JPS608241B2 - 光重合性組成物 - Google Patents

光重合性組成物

Info

Publication number
JPS608241B2
JPS608241B2 JP50061793A JP6179375A JPS608241B2 JP S608241 B2 JPS608241 B2 JP S608241B2 JP 50061793 A JP50061793 A JP 50061793A JP 6179375 A JP6179375 A JP 6179375A JP S608241 B2 JPS608241 B2 JP S608241B2
Authority
JP
Japan
Prior art keywords
groups
group
photosensitizer
ethylenically unsaturated
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50061793A
Other languages
English (en)
Japanese (ja)
Other versions
JPS511588A (en, 2012
Inventor
ウイリアム ゴ−ドン フロツドシヤム ト−マス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of JPS511588A publication Critical patent/JPS511588A/ja
Publication of JPS608241B2 publication Critical patent/JPS608241B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407Processes of polymerisation
    • C08F299/0421Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP50061793A 1974-05-23 1975-05-23 光重合性組成物 Expired JPS608241B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB23019/74A GB1494903A (en) 1974-05-23 1974-05-23 Photopolymerisable composition
GB23019/74 1974-05-23

Publications (2)

Publication Number Publication Date
JPS511588A JPS511588A (en, 2012) 1976-01-08
JPS608241B2 true JPS608241B2 (ja) 1985-03-01

Family

ID=10188787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50061793A Expired JPS608241B2 (ja) 1974-05-23 1975-05-23 光重合性組成物

Country Status (11)

Country Link
US (1) US4089762A (en, 2012)
JP (1) JPS608241B2 (en, 2012)
AT (1) AT338521B (en, 2012)
BE (1) BE829434R (en, 2012)
CH (1) CH612690A5 (en, 2012)
DE (1) DE2522756A1 (en, 2012)
FR (1) FR2273042B2 (en, 2012)
GB (1) GB1494903A (en, 2012)
IT (1) IT1046408B (en, 2012)
NL (1) NL7506015A (en, 2012)
SE (1) SE416957B (en, 2012)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2962442D1 (de) * 1978-07-13 1982-05-19 Ciba Geigy Ag Compositions photodurcissables
US4411625A (en) * 1980-08-29 1983-10-25 Dentsply Research & Development Corp. Broad spectrum light curable dental compositions
US4491453A (en) * 1980-08-29 1985-01-01 Dentsply Research & Development Corp. Process for restoring teeth with visible light curable compositions
US4553940A (en) * 1980-08-29 1985-11-19 Dentsply Research & Development Corp. Visible light curable dental compositions
JPS5784179A (en) * 1980-11-13 1982-05-26 Nec Corp Semiconductor memory device
JPS57133680A (en) * 1981-02-12 1982-08-18 Toshiba Corp Nonvolatile semiconductor memory storage
US4801528A (en) * 1981-05-04 1989-01-31 Dentsply Research & Development Corporation Dental adhesive system
DE3301011A1 (de) * 1983-01-14 1984-07-19 Kulzer & Co GmbH, 6393 Wehrheim Verfahren zur photopolymerisation von vinylverbindungen und photopolymerisierbares material (ii)
DE3301010A1 (de) * 1983-01-14 1984-07-19 Kulzer & Co GmbH, 6393 Wehrheim Verfahren zur photopolymerisation von vinylverbindungen und photopolymerisierbares material
US4544467A (en) * 1983-06-28 1985-10-01 Minnesota Mining And Manufacturing Company Light-curable dentin and enamel adhesive
DE3331157A1 (de) * 1983-08-30 1985-03-14 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischungen, enthaltend tertiaere amine als photoaktivatoren
JPH0610886B2 (ja) * 1984-11-01 1994-02-09 株式会社リコー 光情報記録媒体
EP0310304B1 (en) * 1987-10-02 1993-11-18 Nippon Oil And Fats Company, Limited Visible light-curing polyester resin composition
US5254602A (en) * 1988-10-01 1993-10-19 Nippon Oil & Fats Co., Ltd. Curability-imparting composition, method for curing with said composition, and method for production of glass fiber-reinforced plastic
GB8908215D0 (en) * 1989-04-12 1989-05-24 Ici Plc Prosthetic device
US5222987A (en) * 1989-04-12 1993-06-29 Imperial Chemical Industries Plc Composite material for use in a prosthetic device
GB2237023B (en) * 1989-10-06 1993-09-29 Toa Gosei Chem Ind A catalytic composition for photopolymerization and a photopolymerizable composition containing the same
US6204302B1 (en) 1998-11-20 2001-03-20 Bisco, Inc. Photosensitizers for free radical polymerization initiation resins and method of making the same
WO2003091288A1 (en) * 2002-04-26 2003-11-06 Albemarle Corporation A new class of amine coinitiators in photoinitiated polymerizations
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
US20230051188A1 (en) * 2019-12-18 2023-02-16 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB861429A (en) * 1958-07-23 1961-02-22 Miehle Goss Dexter Inc Improvements in quick-drying vehicles for coating materials
US3450613A (en) * 1964-03-09 1969-06-17 Bausch & Lomb Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers
US3551311A (en) * 1967-11-24 1970-12-29 Sun Chemical Corp Radiation-curable compositions
US3759807A (en) * 1969-01-28 1973-09-18 Union Carbide Corp Photopolymerization process using combination of organic carbonyls and amines
US3864133A (en) * 1970-08-11 1975-02-04 Dainippon Ink & Chemicals Photo-polymerizable compositions
US3903322A (en) * 1974-03-07 1975-09-02 Continental Can Co Photopolymerizable ethylenically unsaturated compounds photoinitiated with benzoyl derivatives of diphenyl sulfide and an organic amine compound

Also Published As

Publication number Publication date
BE829434R (fr) 1975-11-24
NL7506015A (nl) 1975-11-25
SE416957B (sv) 1981-02-16
DE2522756A1 (de) 1975-11-27
FR2273042A2 (en, 2012) 1975-12-26
CH612690A5 (en, 2012) 1979-08-15
GB1494903A (en) 1977-12-14
AT338521B (de) 1977-08-25
IT1046408B (it) 1980-06-30
ATA389275A (de) 1976-12-15
AU8143175A (en) 1976-11-25
JPS511588A (en, 2012) 1976-01-08
FR2273042B2 (en, 2012) 1979-03-02
SE7505842L (sv) 1975-11-24
US4089762A (en) 1978-05-16

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