JPS6097676A - 半導体圧力センサ及びその製造方法 - Google Patents
半導体圧力センサ及びその製造方法Info
- Publication number
- JPS6097676A JPS6097676A JP58206334A JP20633483A JPS6097676A JP S6097676 A JPS6097676 A JP S6097676A JP 58206334 A JP58206334 A JP 58206334A JP 20633483 A JP20633483 A JP 20633483A JP S6097676 A JPS6097676 A JP S6097676A
- Authority
- JP
- Japan
- Prior art keywords
- pressure sensor
- diaphragm
- silicon
- semiconductor pressure
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/50—Devices controlled by mechanical forces, e.g. pressure
Landscapes
- Pressure Sensors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58206334A JPS6097676A (ja) | 1983-11-01 | 1983-11-01 | 半導体圧力センサ及びその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58206334A JPS6097676A (ja) | 1983-11-01 | 1983-11-01 | 半導体圧力センサ及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6097676A true JPS6097676A (ja) | 1985-05-31 |
JPH0510830B2 JPH0510830B2 (enrdf_load_stackoverflow) | 1993-02-10 |
Family
ID=16521576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58206334A Granted JPS6097676A (ja) | 1983-11-01 | 1983-11-01 | 半導体圧力センサ及びその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6097676A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5107309A (en) * | 1989-12-18 | 1992-04-21 | Honeywell Inc. | Double diffused leadout for a semiconductor device |
US5181417A (en) * | 1989-07-10 | 1993-01-26 | Nippon Soken, Inc. | Pressure detecting device |
US5302933A (en) * | 1991-09-27 | 1994-04-12 | Terumo Kabushiki Kaisha | Infrared sensor |
US5382823A (en) * | 1990-11-27 | 1995-01-17 | Terumo Kabushiki Kaisha | Semiconductor device and method for production thereof |
US5404125A (en) * | 1991-07-19 | 1995-04-04 | Terumo Kabushiki Kaisha | Infrared radiation sensor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58206335A (ja) * | 1982-05-18 | 1983-12-01 | ガ−バ−・サイエンテイフイツク・プロダクツ・インコ−ポレ−テツド | 真空ワ−クピ−スホルダ− |
JPS59169184A (ja) * | 1983-03-16 | 1984-09-25 | Nec Corp | 圧力センサの製造方法 |
JPS59172778A (ja) * | 1983-03-22 | 1984-09-29 | Nec Corp | 圧力センサの製造方法 |
-
1983
- 1983-11-01 JP JP58206334A patent/JPS6097676A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58206335A (ja) * | 1982-05-18 | 1983-12-01 | ガ−バ−・サイエンテイフイツク・プロダクツ・インコ−ポレ−テツド | 真空ワ−クピ−スホルダ− |
JPS59169184A (ja) * | 1983-03-16 | 1984-09-25 | Nec Corp | 圧力センサの製造方法 |
JPS59172778A (ja) * | 1983-03-22 | 1984-09-29 | Nec Corp | 圧力センサの製造方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5181417A (en) * | 1989-07-10 | 1993-01-26 | Nippon Soken, Inc. | Pressure detecting device |
US5107309A (en) * | 1989-12-18 | 1992-04-21 | Honeywell Inc. | Double diffused leadout for a semiconductor device |
US5382823A (en) * | 1990-11-27 | 1995-01-17 | Terumo Kabushiki Kaisha | Semiconductor device and method for production thereof |
US5404125A (en) * | 1991-07-19 | 1995-04-04 | Terumo Kabushiki Kaisha | Infrared radiation sensor |
US5302933A (en) * | 1991-09-27 | 1994-04-12 | Terumo Kabushiki Kaisha | Infrared sensor |
Also Published As
Publication number | Publication date |
---|---|
JPH0510830B2 (enrdf_load_stackoverflow) | 1993-02-10 |
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