JPH0370700B2 - - Google Patents
Info
- Publication number
- JPH0370700B2 JPH0370700B2 JP58112460A JP11246083A JPH0370700B2 JP H0370700 B2 JPH0370700 B2 JP H0370700B2 JP 58112460 A JP58112460 A JP 58112460A JP 11246083 A JP11246083 A JP 11246083A JP H0370700 B2 JPH0370700 B2 JP H0370700B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- toluenesulfonate
- lower alkyl
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Furan Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58112460A JPS604165A (ja) | 1983-06-21 | 1983-06-21 | スルホニウム誘導体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58112460A JPS604165A (ja) | 1983-06-21 | 1983-06-21 | スルホニウム誘導体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS604165A JPS604165A (ja) | 1985-01-10 |
| JPH0370700B2 true JPH0370700B2 (en, 2012) | 1991-11-08 |
Family
ID=14587183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58112460A Granted JPS604165A (ja) | 1983-06-21 | 1983-06-21 | スルホニウム誘導体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS604165A (en, 2012) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2289560B1 (en) * | 2004-07-08 | 2015-04-22 | Novo Nordisk A/S | Polypeptide protracting tags comprising a tetrazole moiety |
| US8404427B2 (en) | 2005-12-28 | 2013-03-26 | Fujifilm Corporation | Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition |
| JP4866605B2 (ja) * | 2005-12-28 | 2012-02-01 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
| JP5130164B2 (ja) * | 2008-09-05 | 2013-01-30 | 富士フイルム株式会社 | ポジ型レジスト組成物及びこれを用いたパターン形成方法 |
| EP2383611A3 (en) * | 2010-04-27 | 2012-01-25 | Rohm and Haas Electronic Materials LLC | Photoacid generators and photoresists comprising same |
-
1983
- 1983-06-21 JP JP58112460A patent/JPS604165A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS604165A (ja) | 1985-01-10 |
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