JPS6036468B2 - 真空ア−クプラズマ装置 - Google Patents
真空ア−クプラズマ装置Info
- Publication number
- JPS6036468B2 JPS6036468B2 JP56503490A JP50349081A JPS6036468B2 JP S6036468 B2 JPS6036468 B2 JP S6036468B2 JP 56503490 A JP56503490 A JP 56503490A JP 50349081 A JP50349081 A JP 50349081A JP S6036468 B2 JPS6036468 B2 JP S6036468B2
- Authority
- JP
- Japan
- Prior art keywords
- solenoid
- cathode
- consumable
- consumable cathode
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- 238000010891 electric arc Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 6
- 230000003068 static effect Effects 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 230000001154 acute effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical group 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU802933851A SU1040631A1 (ru) | 1980-06-25 | 1980-06-25 | Вакуумно-дуговое устройство |
| SU2933851/18 | 1980-06-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57500931A JPS57500931A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-05-27 |
| JPS6036468B2 true JPS6036468B2 (ja) | 1985-08-20 |
Family
ID=20899404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56503490A Expired JPS6036468B2 (ja) | 1980-06-25 | 1981-03-02 | 真空ア−クプラズマ装置 |
Country Status (12)
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE34806E (en) * | 1980-11-25 | 1994-12-13 | Celestech, Inc. | Magnetoplasmadynamic processor, applications thereof and methods |
| CH657242A5 (de) * | 1982-03-22 | 1986-08-15 | Axenov Ivan I | Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken. |
| AT376460B (de) * | 1982-09-17 | 1984-11-26 | Kljuchko Gennady V | Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen |
| US5096558A (en) * | 1984-04-12 | 1992-03-17 | Plasco Dr. Ehrich Plasma - Coating Gmbh | Method and apparatus for evaporating material in vacuum |
| CH664768A5 (de) * | 1985-06-20 | 1988-03-31 | Balzers Hochvakuum | Verfahren zur beschichtung von substraten in einer vakuumkammer. |
| US4620913A (en) * | 1985-11-15 | 1986-11-04 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition method and apparatus |
| US4873605A (en) * | 1986-03-03 | 1989-10-10 | Innovex, Inc. | Magnetic treatment of ferromagnetic materials |
| US4816291A (en) * | 1987-08-19 | 1989-03-28 | The Regents Of The University Of California | Process for making diamond, doped diamond, diamond-cubic boron nitride composite films |
| US5601652A (en) * | 1989-08-03 | 1997-02-11 | United Technologies Corporation | Apparatus for applying ceramic coatings |
| DE4006456C1 (en) * | 1990-03-01 | 1991-05-29 | Balzers Ag, Balzers, Li | Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface |
| JPH0817171B2 (ja) * | 1990-12-31 | 1996-02-21 | 株式会社半導体エネルギー研究所 | プラズマ発生装置およびそれを用いたエッチング方法 |
| US5126030A (en) * | 1990-12-10 | 1992-06-30 | Kabushiki Kaisha Kobe Seiko Sho | Apparatus and method of cathodic arc deposition |
| CA2065581C (en) | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
| US5306408A (en) * | 1992-06-29 | 1994-04-26 | Ism Technologies, Inc. | Method and apparatus for direct ARC plasma deposition of ceramic coatings |
| US5282944A (en) * | 1992-07-30 | 1994-02-01 | The United States Of America As Represented By The United States Department Of Energy | Ion source based on the cathodic arc |
| US5480527A (en) * | 1994-04-25 | 1996-01-02 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
| US5670415A (en) * | 1994-05-24 | 1997-09-23 | Depositech, Inc. | Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment |
| US5518597A (en) * | 1995-03-28 | 1996-05-21 | Minnesota Mining And Manufacturing Company | Cathodic arc coating apparatus and method |
| US6144544A (en) * | 1996-10-01 | 2000-11-07 | Milov; Vladimir N. | Apparatus and method for material treatment using a magnetic field |
