JPS6050168A - 光ｃｖｄによる固体薄膜の製造方法 - Google Patents

光ｃｖｄによる固体薄膜の製造方法

Info

Publication number
JPS6050168A
JPS6050168A JP58157554A JP15755483A JPS6050168A JP S6050168 A JPS6050168 A JP S6050168A JP 58157554 A JP58157554 A JP 58157554A JP 15755483 A JP15755483 A JP 15755483A JP S6050168 A JPS6050168 A JP S6050168A
Authority
JP
Japan
Prior art keywords
gas
reaction
light
window
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58157554A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0128830B2 (enExample
Inventor
Yoshihiro Hamakawa
圭弘 浜川
Masanori Okuyama
雅則 奥山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP58157554A priority Critical patent/JPS6050168A/ja
Publication of JPS6050168A publication Critical patent/JPS6050168A/ja
Publication of JPH0128830B2 publication Critical patent/JPH0128830B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP58157554A 1983-08-29 1983-08-29 光ｃｖｄによる固体薄膜の製造方法 Granted JPS6050168A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58157554A JPS6050168A (ja) 1983-08-29 1983-08-29 光ｃｖｄによる固体薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58157554A JPS6050168A (ja) 1983-08-29 1983-08-29 光ｃｖｄによる固体薄膜の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62069695A Division JPS6366924A (ja) 1987-03-23 1987-03-23 光ｃｖｄによる固体薄膜の製造装置

Publications (2)

Publication Number Publication Date
JPS6050168A true JPS6050168A (ja) 1985-03-19
JPH0128830B2 JPH0128830B2 (enExample) 1989-06-06

Family

ID=15652218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58157554A Granted JPS6050168A (ja) 1983-08-29 1983-08-29 光ｃｖｄによる固体薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS6050168A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62116771A (ja) * 1985-11-15 1987-05-28 Canon Inc 成膜装置
JPS62129060U (enExample) * 1986-02-10 1987-08-15
JPS63109173A (ja) * 1986-10-24 1988-05-13 Nec Corp 光化学気相成長装置
JPH01297820A (ja) * 1988-03-04 1989-11-30 Emcore Inc 基体へのフィルム被着装置およびその方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53126867A (en) * 1977-04-13 1978-11-06 Hitachi Ltd Cvd apparatus
JPS57187033A (en) * 1981-05-12 1982-11-17 Seiko Epson Corp Vapor phase chemical growth device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53126867A (en) * 1977-04-13 1978-11-06 Hitachi Ltd Cvd apparatus
JPS57187033A (en) * 1981-05-12 1982-11-17 Seiko Epson Corp Vapor phase chemical growth device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62116771A (ja) * 1985-11-15 1987-05-28 Canon Inc 成膜装置
JPS62129060U (enExample) * 1986-02-10 1987-08-15
JPS63109173A (ja) * 1986-10-24 1988-05-13 Nec Corp 光化学気相成長装置
JPH01297820A (ja) * 1988-03-04 1989-11-30 Emcore Inc 基体へのフィルム被着装置およびその方法

Also Published As

Publication number Publication date
JPH0128830B2 (enExample) 1989-06-06

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