JPS6073536A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS6073536A
JPS6073536A JP58180464A JP18046483A JPS6073536A JP S6073536 A JPS6073536 A JP S6073536A JP 58180464 A JP58180464 A JP 58180464A JP 18046483 A JP18046483 A JP 18046483A JP S6073536 A JPS6073536 A JP S6073536A
Authority
JP
Japan
Prior art keywords
terpolymer
resist
methacrylic acid
pattern
methylhydroxystyrene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58180464A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0377990B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Seiji Akimoto
誠司 秋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58180464A priority Critical patent/JPS6073536A/ja
Publication of JPS6073536A publication Critical patent/JPS6073536A/ja
Publication of JPH0377990B2 publication Critical patent/JPH0377990B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58180464A 1983-09-30 1983-09-30 パタ−ン形成方法 Granted JPS6073536A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58180464A JPS6073536A (ja) 1983-09-30 1983-09-30 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58180464A JPS6073536A (ja) 1983-09-30 1983-09-30 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6073536A true JPS6073536A (ja) 1985-04-25
JPH0377990B2 JPH0377990B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-12-12

Family

ID=16083675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58180464A Granted JPS6073536A (ja) 1983-09-30 1983-09-30 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6073536A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58114032A (ja) * 1981-12-28 1983-07-07 Fujitsu Ltd パタ−ン形成方法
JPS58116532A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd パタ−ン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58114032A (ja) * 1981-12-28 1983-07-07 Fujitsu Ltd パタ−ン形成方法
JPS58116532A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd パタ−ン形成方法

Also Published As

Publication number Publication date
JPH0377990B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-12-12

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