JPH0480448B2 - - Google Patents
Info
- Publication number
- JPH0480448B2 JPH0480448B2 JP56175315A JP17531581A JPH0480448B2 JP H0480448 B2 JPH0480448 B2 JP H0480448B2 JP 56175315 A JP56175315 A JP 56175315A JP 17531581 A JP17531581 A JP 17531581A JP H0480448 B2 JPH0480448 B2 JP H0480448B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma treatment
- polyester base
- recording medium
- metal thin
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010408 film Substances 0.000 claims description 50
- 229920000728 polyester Polymers 0.000 claims description 48
- 238000009832 plasma treatment Methods 0.000 claims description 44
- 230000005291 magnetic effect Effects 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 30
- 239000010409 thin film Substances 0.000 claims description 25
- 230000005294 ferromagnetic effect Effects 0.000 claims description 24
- 239000007789 gas Substances 0.000 claims description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 12
- 229910001882 dioxygen Inorganic materials 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 239000010941 cobalt Substances 0.000 claims description 9
- 229910017052 cobalt Inorganic materials 0.000 claims description 9
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 238000001771 vacuum deposition Methods 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052754 neon Inorganic materials 0.000 claims description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 9
- 238000007738 vacuum evaporation Methods 0.000 description 7
- 239000000428 dust Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
- G11B5/73927—Polyester substrates, e.g. polyethylene terephthalate
Description
この発明は、ポリエステルフイルムを基体とし
て使用する磁気記録媒体およびその製造方法に関
し、その目的とするところはポリエステルベース
フイルムと強磁性金属薄膜層との接着性に優れた
磁気記録媒体を提供することにある。
磁気記録媒体は、ポリエステルフイルムなどの
基体上に、コバルトなどの磁性金属を真空蒸着し
たりしてつくられている。
ところが、基体として一般に汎用されているポ
リエステルフイルムは結晶性が高く表面に不純物
および塵埃等が付着しているため強磁性金属薄膜
層との接着性が弱く、使用中に強磁性金属薄膜層
が剥離するおそれがある。これを解消するため従
来からポリエステルベースフイルムと強磁性金属
薄膜層との間に下塗り層を設けるなどして接着性
の改善が試みられているが未だ充分に満足できる
結果は得られていない。
この発明者らはかかる現状に鑑み種々検討を行
なつた結果、ポリエステルベースフイルムの表面
に120ｍＡ・sec／cm2以下の印加電流で水との接触
角が50度以下となるまでプラズマ処理を施こす
と、ポリエステルベースフイルムの表面に付着し
た不純物や塵埃等が充分に除去されるとともにポ
リエステルベースフイルムの表面が適度にエツチ
ングされ、その結果この上に強磁性金属薄膜層を
直接または下地層を介して形成すると強磁性金属
薄膜層とポリエステルベースフイルムとの接着性
が充分に向上されることを見いだし、この発明を
なすに至つた。
この発明において、ポリエステルベースフイル
ム表面のプラズマ処理は、真空槽内で、酸素ガ
ス、アルゴンガス、ヘリウムガス、ネオンガスま
たは窒素ガス雰囲気下に行なわれ、プラズマ処理
