JPS604165A - スルホニウム誘導体 - Google Patents

スルホニウム誘導体

Info

Publication number
JPS604165A
JPS604165A JP58112460A JP11246083A JPS604165A JP S604165 A JPS604165 A JP S604165A JP 58112460 A JP58112460 A JP 58112460A JP 11246083 A JP11246083 A JP 11246083A JP S604165 A JPS604165 A JP S604165A
Authority
JP
Japan
Prior art keywords
group
lower alkyl
alkyl group
hydrogen atom
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58112460A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0370700B2 (en, 2012
Inventor
Shoei Eda
江田　昭英
Mikio Hori
堀　幹夫
Naosuke Matsuura
松浦　直資
Sanji Yasumoto
三治 安本
Hiroshi Matsumoto
宏 松本
Ichiro Yamawaki
一郎 山脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiho Pharmaceutical Co Ltd
Original Assignee
Taiho Pharmaceutical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiho Pharmaceutical Co Ltd filed Critical Taiho Pharmaceutical Co Ltd
Priority to JP58112460A priority Critical patent/JPS604165A/ja
Publication of JPS604165A publication Critical patent/JPS604165A/ja
Publication of JPH0370700B2 publication Critical patent/JPH0370700B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Furan Compounds (AREA)
JP58112460A 1983-06-21 1983-06-21 スルホニウム誘導体 Granted JPS604165A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58112460A JPS604165A (ja) 1983-06-21 1983-06-21 スルホニウム誘導体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58112460A JPS604165A (ja) 1983-06-21 1983-06-21 スルホニウム誘導体

Publications (2)

Publication Number Publication Date
JPS604165A true JPS604165A (ja) 1985-01-10
JPH0370700B2 JPH0370700B2 (en, 2012) 1991-11-08

Family

ID=14587183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58112460A Granted JPS604165A (ja) 1983-06-21 1983-06-21 スルホニウム誘導体

Country Status (1)

Country Link
JP (1) JPS604165A (en, 2012)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007178848A (ja) * 2005-12-28 2007-07-12 Fujifilm Corp 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
JP2010061043A (ja) * 2008-09-05 2010-03-18 Fujifilm Corp ポジ型レジスト組成物及びこれを用いたパターン形成方法
EP2292272A3 (en) * 2004-07-08 2011-10-26 Novo Nordisk A/S Polypeptide protracting tags comprising a tetrazole moiety
US20110287361A1 (en) * 2010-04-27 2011-11-24 Rohm And Haas Electronic Materials Llc Photoacid generators and photoresists comprising same
US8404427B2 (en) 2005-12-28 2013-03-26 Fujifilm Corporation Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2292272A3 (en) * 2004-07-08 2011-10-26 Novo Nordisk A/S Polypeptide protracting tags comprising a tetrazole moiety
US9061067B2 (en) 2004-07-08 2015-06-23 Novo Nordisk A/S Polypeptide protracting tags
JP2007178848A (ja) * 2005-12-28 2007-07-12 Fujifilm Corp 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
US7749679B2 (en) * 2005-12-28 2010-07-06 Fujifilm Corporation Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition
US8404427B2 (en) 2005-12-28 2013-03-26 Fujifilm Corporation Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition
JP2010061043A (ja) * 2008-09-05 2010-03-18 Fujifilm Corp ポジ型レジスト組成物及びこれを用いたパターン形成方法
US20110287361A1 (en) * 2010-04-27 2011-11-24 Rohm And Haas Electronic Materials Llc Photoacid generators and photoresists comprising same
US8609891B2 (en) * 2010-04-27 2013-12-17 Rohm And Haas Electronic Materials Llc Photoacid generators and photoresists comprising same

Also Published As

Publication number Publication date
JPH0370700B2 (en, 2012) 1991-11-08

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