JPS6036503A - 感光性樹脂 - Google Patents
感光性樹脂Info
- Publication number
- JPS6036503A JPS6036503A JP14588983A JP14588983A JPS6036503A JP S6036503 A JPS6036503 A JP S6036503A JP 14588983 A JP14588983 A JP 14588983A JP 14588983 A JP14588983 A JP 14588983A JP S6036503 A JPS6036503 A JP S6036503A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- group
- formula
- reaction
- chalcone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 title claims abstract description 15
- 229920005989 resin Polymers 0.000 title claims abstract description 15
- 229920001577 copolymer Polymers 0.000 claims abstract description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 8
- 230000001476 alcoholic effect Effects 0.000 claims abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 7
- 125000003545 alkoxy group Chemical group 0.000 claims abstract 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims abstract 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Natural products O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract 2
- 241001464430 Cyanobacterium Species 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract description 14
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract description 12
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract description 7
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract description 7
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract description 7
- GVSPXQVUXHMUMA-MDWZMJQESA-N (e)-3-(3,5-ditert-butyl-4-hydroxyphenyl)-1-(4-methoxyphenyl)prop-2-en-1-one Chemical compound C1=CC(OC)=CC=C1C(=O)\C=C\C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 GVSPXQVUXHMUMA-MDWZMJQESA-N 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 5
- BFLGEZGYYCQWRT-UHFFFAOYSA-N 4-(3-oxo-3-phenylprop-1-enyl)benzoic acid Chemical group C1=CC(C(=O)O)=CC=C1C=CC(=O)C1=CC=CC=C1 BFLGEZGYYCQWRT-UHFFFAOYSA-N 0.000 abstract description 3
- 150000007530 organic bases Chemical class 0.000 abstract description 3
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- SPSSULHKWOKEEL-UHFFFAOYSA-N 2,4,6-trinitrotoluene Chemical compound CC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O SPSSULHKWOKEEL-UHFFFAOYSA-N 0.000 abstract 1
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000012528 membrane Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical group C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 12
- 230000009102 absorption Effects 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 11
- 238000000862 absorption spectrum Methods 0.000 description 10
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- -1 polyethylene Polymers 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 229910052724 xenon Inorganic materials 0.000 description 5
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- DQFBYFPFKXHELB-UHFFFAOYSA-N Chalcone Natural products C=1C=CC=CC=1C(=O)C=CC1=CC=CC=C1 DQFBYFPFKXHELB-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 235000005513 chalcones Nutrition 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000007127 saponification reaction Methods 0.000 description 3
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 2
- KJHHAPASNNVTSN-KPKJPENVSA-N 4'-Methoxychalcone Chemical compound C1=CC(OC)=CC=C1C(=O)\C=C\C1=CC=CC=C1 KJHHAPASNNVTSN-KPKJPENVSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 description 1
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- XXFQFMHIIWSQAL-UHFFFAOYSA-N 4-(3-phenylprop-2-enoyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(=O)C=CC1=CC=CC=C1 XXFQFMHIIWSQAL-UHFFFAOYSA-N 0.000 description 1
- BIGSVSGNGXWVCJ-UHFFFAOYSA-N 4-[3-(4-cyanophenyl)-3-oxoprop-1-enyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C=CC(=O)C1=CC=C(C#N)C=C1 BIGSVSGNGXWVCJ-UHFFFAOYSA-N 0.000 description 1
