JPS6074435A - Ｍｏｓ型電界効果トランジスタの製造方法 - Google Patents

Ｍｏｓ型電界効果トランジスタの製造方法

Info

Publication number
JPS6074435A
JPS6074435A JP59183892A JP18389284A JPS6074435A JP S6074435 A JPS6074435 A JP S6074435A JP 59183892 A JP59183892 A JP 59183892A JP 18389284 A JP18389284 A JP 18389284A JP S6074435 A JPS6074435 A JP S6074435A
Authority
JP
Japan
Prior art keywords
mask
alignment
pattern
forming
diffusion layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59183892A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6132809B2 (Direct
Inventor
Mitsuharu Kodaira
小平　光治
Keiko Hayashi
林　けい子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP59183892A priority Critical patent/JPS6074435A/ja
Publication of JPS6074435A publication Critical patent/JPS6074435A/ja
Publication of JPS6132809B2 publication Critical patent/JPS6132809B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59183892A 1984-09-03 1984-09-03 Ｍｏｓ型電界効果トランジスタの製造方法 Granted JPS6074435A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59183892A JPS6074435A (ja) 1984-09-03 1984-09-03 Ｍｏｓ型電界効果トランジスタの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59183892A JPS6074435A (ja) 1984-09-03 1984-09-03 Ｍｏｓ型電界効果トランジスタの製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP50154219A Division JPS5854496B2 (ja) 1975-12-24 1975-12-24 半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62078250A Division JPS62271429A (ja) 1987-03-31 1987-03-31 Ｍｏｓ型電界効果トランジスタの製造方法

Publications (2)

Publication Number Publication Date
JPS6074435A true JPS6074435A (ja) 1985-04-26
JPS6132809B2 JPS6132809B2 (Direct) 1986-07-29

Family

ID=16143636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59183892A Granted JPS6074435A (ja) 1984-09-03 1984-09-03 Ｍｏｓ型電界効果トランジスタの製造方法

Country Status (1)

Country Link
JP (1) JPS6074435A (Direct)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6260223A (ja) * 1985-09-09 1987-03-16 Seiko Epson Corp 半導体装置
WO1999056308A1 (en) * 1998-04-28 1999-11-04 Nikon Corporation Exposure system and method of manufacturing micro device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63180710U (Direct) * 1987-05-14 1988-11-22
JPS6449713U (Direct) * 1987-09-24 1989-03-28
JPH0425012U (Direct) * 1990-06-26 1992-02-28
JPH06173918A (ja) * 1992-01-16 1994-06-21 Nifco Inc クリップ

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6260223A (ja) * 1985-09-09 1987-03-16 Seiko Epson Corp 半導体装置
WO1999056308A1 (en) * 1998-04-28 1999-11-04 Nikon Corporation Exposure system and method of manufacturing micro device
US6416912B1 (en) 1998-04-28 2002-07-09 Nikon Corporation Method of manufacturing microdevice utilizing combined alignment mark

Also Published As

Publication number Publication date
JPS6132809B2 (Direct) 1986-07-29

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