JPS6037530B2 - 磁気記録媒体の製造方法 - Google Patents

磁気記録媒体の製造方法

Info

Publication number
JPS6037530B2
JPS6037530B2 JP55072304A JP7230480A JPS6037530B2 JP S6037530 B2 JPS6037530 B2 JP S6037530B2 JP 55072304 A JP55072304 A JP 55072304A JP 7230480 A JP7230480 A JP 7230480A JP S6037530 B2 JPS6037530 B2 JP S6037530B2
Authority
JP
Japan
Prior art keywords
magnetic recording
recording media
base material
evaporation
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55072304A
Other languages
English (en)
Other versions
JPS56169229A (en
Inventor
紘一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=13485385&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPS6037530(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP55072304A priority Critical patent/JPS6037530B2/ja
Priority to DE8181302372T priority patent/DE3167572D1/de
Priority to US06/268,151 priority patent/US4386113A/en
Priority to EP81302372A priority patent/EP0043644B2/en
Publication of JPS56169229A publication Critical patent/JPS56169229A/ja
Publication of JPS6037530B2 publication Critical patent/JPS6037530B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/03—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
    • C04B35/04—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite based on magnesium oxide
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/03—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
    • C04B35/04—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite based on magnesium oxide
    • C04B35/053—Fine ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/20—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は、金属薄膜型の磁気記録媒体の製造方法に関す
るもので、具体的には真空雰囲気内で連続して高分子成
形物等の可操性基村上に強磁性薄膜層を形成する方法の
改良に関するもので、大量生産時の蒸発源の幅路を除く
ものである。
真空雰囲気内で高分子成形物の可裸性基材上に鉄系金属
を主材とする強磁性薄膜層を形成する手段は、真空蒸着
、スパッタリング、イオンプレーティング等が知られて
いるが、工業規模に最も近い位置にあるのは、電子ビー
ムのエネルギーを加熱手段に選んだ蒸着であろう。
しかしながら、電子ビーム加熱方式は歴史も浅く、特に
連続ないし半連続蒸着技術分野での実績は殆んどない。
また一方、実験室規模で利用されている電子ビーム蒸発
源の蒸発母村の容器は、強制的に水冷された銅製の容器
で、高純度薄漢が得られることを特長にしており、耐火
物の容器を用いることはその面からも好ましくないとい
われていた。しかし、熱効率の点から大量蒸発には耐火
物の利用が容易に考えられるが、鉄系の真空溶解のデー
タは存在するものの、蒸発に用いられる温度は溶解より
、数百度も高、常識的には困難であると考えられていた
。
本発明者は、第１図に示すように、各種のセラミック製
の容器１に鉄系金属を主体とした蒸発母材２をセットし
、加速した電子ビーム３を必要に応じて走査しながら衝
撃し、加熱蒸発させ、移動する高分子成形物等の可孫性
基村上に所定の膜厚の強磁性薄膜層を形成し、磁気記録
媒体としての最適化を図る検討を多数行なった。
用いられた鉄系金属は、Ｆｅ，Ｃｏ，Ｎｉおよびそれら
の合金ないいま２，３の添加元素を加えたものであり、
セラミックは、怪０，Ｚｒ０２，Ａｇｏ，山２０３，Ｓ
ｉ３Ｎ４，ＢＮ，スピネル等である。
これらの純度がまず検討される要素であるが、後述する
くり返し使用に耐えうる容器を実現するには、むしろあ
る範囲の主材料以外の酸化物の制御が必要であることが
判明した。綜合的に鉄系材料用の蒸発容器としては、Ｍ
ｇ○が選ばれるべきであり、Ｍｇ○の純度は、９７％〜
９８％で充分であり、むしろＮ２０３が０．５％以下、
好ましくは０．５〜０．２％，Ｓｉ０２が１％以下、好
ましくは１％〜０．４％に制御することが重要であるこ
とをつきとめ、本発明を完成したものである。
これらの制御は、特に磁気記録媒体の保磁力の長手方向
の均一性を確保する上に重要で、第２図に示すように本
発明によるＭｇ０を主材とした客器と、市販のＭざ０容
器をくり返し使用した時の磁気記録媒体の保磁力の変化
率を本発明品（特性Ａ）と従来品（特性Ｂ）とで比較し
た結果を示してあるのを見て明らかなように、本発明の
効果をはっきり知ることができる。
この図は、Ｆｅ，Ｃｏ，ＮｉおよびＦｅ−Ｎｉ，Ｃｏ−
Ｎｊ，Ｃｒ−Ｆｅ合金を主体に、蒸発速度３０夕／ｍｉ
ｎ９５００夕／ｍｊｎ，熔融金属量を平均５ｋ９〜３０
ｋ９の領域で実測した値の代表例である。
そして保磁力の変化率は、蒸着長１０００凧あたりの値
で、本発明により従釆不可能とされていた高品質の強磁
性薄膜層を大量蒸発により達成し、高密度磁気記録媒体
を実用に供し得ることができたことになり、その有価値
性は極めて大きい。
以上のように本発明の製造方法によれば、保磁力の変化
率が少ない磁気記録媒体を得ることができるものである
。
【図面の簡単な説明】
第１図は本発明の製造方法に用いる蒸発源の断面正面図
、第２図は本発明の製造方法による磁気記録媒体とそう
でない磁気記録媒体のヒートサイクル数に対する保磁力
の変化率特性図である。 １・・・・・・容器、２・・・・・・蒸発母材、３・・
・・・・加速電子ビーム。 第１図 第２図

