JPS605508A - 半導体結晶薄膜の製造方法 - Google Patents
半導体結晶薄膜の製造方法Info
- Publication number
- JPS605508A JPS605508A JP11287783A JP11287783A JPS605508A JP S605508 A JPS605508 A JP S605508A JP 11287783 A JP11287783 A JP 11287783A JP 11287783 A JP11287783 A JP 11287783A JP S605508 A JPS605508 A JP S605508A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- thin film
- detected
- semiconductor
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11287783A JPS605508A (ja) | 1983-06-24 | 1983-06-24 | 半導体結晶薄膜の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11287783A JPS605508A (ja) | 1983-06-24 | 1983-06-24 | 半導体結晶薄膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS605508A true JPS605508A (ja) | 1985-01-12 |
JPH0142618B2 JPH0142618B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-09-13 |
Family
ID=14597762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11287783A Granted JPS605508A (ja) | 1983-06-24 | 1983-06-24 | 半導体結晶薄膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS605508A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63203814A (ja) * | 1987-02-18 | 1988-08-23 | Murata Mach Ltd | 紡糸捲取機 |
US5641419A (en) * | 1992-11-03 | 1997-06-24 | Vandenabeele; Peter | Method and apparatus for optical temperature control |
JP2008520096A (ja) * | 2004-11-12 | 2008-06-12 | アプライド マテリアルズ インコーポレイテッド | レーザベースアニーリングシステムにおける高温測定用の多重バンドパスフィルタリング |
US7985635B2 (en) | 1992-06-26 | 2011-07-26 | Semiconductor Energy Laboratory Co., Ltd. | Laser process |
-
1983
- 1983-06-24 JP JP11287783A patent/JPS605508A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63203814A (ja) * | 1987-02-18 | 1988-08-23 | Murata Mach Ltd | 紡糸捲取機 |
US7985635B2 (en) | 1992-06-26 | 2011-07-26 | Semiconductor Energy Laboratory Co., Ltd. | Laser process |
US5641419A (en) * | 1992-11-03 | 1997-06-24 | Vandenabeele; Peter | Method and apparatus for optical temperature control |
JP2008520096A (ja) * | 2004-11-12 | 2008-06-12 | アプライド マテリアルズ インコーポレイテッド | レーザベースアニーリングシステムにおける高温測定用の多重バンドパスフィルタリング |
Also Published As
Publication number | Publication date |
---|---|
JPH0142618B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-09-13 |