に当つて使用するガスとしてはこれらのガスがい
ずれも好適に使用され、いずれのガスを使用する
場合もポリエステルベースフイルムの表面に活性
基を生成して強磁性金属薄膜層との接着性が良好
になるが、特に酸素ガスはポリエステルベースフ
イルムの表面に活性基を生成しやすく、強磁性金
属薄膜層との接着性をより良好にするのでより好
適なものとして使用される。これらのガスの真空
槽内におけるガス圧は、１×10-3トールより低く
するとプラズマが発生せず、１トールより高くす
ると放電し、安定なプラズマが得られない。この
ため１×10-3〜１トールの範囲内にするのが好ま
しい。
このようなガス雰囲気下におけるこの発明のプ
ラズマ処理は、印加電流を120ｍＡ・sec／cm2以下
とし、ポリエステルベースフイルムの表面の水と
の接触角が50度以下となるまで行なうのが好まし
く、印加電流を120ｍＡ・sec／cm2より大きくする
とポリエステルベースフイルムの表面が過度にエ
ツチングされてかえつて強磁性金属薄膜層とポリ
エステルベースフイルムとの接着性が低下する。
またポリエステルベースフイルム表面の水との接
触角、即ち、ポリエステルベースフイルム上の直
径１〜３mmの水滴をモニターテレビに拡大し、前
進接触角θaと後退接触角θrを測定して下記の式
cosθ＝（cosθa＋cosθr）／２
から求めたθの値は付着した不純物や塵埃等がプ
ラズマ処理により除去されるに従つて小さくな
り、接触角が50度より大きい間は不純物や塵埃等
の除去が充分ではないが接触角が50度以下になる
までプラズマ処理が行なわれると不純物や塵埃等
がポリエステルベースフイルム表面から充分に除
去される。従つてポリエステルベースフイルムの
表面に120ｍＡ・sec／cm2引下の印加電流で水との
接触角が50度引下となるまでプラズマ処理が施こ
されると、ポリエステルベースフイルムの表面に
付着した不純物や塵埃等が充分に除去され、ポリ
エステルベースフイルムの表面に活性基が生成し
て活性化されるとともに、ポリエステルベースフ
イルムの表面が適度にエツチングされ、この上に
直接あるいは下地層を介して形成される強磁性金
属薄膜層との接着性が充分に向上される。
このようにプラズマ処理が施こされたポリエス
テルベースフイルムの表面に形成される強磁性金
属薄膜層は、鉄、コバルト、ニツケル等の磁性金
属またはそれらの合金を真空蒸着、イオンプレー
テイング、スパツタリング等の手段によつてポリ
エステルベースフイルムの表面に被着して形成さ
れる。また下地層は、アルミニウム、銅、チタ
ン、クロムなどの金属を真空蒸着、イオンプレー
テイング、スパツタリング等の手段によつてポリ
エステルベースフイルムの表面に被着して形成さ
れ、このような下地層を介して強磁性金属薄膜層
が形成されると、プラズマ処理されたポリエステ
ルベースフイルムと下地層との接着性が改善され
るため下地層を介して形成された強磁性金属薄膜
層とポリエステルベースフイルムの接着性も充分
に向上される。
次に、この発明の実施例について説明する。
実施例 １
第１図に示すように、真空槽１内に基板２と上
下一対のリング状の交流電極３および４とを両電
極間に基板２が位置するように配設し、かつ下部
にＷボート５を配設してなる装置を使用し、基板
２の下面にポリエステルベースフイルム６をセツ
トして真空槽下底に配設した排気系７で真空槽１
内を10-7トールになるまで真空排気した。次い
で、真空槽１の側壁に取りつけたガス導入管８か
ら酸素ガスを真空槽１内に導入して真空槽１内の
酸素ガス圧を0.03トールとし、交流電源９により
約500Vの電圧で交流電極３および４に0.3ｍＡ／
cm2の電流を印加して時間を種々に変えてプラズマ
処理を施こした。第２図のグラフＡはこのように
して酸素ガス存在下でプラズマ処理を施こして得
られた多数のポリエステルベースフイルムの水と
の接触角とプラズマ処理時間との関係を表わした
ものである。
次に、真空槽１内のＷボート５上にコバルト１
０をセツトし、排気系７で真空槽１内を10-7トー
ルになるまで真空排気した。次いでガス導入管８
から酸素ガスを真空槽１内に導入して真空槽１内
の酸素ガス圧を１×10-5トールとした後Ｗボート
５を加熱してコバルト１０を蒸発させ、前記のプ
ラズマ処理して得られた多数のポリエステルベー
スフイルム６の下面にコバルトを真空蒸着して
0.1μ厚のコバルトからなる強磁性金属薄膜層を形
成した。次にこれを所定の巾に裁断して磁気テー
プをつくつた。
このようにして得られた多数の磁気テープにつ
いて接着力を測定した。接着力の測定は、磁気テ
ープのポリエステルベースフイルム側をステンレ
ス鋼板にエポキシ樹脂で接着固定し、強磁性金属
薄膜層側を引き剥がし用腕杆にエポキシ樹脂で接
着してこの引き剥がし用腕杆の引張力で強磁性金
属薄膜層を引き剥がし、強磁性金属薄膜層が引き
剥がされるときの引張力を測定して行なつた。第
２図のグラフＢはこのようにして得られた多数の
磁気テープの接着力とプラズマ処理時間との関係
を表わしたものである。
実施例 ２
実施例１におけるプラズマ処理において、電圧
を約500Vから700Vに代え、酸素ガス圧を0.01ト
ールとし、印加電流を0.3ｍＡ／cm2から0.1ｍＡ／
cm2に代えた以外は実施例１と同様にしてプラズマ
処理を行ない、更に真空蒸着を行なつて磁気テー
プをつくつた。第３図のグラフＡはこのようなプ
ラズマ処理を施こして得られた多数のポリエステ