Claims (1)

    【特許請求の範囲】
  1. １ ＭｇＯを主材とし他の含有酸化物のうち少なくとも
    Ａｌ＿２Ｏ＿３が０．５％以下、ＳｉＯ＿２が１％以下
    で構成した容器内に鉄系金属を主材料とする蒸発母材を
    配し、その蒸発母材を加速電子にて加熱蒸発して得た蒸
    気流にて強磁性薄膜層を高分子成形物等の基材上に形成
    することを特徴とする磁気記録媒体の製造方法。
JP55072304A 1980-05-29 1980-05-29 磁気記録媒体の製造方法 Expired JPS6037530B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP55072304A JPS6037530B2 (ja) 1980-05-29 1980-05-29 磁気記録媒体の製造方法
DE8181302372T DE3167572D1 (en) 1980-05-29 1981-05-29 Method of making a magnetic recording medium and a ceramic crucible for such a method
US06/268,151 US4386113A (en) 1980-05-29 1981-05-29 Method of making a magnetic recording medium
EP81302372A EP0043644B2 (en) 1980-05-29 1981-05-29 Method of making a magnetic recording medium and a ceramic crucible for such a method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55072304A JPS6037530B2 (ja) 1980-05-29 1980-05-29 磁気記録媒体の製造方法

Publications (2)

Publication Number Publication Date
JPS56169229A JPS56169229A (en) 1981-12-25
JPS6037530B2 true JPS6037530B2 (ja) 1985-08-27

Family

ID=13485385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55072304A Expired JPS6037530B2 (ja) 1980-05-29 1980-05-29 磁気記録媒体の製造方法

Country Status (4)

Country Link
US (1) US4386113A (ja)
EP (1) EP0043644B2 (ja)
JP (1) JPS6037530B2 (ja)
DE (1) DE3167572D1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0305292B1 (en) * 1987-08-24 1995-12-27 Sumitomo Electric Industries Limited A process for preparing a thin film of superconducting compound oxide
DE19539986A1 (de) * 1995-10-27 1997-04-30 Leybold Ag Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB688624A (en) * 1949-08-19 1953-03-11 Nat Res Dev Improvements in or relating to manufacture of refractory articles
JPS5953233B2 (ja) * 1975-07-21 1984-12-24 播磨耐火煉瓦 （株） 取鍋用塩基性耐火煉瓦
JPS5923049B2 (ja) * 1976-12-29 1984-05-30 富士通株式会社 高周波回路基板用絶縁セラミックス

Also Published As

Publication number Publication date
EP0043644B1 (en) 1984-12-05
JPS56169229A (en) 1981-12-25
EP0043644B2 (en) 1989-08-02
EP0043644A2 (en) 1982-01-13
US4386113A (en) 1983-05-31
EP0043644A3 (en) 1982-07-21
DE3167572D1 (en) 1985-01-17

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