- YKIGMBQDQYYDAH-UHFFFAOYSA-N 4-[3-(4-nitrophenyl)-3-oxoprop-1-enyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C=CC(=O)C1=CC=C([N+]([O-])=O)C=C1 YKIGMBQDQYYDAH-UHFFFAOYSA-N 0.000 description 1
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001788 chalcone derivatives Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14588983A JPS6036503A (ja) | 1983-08-10 | 1983-08-10 | 感光性樹脂 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14588983A JPS6036503A (ja) | 1983-08-10 | 1983-08-10 | 感光性樹脂 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6036503A true JPS6036503A (ja) | 1985-02-25 |
JPH0356243B2 JPH0356243B2 (enrdf_load_stackoverflow) | 1991-08-27 |
Family
ID=15395390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14588983A Granted JPS6036503A (ja) | 1983-08-10 | 1983-08-10 | 感光性樹脂 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6036503A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2765577A1 (fr) * | 1997-07-02 | 1999-01-08 | Hoechst Schering Agrevo Sa | Nouveaux amides aromatiques, leur procede de preparation et leur application comme pesticides |
KR100481014B1 (ko) * | 2002-10-04 | 2005-04-07 | 주식회사 동진쎄미켐 | 포토폴리머를 이용한 감광성 수지 조성물 |
-
1983
- 1983-08-10 JP JP14588983A patent/JPS6036503A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2765577A1 (fr) * | 1997-07-02 | 1999-01-08 | Hoechst Schering Agrevo Sa | Nouveaux amides aromatiques, leur procede de preparation et leur application comme pesticides |
WO1999001422A1 (en) * | 1997-07-02 | 1999-01-14 | Hoechst Schering Agrevo S.A. | Aromatic amides, their preparation process and their use as pesticides |
KR100481014B1 (ko) * | 2002-10-04 | 2005-04-07 | 주식회사 동진쎄미켐 | 포토폴리머를 이용한 감광성 수지 조성물 |
Also Published As
Publication number | Publication date |
---|---|
JPH0356243B2 (enrdf_load_stackoverflow) | 1991-08-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102278416B1 (ko) | 조성물 및 이를 이용한 디바이스의 제조 방법 | |
JPH05249683A (ja) | 感放射線性組成物 | |
FR2788060A1 (fr) | Polymere de revetement anti-reflecteur et procede de preparation | |
JP2000264921A (ja) | 有機反射防止重合体およびその製造方法 | |
JP7079647B2 (ja) | 組成物及びそれを用いたデバイスの製造方法 | |
Subramanian et al. | Photosensitive polymer: synthesis, characterization and properties of a polymer having pendant photocrosslinkable group | |
Nishikubo et al. | Study of photopolymers. XXXIV. Etherification and esterification reactions of polymers with (o, m, or p)‐bromomethylnitrobenzene using the DBU method and the photochemical properties of the resulting polymers | |
Merrill et al. | Photosensitive azide polymers | |
WO2005114331A1 (ja) | レジスト化合物およびレジスト組成物 | |
JPH01103602A (ja) | 放射線感応性化合物の又は該化合物に関する改良 | |
JPH11228536A (ja) | マレイミド系単量体とその製造方法、脂肪族環状オレフィン系単量体とその製造方法、共重合体樹脂とその製造方法、フォトレジストとその製造方法、および半導体素子 | |
JPH035739B2 (enrdf_load_stackoverflow) | ||
US5240811A (en) | Photogenerated polycarbodiimides from poly(tetrazole-5-thiones) and use in the preparation of coatings and deep-UV photoresists | |
JP7249198B2 (ja) | オニウム塩、組成物及びそれを用いたデバイスの製造方法 | |
JP2638887B2 (ja) | 感光性組成物 | |
NL8401365A (nl) | Werkwijze voor het maken van halfgeleiderinrichtingen. | |
CN1249824A (zh) | 包含新的光活性化合物的正性光刻胶 | |
JPH01190665A (ja) | スルホン酸エステル及び前記スルホン酸エステルを含むポジテイブ・レジスト | |
EP0390173A2 (en) | Micropattern-forming material and process for forming micropattern | |
FR2567659A1 (fr) | Materiaux de formation d'une image sensibles a un faisceau de haute energie, procede de formation et element obtenu | |
JPH02105803A (ja) | 置換スルホネート基を有する重合体化合物、この重合体化合物を含む感放射線性組成物および重合体化合物の製造方法 | |
KR910007246B1 (ko) | 감광성 내식막 조성물 | |
JPS6036503A (ja) | 感光性樹脂 | |
US2751373A (en) | Light-sensitive polymers for photomechanical processes | |
JP3093055B2 (ja) | 耐熱性ネガ型フォトレジスト組成物および感光性基材、ならびにネガ型パターン形成方法 |