ルベースフイルムの水との接触角とプラズマ処理
時間との関係を表わしたものであり、グラフＢは
さらに真空蒸着を行なつて得られた多数の磁気テ
ープの接着力とプラズマ処理時間との関係を表わ
したものである。
実施例 ３
実施例１におけるプラズマ処理において、酸素
ガスに代えてアルゴンガスを同じガス圧で使用し
た以外は実施例１と同様にしてプラズマ処理を行
ない、更に真空蒸着を行なつて磁気テープをつく
つた。第４図のグラフＡはこのようなプラズマ処
理を施こして得られた多数のポリエステルベース
フイルムの水との接触角とプラズマ処理時間との
関係を表わしたものであり、グラフＢはさらに真
空蒸着を行なつて得られた多数の磁気テープの接
着力とプラズマ処理時間との関係を表わしたもの
である。
実施例 ４
実施例２におけるプラズマ処理において、酸素
ガスに代えてアルゴンガスを同じガス圧で使用し
た以外は実施例２と同様にしてプラズマ処理を行
ない、更に真空蒸着を行なつて磁気テープをつく
つた。第５図のグラフＡはこのようなプラズマ処
理を施こして得られた多数のポリエステルベース
フイルムの水との接触角とプラズマ処理時間との
関係を表わしたものであり、グラフＢはさらに真
空蒸着を行なつて得られた多数の磁気テープの接
着力とプラズマ処理時間との関係を表わしたもの
である。
以上のようにして得られた第２図乃至第５図の
グラフＡおよびグラフＢから明らかなように、い
ずれの場合においてもプラズマ処理時間が経過す
ると接触角が急激に低下し、接触角が50度以下で
は接着力が充分に良好になつており、このことか
ら接触角が50度以下になるまでプラズマ処理を行
なえばポリエステルベースフイルムと強磁性金属
薄膜層との接着性が充分に向上されることがわか
る。
実施例 ５
実施例１において電圧約500Vで0.3ｍＡ／cm2の
電流を15秒間印加してプラズマ処理したポリエス
テルベースフイルムを使用し、これを真空蒸着す
る前に、真空槽１内のＷボート５上にアルミニウ
ムをセツトし、排気系７で真空槽１内を真空排気
した後ボート５を加熱しアルミニウムを蒸発させ
てポリエステルベースフイルム６の下面にアルミ
ニウムからなる0.02μ厚の下地層を形成した。次
いで実施例１と同様にして真空蒸着を行ない0.1μ
厚のコバルトからなる強磁性金属薄膜層を形成
し、これを所定の巾に裁断して磁気テープをつく
つた。
実施例 ６
実施例５におけるプラズマ処理において、酸素
ガスに代えてアルゴンガスを同じガス圧で使用
し、電圧約500Vで0.3ｍＡ／cm2の電流を30秒間印
加した以外は実施例５と同様にしてプラズマ処理
を行ない、更にアルミニウムからなる下地層を形
成した後真空蒸着を行なつて磁気テープをつくつ
た。
実施例 ７
実施例１におけるプラズマ処理において、酸素
ガスに代えてヘリウムガスを同じガス圧で使用
し、電圧約500Vで0.3ｍＡ／cm2の電流を30秒間印
加した以外は実施例１と同様にしてプラズマ処理
を行ない、更に真空蒸着を行なつて磁気テープを
つくつた。
比較例
実施例１において、プラズマ処理を省いた以外
は実施例１と同様にして真空蒸着を行ない、0.1μ
厚のコバルトからなる強磁性金属薄膜層を形成し
た後、所定の巾に裁断して磁気テープをつくつ
た。
実施例５乃至７においてプラズマ処理されたポ
リエステルベースフイルムの水との接触角を測定
し、また比較例で使用したポリエステルベースフ
イルムの水との接触角を測定して、実施例１で15
秒間プラズマ処理して得られたポリエステルベー
スフイルムおよび実施例２乃至４で30秒間プラズ
マ処理して得られたポリエステルベースフイルム
の水との接触角と比較した。また実施例５乃至７
で得られた磁気テープおよび比較例で得られた磁
気テープについて実施例１と同じ方法で接着力を
測定し、実施例１で15秒間プラズマ処理しさらに
真空蒸着して得られた磁気テープおよび実施例２
乃至４で30秒間プラズマ処理しさらに真空蒸着し
て得られた磁気テープの接着力と比較した。
下表はその結果である。
The present invention relates to a magnetic recording medium using a polyester film as a substrate and a method for manufacturing the same, and an object thereof is to provide a magnetic recording medium with excellent adhesion between a polyester base film and a ferromagnetic metal thin film layer. be. Magnetic recording media are made by vacuum-depositing a magnetic metal such as cobalt onto a substrate such as polyester film. However, polyester film, which is commonly used as a substrate, has high crystallinity and has impurities and dust attached to its surface, so it has weak adhesion to the ferromagnetic metal thin film layer, and