-21 |
-
1981
- 1981-07-14 JP JP10343481U patent/JPS5812267U/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1991009148A1 (en) * | 1989-12-11 | 1991-06-27 | Hitachi, Ltd. | Device for vacuum treatment and device for and method of film formation using said device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5812267U (ja) | 1983-01-26 |
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