JPS6047003A - プラズマ重合法及びその重合装置 - Google Patents
プラズマ重合法及びその重合装置Info
- Publication number
- JPS6047003A JPS6047003A JP15474983A JP15474983A JPS6047003A JP S6047003 A JPS6047003 A JP S6047003A JP 15474983 A JP15474983 A JP 15474983A JP 15474983 A JP15474983 A JP 15474983A JP S6047003 A JPS6047003 A JP S6047003A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- film
- gas
- composition
- polymer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15474983A JPS6047003A (ja) | 1983-08-26 | 1983-08-26 | プラズマ重合法及びその重合装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15474983A JPS6047003A (ja) | 1983-08-26 | 1983-08-26 | プラズマ重合法及びその重合装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6047003A true JPS6047003A (ja) | 1985-03-14 |
JPH0460122B2 JPH0460122B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-09-25 |
Family
ID=15591067
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15474983A Granted JPS6047003A (ja) | 1983-08-26 | 1983-08-26 | プラズマ重合法及びその重合装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6047003A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62109803A (ja) * | 1985-11-06 | 1987-05-21 | Sumitomo Electric Ind Ltd | 有機薄膜形成方法 |
JPS6320101A (ja) * | 1986-07-15 | 1988-01-27 | Sanyo Tokushu Seiko Kk | 先端裂け防止圧延方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57182302A (en) * | 1981-05-06 | 1982-11-10 | Shuzo Hattori | Apparatus for forming polymer film by plasma polymerization |
JPS59193904A (ja) * | 1983-04-18 | 1984-11-02 | Matsushita Electric Ind Co Ltd | 高分子薄膜形成装置 |
-
1983
- 1983-08-26 JP JP15474983A patent/JPS6047003A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57182302A (en) * | 1981-05-06 | 1982-11-10 | Shuzo Hattori | Apparatus for forming polymer film by plasma polymerization |
JPS59193904A (ja) * | 1983-04-18 | 1984-11-02 | Matsushita Electric Ind Co Ltd | 高分子薄膜形成装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62109803A (ja) * | 1985-11-06 | 1987-05-21 | Sumitomo Electric Ind Ltd | 有機薄膜形成方法 |
JPS6320101A (ja) * | 1986-07-15 | 1988-01-27 | Sanyo Tokushu Seiko Kk | 先端裂け防止圧延方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0460122B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-09-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0605534B1 (en) | Apparatus for rapid plasma treatments and method | |
JPS6250472A (ja) | パルス化プラズマ装置及び方法 | |
JPS5645760A (en) | Vapor growth method | |
JPS5940227B2 (ja) | リアクティブスパッタリング方法 | |
JPH0215171A (ja) | 大気圧プラズマ反応方法 | |
JPS6047003A (ja) | プラズマ重合法及びその重合装置 | |
US4696686A (en) | Oxygen separating member and process for producing the same | |
JPH04269721A (ja) | 表面が改質されたポリマービーズ及びその製造方法 | |
US4618507A (en) | Method of making a capacitor winding | |
JPH0248626B2 (ja) | Hakumakukeiseihohotosonosochi | |
WO2013130380A1 (en) | Single-unit reactor design for combined oxidative, initiated, and plasma-enhanced chemical vapor deposition | |
JP4332919B2 (ja) | ガスバリア材の製造方法 | |
JPH01309954A (ja) | 非多孔質の選択膜層の製造方法 | |
JPS60238304A (ja) | 薄膜形成方法 | |
JPH0460123B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH03202467A (ja) | 高周波プラズマ素材プロセッシング装置 | |
TWI738306B (zh) | 成膜裝置以及成膜方法 | |
JPH01252782A (ja) | プラズマcvd用高周波電源 | |
JPS61163280A (ja) | プラズマ反応装置 | |
JPS6039294B2 (ja) | 基材上への重合体薄膜の生成方法 | |
JPH06148651A (ja) | 液晶表示素子 | |
JPH02159018A (ja) | 減圧式気相成長装置 | |
JPS63249330A (ja) | マイクロ波プラズマcvd装置 | |
JPS59156427A (ja) | プラズマ処理装置 | |
JPS61246204A (ja) | 表面処理方法 |