the ferromagnetic metal thin film layer peels off during use. There is a risk of In order to solve this problem, attempts have been made to improve the adhesion by providing an undercoat layer between the polyester base film and the ferromagnetic metal thin film layer, but satisfactorily results have not yet been obtained. The inventors conducted various studies in view of the current situation, and as a result, plasma treatment was performed on the surface of a polyester base film with an applied current of 120 mA sec/cm 2 or less until the contact angle with water became 50 degrees or less. When rubbed, impurities and dust adhering to the surface of the polyester base film are sufficiently removed, and the surface of the polyester base film is appropriately etched. The present inventors have discovered that the adhesion between the ferromagnetic metal thin film layer and the polyester base film can be sufficiently improved by forming the ferromagnetic metal thin film layer by using a polyester base film. In this invention, the plasma treatment of the surface of the polyester base film is performed in a vacuum chamber in an atmosphere of oxygen gas, argon gas, helium gas, neon gas, or nitrogen gas, and these gases are used for plasma treatment. Any of these gases is preferably used, and when using either gas, active groups are generated on the surface of the polyester base film, resulting in good adhesion with the ferromagnetic metal thin film layer. It is more suitable for use because it easily generates active groups on the surface and improves adhesion to the ferromagnetic metal thin film layer. When the gas pressure of these gases in the vacuum chamber is lower than 1×10 -3 Torr, no plasma is generated, and when it is higher than 1 Torr, discharge occurs and stable plasma cannot be obtained. For this reason, it is preferable to set it within the range of 1×10 −3 to 1 Torr. The plasma treatment of the present invention in such a gas atmosphere is preferably performed at an applied current of 120 mA·sec/cm 2 or less until the contact angle with water on the surface of the polyester base film becomes 50 degrees or less. If the current is made larger than 120 mA·sec/cm 2 , the surface of the polyester base film will be excessively etched, and the adhesion between the ferromagnetic metal thin film layer and the polyester base film will deteriorate.
