JPS6046181B2 - Vacuum deposition method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention is an improvement in a method for continuously obtaining a long composite material having a vapor deposited layer on a polymer molded substrate, which is used in the optical field, decorative field, magnetic recording field, etc. In particular, the purpose is to effectively prevent the various damage caused by electrification, which will be described later, and relates to improvements in vapor deposition methods.

Glow discharge treatments conventionally utilized in vapor deposition technology concern the surface layer to which the vapor deposited layer is attached, and its main purpose has been to improve the adhesion strength of the vapor deposited layer.

There have been many proposals regarding these, and extensive studies have been made on the types of glow discharge, the types of discharge gas, etc., and the process is known by names such as glow discharge treatment and plasma treatment, and in a broad sense also includes well-known sputtering and ion etching.

However, no matter which of these treatments is used, there is a limit to the adhesive strength between the polymer molded layer and the vapor deposited layer, and there are problems such as the peeling phenomenon of the vapor deposited layer due to blocking and the tearing of the base material. . In particular, substrates with excellent surface properties used in the optical field, magnetic recording field, etc. are becoming longer and shorter, making the above-mentioned problems more noticeable, and a solution has been awaited.

The present invention has been made to solve such problems, and the present invention will be described in detail below with reference to the drawings.

FIG. 1 is a cross-sectional view of the target composite material, which is a structure having a thin film layer 2 formed by vacuum evaporation on a polymer molded substrate 1, and the treated surface according to the present invention is indicated by A. It is a side that can be used. The present invention applies not only to the vacuum evaporation method but also to any known thin film forming method such as sputtering or ion blating that requires a vacuum atmosphere, and also to the structure and material of the thin film layer 2. Naturally, there are no limitations. FIG. 2 is a configuration diagram showing an example of an apparatus for carrying out the present invention.
As will be described later, it is of course possible to adopt many configurations without being particular about this configuration, but be sure to use A in Figure 1.
The structure must be such that the surface is exposed to a glow discharge atmosphere.

Further, it is preferable to carry out the present invention after the vapor deposition is completed and before the film is rolled up, which produces good results.
It is necessary to expose the surface to a glow discharge atmosphere, and the scope of the present invention also includes combinations with conventionally known surface glow discharge treatments. In FIG. 2, the interior 4 of the vacuum chamber 3 is practically heated to 10-" to 10-5 TorT by means of an exhaust device 5.
kept within range. Of course, this does not apply to sputtering, ion blating, etc. However, under normal vapor deposition conditions, the interior 4 and the glow chamber 6 are configured to maintain a differential pressure by some means. 7 schematically shows a partition wall, but it goes without saying that any known method may be used for sealing with the guide roller 8.

Inside the vacuum chamber 3, a moving polymer molded substrate 1 and an evaporation source 9 are arranged facing each other. Although the figure schematically shows an electron beam heating method as the evaporation source 9, it goes without saying that any known heating method may be used. The evaporative material 9'' loaded in the water-cooled copper hearth 10 is heated and evaporated by being accelerated and impacted by an electron beam generated from an electron source 11.The polymer molded material moves in opposition to the evaporation source 9. The base material 1 is moved from the winding shaft 12 to the winding shaft 1.
While being rolled up in the direction of the arrow 3, it passes through a vapor deposition process depending on the purpose. The effects of the present invention are exhibited by exposing the surface of the deposited composite material opposite to the deposition surface to a glow discharge atmosphere before being rolled up. Figure 2, 14, 15
indicates an insulated electrode, but for example, if the glow chamber 6 is
The purpose can be easily achieved by applying an alternating voltage between the electrodes 14 and 15 while maintaining a gas such as oxygen, nitrogen, or argon, which has been actively introduced into the electrode, at an appropriate pressure. Specific examples of the present invention will be described below. Example 1 Base material: Polyester film (thickness 5μ to 12μ) Vapor deposition substance: CO (500A) Heating method: Electron beam 16KW Film movement speed: 257TL/Min Degree of vacuum: Glow discharge treatment under the conditions of 6×10-5T0rr When we investigated the blocking phenomenon with and without it, we found the results shown in the table below.

Regarding glow discharge conditions, pressure range: 10-1 to 1
0-4T0rT' Frequency: DC ~ 44MHz Voltage: 10■ ~ 3KVp-9 Current density: 1 ~ 600μA/electrode unit area Gas type:
We investigated residual gas, oxygen, argon, nitrogen, carbon dioxide, etc., but it is fundamentally important to perform glow discharge treatment on the back side, and the conditions for this are as follows: increasing the current density according to the moving speed of the film. The effects of the present invention can be demonstrated for other substrates and deposition conditions by using glow discharge in a residual gas atmosphere at the most practical commercial frequency, since there is no significance due to special conditions. I confirmed it.

Example 2 Base material: Polyimide film (thickness 25μ) Vapor deposition material: T1 (400A) Heating method: Electron beam 16KW Film movement speed: 16rn,/Min Vacuum degree: 1.5×10-5T0rr Example 3 Base material: Polypropylene film (thickness 4μ~10μ) Deposited material: A
1 (500-1000A) Heating method: induction heating 6KW Film movement speed: 60T1. /Min Vacuum degree: 8×10-5T0rr Example 4 Base material: Polyester film (thickness 5μ to 12μ) Vapor deposition material:
NlCr (600A) deposition: Sputtering deposition (Ar, 1O-2T0rr, 1KW) Film moving speed: 16m/Min In any of the above examples,
It has become clear that as the surface properties improve (approximately average roughness of 0.1 μm or less), the phenomenon of blocking that has occurred can be solved by the present invention.

The main reason for this is thought to be that the better the base material on the surface, the more pronounced the peeling electrification phenomenon, which is alleviated, leading to the relaxation of pressure in the direction perpendicular to the axis during film winding, but the electrification itself is temporary. It has been confirmed that the effect is the same whether it is permanent or permanent, and it can be applied regardless of the charging mechanism, and it can be used in the fields of optics, decoration, and magnetic recording, where demand has been increasing in recent years. It fully demonstrates its effectiveness in vapor deposition, sputtering, etc. of various materials on substrates with high surface smoothness, etc.

As described above, according to the vacuum evaporation method of the present invention, it is possible to provide a member in which various harmful effects caused by charging are eliminated, and it has great application value in various fields.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view of an example of a composite material to which the vacuum vapor deposition method of the present invention can be applied, and Fig. 2 is a cross-sectional view of an example of an apparatus used to carry out the vacuum vapor deposition method of the present invention. There is a front view.

1... Polymer molded product base material, 2... Thin film layer, 3... Vacuum chamber, 6... Glow chamber,
9... Evaporation source, 14, 15... Electrode.

Claims (1)

[Claims] 1. Before or after continuously forming a thin film on a polymer molded base material moving in a vacuum atmosphere, exposing the surface of the polymer molded base material opposite to the thin film forming side to a glow discharge atmosphere. A vacuum deposition method characterized by: