JPS6047003A - プラズマ重合法及びその重合装置 - Google Patents

プラズマ重合法及びその重合装置

Info

Publication number
JPS6047003A
JPS6047003A JP15474983A JP15474983A JPS6047003A JP S6047003 A JPS6047003 A JP S6047003A JP 15474983 A JP15474983 A JP 15474983A JP 15474983 A JP15474983 A JP 15474983A JP S6047003 A JPS6047003 A JP S6047003A
Authority
JP
Japan
Prior art keywords
plasma
film
gas
composition
polymer film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15474983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0460122B2 (enrdf_load_stackoverflow
Inventor
Yoichi Murayama
洋一 村山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Research Development Corp of Japan
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan, Shingijutsu Kaihatsu Jigyodan filed Critical Research Development Corp of Japan
Priority to JP15474983A priority Critical patent/JPS6047003A/ja
Publication of JPS6047003A publication Critical patent/JPS6047003A/ja
Publication of JPH0460122B2 publication Critical patent/JPH0460122B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
JP15474983A 1983-08-26 1983-08-26 プラズマ重合法及びその重合装置 Granted JPS6047003A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15474983A JPS6047003A (ja) 1983-08-26 1983-08-26 プラズマ重合法及びその重合装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15474983A JPS6047003A (ja) 1983-08-26 1983-08-26 プラズマ重合法及びその重合装置

Publications (2)

Publication Number Publication Date
JPS6047003A true JPS6047003A (ja) 1985-03-14
JPH0460122B2 JPH0460122B2 (enrdf_load_stackoverflow) 1992-09-25

Family

ID=15591067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15474983A Granted JPS6047003A (ja) 1983-08-26 1983-08-26 プラズマ重合法及びその重合装置

Country Status (1)

Country Link
JP (1) JPS6047003A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62109803A (ja) * 1985-11-06 1987-05-21 Sumitomo Electric Ind Ltd 有機薄膜形成方法
JPS6320101A (ja) * 1986-07-15 1988-01-27 Sanyo Tokushu Seiko Kk 先端裂け防止圧延方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57182302A (en) * 1981-05-06 1982-11-10 Shuzo Hattori Apparatus for forming polymer film by plasma polymerization
JPS59193904A (ja) * 1983-04-18 1984-11-02 Matsushita Electric Ind Co Ltd 高分子薄膜形成装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57182302A (en) * 1981-05-06 1982-11-10 Shuzo Hattori Apparatus for forming polymer film by plasma polymerization
JPS59193904A (ja) * 1983-04-18 1984-11-02 Matsushita Electric Ind Co Ltd 高分子薄膜形成装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62109803A (ja) * 1985-11-06 1987-05-21 Sumitomo Electric Ind Ltd 有機薄膜形成方法
JPS6320101A (ja) * 1986-07-15 1988-01-27 Sanyo Tokushu Seiko Kk 先端裂け防止圧延方法

Also Published As

Publication number Publication date
JPH0460122B2 (enrdf_load_stackoverflow) 1992-09-25

Similar Documents

Publication Publication Date Title
EP0605534B1 (en) Apparatus for rapid plasma treatments and method
JPS6250472A (ja) パルス化プラズマ装置及び方法
US4032440A (en) Semipermeable membrane
JPS5645760A (en) Vapor growth method
JPS5940227B2 (ja) リアクティブスパッタリング方法
JPH0215171A (ja) 大気圧プラズマ反応方法
JPS6047003A (ja) プラズマ重合法及びその重合装置
US4696686A (en) Oxygen separating member and process for producing the same
JP2003300273A (ja) 表面処理方法及び真空表面処理装置
JPH03241739A (ja) 大気圧プラズマ反応方法
US9957618B2 (en) Single-unit reactor design for combined oxidative, initiated, and plasma-enhanced chemical vapor deposition
US4618507A (en) Method of making a capacitor winding
JPH0248626B2 (ja) Hakumakukeiseihohotosonosochi
JP4332919B2 (ja) ガスバリア材の製造方法
JPH01309954A (ja) 非多孔質の選択膜層の製造方法
JPS60238304A (ja) 薄膜形成方法
JPH0460123B2 (enrdf_load_stackoverflow)
TWI738306B (zh) 成膜裝置以及成膜方法
JPH01252782A (ja) プラズマｃｖｄ用高周波電源
JPS6039294B2 (ja) 基材上への重合体薄膜の生成方法
JPH06148651A (ja) 液晶表示素子
JPH02159018A (ja) 減圧式気相成長装置
JPS63249330A (ja) マイクロ波プラズマｃｖｄ装置
JPS59156427A (ja) プラズマ処理装置
JPS61246204A (ja) 表面処理方法