In addition, the contact angle with water on the surface of the polyester base film, that is, a water droplet with a diameter of 1 to 3 mm on the polyester base film is magnified on a monitor TV, and the advancing contact angle θ a and receding contact angle θ r are measured using the following formula. The value of θ calculated from cosθ = (cosθ a + cosθ r )/2 decreases as attached impurities and dust are removed by plasma treatment, and as long as the contact angle is greater than 50 degrees, the value of θ decreases as the attached impurities and dust are removed. Although the removal is not sufficient, if the plasma treatment is performed until the contact angle becomes 50 degrees or less, impurities, dust, etc. will be sufficiently removed from the surface of the polyester base film. Therefore, when the surface of a polyester base film is subjected to plasma treatment with an applied current of 120 mA sec/cm 2 until the contact angle with water is reduced by 50 degrees, the surface of the polyester base film becomes attached to the surface of the polyester base film. Impurities, dust, etc. are sufficiently removed, active groups are generated and activated on the surface of the polyester base film, and the surface of the polyester base film is appropriately etched. The adhesion with the ferromagnetic metal thin film layer is sufficiently improved. The ferromagnetic metal thin film layer formed on the surface of the plasma-treated polyester base film is produced by applying magnetic metals such as iron, cobalt, and nickel, or their alloys, by vacuum evaporation, ion plating, sputtering, etc. It is formed by being adhered to the surface of a polyester base film by means of a method. The base layer is formed by depositing metal such as aluminum, copper, titanium, chromium, etc. on the surface of the polyester base film by means such as vacuum evaporation, ion plating, or sputtering. When a ferromagnetic metal thin film layer is formed, the adhesion between the plasma-treated polyester base film and the underlayer is improved. The performance is also sufficiently improved. Next, embodiments of the invention will be described. Example 1 As shown in FIG. 1, a substrate 2 and a pair of upper and lower ring-shaped AC electrodes 3 and 4 are arranged in a vacuum chamber 1 so that the substrate 2 is located between the two electrodes. Using a device equipped with a W boat 5, a polyester base film 6 is set on the bottom surface of the substrate 2, and the vacuum chamber 1 is opened with an exhaust system 7 disposed at the bottom of the vacuum chamber.
The inside was evacuated to 10 -7 Torr. Next, oxygen gas is introduced into the vacuum chamber 1 from the gas introduction tube 8 attached to the side wall of the vacuum chamber 1 to make the oxygen gas pressure in the vacuum chamber 1 0.03 Torr, and the AC electrode is connected to the AC power source 9 at a voltage of about 500V. 0.3mA/3 and 4
Plasma treatment was performed by applying a current of cm 2 and varying the time. Graph A in FIG. 2 shows the relationship between the contact angle with water and the plasma treatment time for a number of polyester base films obtained by plasma treatment in the presence of oxygen gas. Next, cobalt 1 is placed on the W boat 5 in the vacuum chamber 1.
0, and the inside of the vacuum chamber 1 was evacuated using the exhaust system 7 until the pressure reached 10 -7 Torr. Next, gas introduction pipe 8
After introducing oxygen gas into the vacuum chamber 1 to set the oxygen gas pressure in the vacuum chamber 1 to 1×10 -5 Torr, the W boat 5 is heated to evaporate the cobalt 10, which is obtained by the plasma treatment described above. Cobalt is vacuum-deposited on the lower surface of a large number of polyester base films 6.
A ferromagnetic metal thin film layer made of cobalt with a thickness of 0.1μ was formed. Next, this was cut to a predetermined width to make magnetic tape. The adhesive strength of a large number of magnetic tapes thus obtained was measured. To measure the adhesive strength, the polyester base film side of the magnetic tape is fixed to a stainless steel plate using epoxy resin, and the ferromagnetic metal thin film layer side is adhered to a peeling arm using epoxy resin. The ferromagnetic metal thin film layer was peeled off using a tensile force, and the tensile force when the ferromagnetic metal thin film layer was peeled off was measured. Graph B in FIG. 2 shows the relationship between the adhesive strength of a large number of magnetic tapes obtained in this way and the plasma processing time. Example 2 In the plasma treatment in Example 1, the voltage was changed from about 500 V to 700 V, the oxygen gas pressure was changed to 0.01 Torr, and the applied current was changed from 0.3 mA/cm 2 to 0.1 mA/cm 2 .
Plasma treatment was carried out in the same manner as in Example 1 except that cm 2 was used, and vacuum evaporation was further carried out to produce a magnetic tape. Graph A in Figure 3 shows the relationship between the contact angle with water and plasma treatment time for a large number of polyester base films obtained by performing such plasma treatment, and graph B shows the relationship between the contact angle with water and the plasma treatment time for a large number of polyester base films obtained by performing such plasma treatment. This figure shows the relationship between the adhesive strength of a large number of magnetic tapes obtained by performing the above process and the plasma processing time. Example 3 Plasma treatment was performed in the same manner as in Example 1 except that argon gas was used at the same gas pressure instead of oxygen gas in the plasma treatment in Example 1, and vacuum evaporation was further performed to form a magnetic tape. Ivy. Graph A in Figure 4 shows the relationship between the contact angle with water and plasma treatment time for a number of polyester base films obtained by performing such plasma treatment, and graph B shows the relationship between the contact angle with water and the plasma treatment time for a large number of polyester base films obtained by performing such plasma treatment. This figure shows the relationship between the adhesive strength of a large number of magnetic tapes obtained by performing the above process and the plasma processing time. Example 4 Plasma treatment was performed in the same manner as in Example 2, except that argon gas was used at the same gas pressure instead of oxygen gas in the plasma treatment in Example 2, and vacuum evaporation was further performed to form a magnetic tape. Ivy. Graph A in Figure 5 shows the relationship between the contact angle with water and the plasma treatment time for a large number of polyester base films obtained by performing such plasma treatment, and graph B shows the relationship between the contact angle with water and plasma treatment time for a number of polyester base films obtained by performing such plasma treatment. This figure shows the relationship between the adhesive strength of a large number of magnetic tapes obtained by performing the above process and the plasma processing time. As is clear from graphs A and B in FIGS. 2 to 5 obtained as described above, in both cases, as the plasma treatment time elapses, the contact angle rapidly decreases, and the contact angle decreases to 50 If the contact angle is below 50°, the adhesion is sufficiently good, and this means that if plasma treatment is performed until the contact angle is below 50°, the adhesion between the polyester base film and the ferromagnetic metal thin film layer will be sufficiently improved. I understand that. Example 5 A polyester base film that was plasma-treated by applying a voltage of about 500 V and a current of 0.3 mA/cm 2 for 15 seconds in Example 1 was used. Aluminum was set on top, and after evacuating the inside of the vacuum chamber 1 using the exhaust system 7, the boat 5 was heated to evaporate the aluminum to form a base layer of aluminum with a thickness of 0.02 μm on the lower surface of the polyester base film 6. Next, vacuum evaporation was performed in the same manner as in Example 1 to give a thickness of 0.1μ.
A thick ferromagnetic metal thin film layer made of cobalt was formed, and this was cut to a predetermined width to create a magnetic tape. Example 6 The plasma treatment in Example 5 was performed in the same manner as in Example 5, except that argon gas was used at the same gas pressure instead of oxygen gas, and a current of 0.3 mA/cm 2 was applied for 30 seconds at a voltage of about 500 V. After plasma treatment was performed, an underlayer of aluminum was formed, and vacuum evaporation was performed to produce a magnetic tape. Example 7 The plasma treatment in Example 1 was performed in the same manner as in Example 1, except that helium gas was used in place of oxygen gas at the same gas pressure, and a current of 0.3 mA/cm 2 was applied for 30 seconds at a voltage of about 500 V. A magnetic tape was produced by plasma treatment and vacuum deposition. Comparative Example Vacuum deposition was carried out in the same manner as in Example 1, except that the plasma treatment was omitted.
After forming a thick ferromagnetic metal thin film layer made of cobalt, it was cut to a predetermined width to create a magnetic tape. The contact angle with water of the plasma-treated polyester base film was measured in Examples 5 to 7, and the contact angle with water of the polyester base film used in the comparative example was measured.
The contact angles with water of the polyester base films obtained by plasma treatment for 2 seconds and the polyester base films obtained by plasma treatment for 30 seconds in Examples 2 to 4 were compared. Also, Examples 5 to 7
The adhesive strength of the magnetic tape obtained in Example 1 and the magnetic tape obtained in Comparative Example was measured in the same manner as in Example 1. Example 2
The adhesion strength of the magnetic tape obtained by plasma treatment for 30 seconds and vacuum deposition was compared in No. 4 to No. 4. The table below shows the results.
【表】
上表から明らかなように、この発明で得られた
磁気テープ（実施例１〜７）は従来の磁気テープ
（比較例）に比し、いずれも接触角が50度以下で
小さく、又接着力が大きく、このことからこの発
明によつて得られる磁気記録媒体はポリエステル
ベースフイルムと強磁性金属薄膜層との接着性が
一段と向上されていることがわかる。[Table] As is clear from the above table, the magnetic tapes obtained by the present invention (Examples 1 to 7) all had smaller contact angles of 50 degrees or less, compared to the conventional magnetic tapes (Comparative Examples). Furthermore, the adhesive strength is large, which indicates that the magnetic recording medium obtained by the present invention has a much improved adhesive property between the polyester base film and the ferromagnetic metal thin film layer.
第１図はこの発明の製造方法を実施するために
使用する装置の一実施例を示す概略断面図、第２
図乃至第５図は実施例１乃至４で得られたポリエ
ステルベースフイルムおよび磁気テープの接触角
および接着力とプラズマ処理時間との関係図であ
る。
１……真空槽、３，４……交流電極、５……Ｗ
ボート、６……ポリエステルベースフイルム。
FIG. 1 is a schematic sectional view showing one embodiment of the apparatus used to carry out the manufacturing method of the present invention, and FIG.
Figures 5 to 5 are graphs showing the relationship between the contact angle and adhesive force of the polyester base films and magnetic tapes obtained in Examples 1 to 4, and the plasma treatment time. 1... Vacuum chamber, 3, 4... AC electrode, 5... W
Boat, 6... Polyester base film.
Claims (1)
るとともに適度にエツチングして乾燥状態での水
との接触角を50度以下にしたポリエステルベース
フイルム上に、真空成膜法で強磁性金属薄膜層を
直接あるいは下地層を介して形成してなる磁気記
録媒体。 ２ 乾燥状態での水との接触角が33〜50度のポリ
エステルベースフイルムを使用する特許請求の範
囲第１項記載の磁気記録媒体。 ３ 強磁性金属薄膜層が鉄、コバルト、ニツケル
等の金属またはこれらの合金からなる強磁性金属
薄膜層である特許請求の範囲第１項記載の磁気記
録媒体。 ４ アルミニウム、銅、チタン、クロムから選ば
れる金属からなる下地層を介してポリエステルベ
ースフイルム上に、真空成膜法で強磁性金属薄膜
層を形成した特許請求の範囲第１項記載の磁気記
録媒体。 ５ ポリエステルベースフイルムの表面を120ｍ
Ａ・sec／cm2以下の印加電流で乾燥状態での水と
の接触角が50度以下となるまでプラズマ処理し、
この上に強磁性金属薄膜層を直接あるいは下地層
を介して形成することを特徴とする磁気記録媒体
の製造方法。 ６ プラズマ処理が真空槽内で酸素ガス、アルゴ
ンガス、ヘリウムガス、ネオンガス、窒素ガスの
少なくとも１種を含むガス雰囲気下で行われる特
許請求の範囲第５項記載の磁気記録媒体の製造方
法。 ７ プラズマ処理が１×10-3〜１トールの真空度
で行われる特許請求の範囲第５項記載の磁気記録
媒体の製造方法。[Scope of Claims] 1 A strong film is formed using a vacuum film forming method on a polyester base film whose surface has been cleaned and activated by plasma treatment and has been appropriately etched so that the contact angle with water in a dry state is 50 degrees or less. A magnetic recording medium formed by forming a magnetic metal thin film layer directly or through an underlayer. 2. The magnetic recording medium according to claim 1, which uses a polyester base film having a contact angle with water of 33 to 50 degrees in a dry state. 3. The magnetic recording medium according to claim 1, wherein the ferromagnetic metal thin film layer is a ferromagnetic metal thin film layer made of a metal such as iron, cobalt, nickel, or an alloy thereof. 4. The magnetic recording medium according to claim 1, wherein a ferromagnetic metal thin film layer is formed by a vacuum deposition method on a polyester base film via an underlayer made of a metal selected from aluminum, copper, titanium, and chromium. . 5 120m of surface of polyester base film
Plasma treatment is performed with an applied current of A sec/cm 2 or less until the contact angle with water in a dry state is 50 degrees or less,
A method for manufacturing a magnetic recording medium, comprising forming a ferromagnetic metal thin film layer thereon directly or via an underlayer. 6. The method for manufacturing a magnetic recording medium according to claim 5, wherein the plasma treatment is performed in a vacuum chamber under a gas atmosphere containing at least one of oxygen gas, argon gas, helium gas, neon gas, and nitrogen gas. 7. The method of manufacturing a magnetic recording medium according to claim 5, wherein the plasma treatment is performed at a degree of vacuum of 1×10 −3 to 1 Torr.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56175315A JPS5877030A (en) | 1981-10-31 | 1981-10-31 | Magnetic recording medium and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56175315A JPS5877030A (en) | 1981-10-31 | 1981-10-31 | Magnetic recording medium and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5877030A JPS5877030A (en) | 1983-05-10 |
| JPH0480448B2 true JPH0480448B2 (en) | 1992-12-18 |
Family
ID=15993939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56175315A Granted JPS5877030A (en) | 1981-10-31 | 1981-10-31 | Magnetic recording medium and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5877030A (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59223932A (en) * | 1983-06-02 | 1984-12-15 | Matsushita Electric Ind Co Ltd | Production of magnetic recording medium |
| US4575475A (en) * | 1983-07-12 | 1986-03-11 | Tdk Corporation | Magnetic recording medium |
| JPS60119635A (en) * | 1983-11-30 | 1985-06-27 | Hitachi Condenser Co Ltd | Manufacture of magnetic recording medium |
| JPH0687300B2 (en) * | 1984-08-02 | 1994-11-02 | ティーディーケイ株式会社 | Magnetic recording method |
| JPH0610856B2 (en) * | 1984-08-04 | 1994-02-09 | ティーディーケイ株式会社 | Magnetic recording medium |
| JPH0778865B2 (en) * | 1984-10-15 | 1995-08-23 | 株式会社東芝 | Magnetic recording medium and manufacturing method thereof |
| JPS61156519A (en) * | 1984-12-27 | 1986-07-16 | Konishiroku Photo Ind Co Ltd | Magnetic recording medium and its production |
| GB2168911B (en) * | 1984-12-29 | 1989-06-07 | Tdk Corp | Magnetic recording medium |
| CA2022027A1 (en) * | 1989-07-28 | 1991-01-29 | Yoshinori Suga | Substrate of optical disc |
| WO2002046281A1 (en) * | 2000-12-05 | 2002-06-13 | Learonal Japan Inc. | Resin composite material and method of forming the same |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5084677A (en) * | 1973-11-28 | 1975-07-08 | ||
| JPS52103474A (en) * | 1976-02-27 | 1977-08-30 | Teijin Ltd | Method of manufacture of polyester film as magnetic recording material |
| JPS5317533A (en) * | 1976-07-31 | 1978-02-17 | Nippon Steel Corp | Production method of electrootin plate |
| JPS5671831A (en) * | 1979-11-13 | 1981-06-15 | Sekisui Chem Co Ltd | Manufacture for magnetic recording medium |
| JPS5864381A (en) * | 1981-10-09 | 1983-04-16 | Matsushita Electric Ind Co Ltd | Vacuum depositing device |
-
1981
- 1981-10-31 JP JP56175315A patent/JPS5877030A/en active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5084677A (en) * | 1973-11-28 | 1975-07-08 | ||
| JPS52103474A (en) * | 1976-02-27 | 1977-08-30 | Teijin Ltd | Method of manufacture of polyester film as magnetic recording material |
| JPS5317533A (en) * | 1976-07-31 | 1978-02-17 | Nippon Steel Corp | Production method of electrootin plate |
| JPS5671831A (en) * | 1979-11-13 | 1981-06-15 | Sekisui Chem Co Ltd | Manufacture for magnetic recording medium |
| JPS5864381A (en) * | 1981-10-09 | 1983-04-16 | Matsushita Electric Ind Co Ltd | Vacuum depositing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5877030A (en) | 1983-05-10 |
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