| US6103074A (en) * | 1998-02-14 | 2000-08-15 | Phygen, Inc. | Cathode arc vapor deposition method and apparatus |
| RU2178243C2 (ru) * | 1999-12-28 | 2002-01-10 | Российский Федеральный Ядерный Центр-Всероссийский Научно-исследовательский Институт Экспериментальной Физики | Устройство для получения плазмы на основе скользящего разряда |
| US6495002B1 (en) | 2000-04-07 | 2002-12-17 | Hy-Tech Research Corporation | Method and apparatus for depositing ceramic films by vacuum arc deposition |
| US7381311B2 (en) * | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
| US8157976B2 (en) * | 2007-04-26 | 2012-04-17 | Veeco Instruments, Inc. | Apparatus for cathodic vacuum-arc coating deposition |
| PT2585622T (pt) * | 2010-06-22 | 2018-04-20 | Oerlikon Surface Solutions Ag Pfaeffikon | Fonte de evaporação por arco com um campo elétrico definido |
| CN101956161A (zh) * | 2010-08-27 | 2011-01-26 | 苏州五方光电科技有限公司 | 离子镀膜装置 |
| US9153422B2 (en) | 2011-08-02 | 2015-10-06 | Envaerospace, Inc. | Arc PVD plasma source and method of deposition of nanoimplanted coatings |
| EP2607517A1 (en) * | 2011-12-22 | 2013-06-26 | Oerlikon Trading AG, Trübbach | Low temperature arc ion plating coating |
| KR101440316B1 (ko) * | 2014-04-30 | 2014-09-18 | 주식회사 유니벡 | 박막 코팅을 위한 진공 챔버 내부 아크 스팟 생성장치 |
| WO2020165990A1 (ja) * | 2019-02-14 | 2020-08-20 | 株式会社日立ハイテクノロジーズ | 半導体製造装置 |
| CN110277298A (zh) * | 2019-07-26 | 2019-09-24 | 江苏鲁汶仪器有限公司 | 一种射频旋转接头及设置有射频旋转接头的离子刻蚀系统 |
| UA127223C2 (uk) * | 2020-09-25 | 2023-06-14 | Національний Науковий Центр "Харківський Фізико-Технічний Інститут" | Спосіб створення вакуумно-дугової катодної плазми |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2972695A (en) * | 1957-05-24 | 1961-02-21 | Vickers Electrical Co Ltd | Stabilisation of low pressure d.c. arc discharges |
| SU307666A1 (ru) * | 1968-09-09 | 1979-01-08 | Sablev L P | Электродуговой испаритель металлов |
| US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
| US3836451A (en) * | 1968-12-26 | 1974-09-17 | A Snaper | Arc deposition apparatus |
| SU349325A1 (ru) * | 1970-10-19 | 1978-03-30 | Л. П. Саблев, Ю. И. Долотов, Л. И. Гетьман, В. Н. Горбунов, Е. Г. Гольдинер, К. Т. Киршфельд , В. В. Усов | Электродуговой испаритель металлов |
| US3793179A (en) * | 1971-07-19 | 1974-02-19 | L Sablev | Apparatus for metal evaporation coating |
| US3783231A (en) * | 1972-03-22 | 1974-01-01 | V Gorbunov | Apparatus for vacuum-evaporation of metals under the action of an electric arc |
| SU563826A1 (ru) * | 1975-06-04 | 1978-03-05 | Предприятие П/Я В-8851 | Устройство дл нанесени тонких пленок |
| JPS54110988A (en) * | 1978-01-31 | 1979-08-30 | Nii Chiefunorogii Afutomobirin | Coating vacuum evaporation apparatus |
-
1980
- 1980-06-25 SU SU802933851A patent/SU1040631A1/ru active
-
1981
- 1981-03-02 JP JP56503490A patent/JPS6036468B2/ja not_active Expired
- 1981-03-02 CH CH91282A patent/CH655632B/de not_active IP Right Cessation
- 1981-03-02 WO PCT/SU1981/000022 patent/WO1982000075A1/en active Application Filing
- 1981-03-02 DE DE3152131A patent/DE3152131C2/de not_active Expired
- 1981-03-02 GB GB8203756A patent/GB2092419B/en not_active Expired
- 1981-03-02 US US06/640,554 patent/US4551221A/en not_active Expired - Fee Related
- 1981-05-28 CA CA000378498A patent/CA1170315A/en not_active Expired
- 1981-06-15 BR BR8103781A patent/BR8103781A/pt unknown
- 1981-06-24 FR FR8112420A patent/FR2485863B1/fr not_active Expired
- 1981-06-24 IT IT48744/81A patent/IT1171327B/it active
-
1982
- 1982-02-16 SE SE8200941A patent/SE427003B/sv not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2485863B1 (fr) | 1986-12-12 |
| IT1171327B (it) | 1987-06-10 |
| SU1040631A1 (ru) | 1983-09-07 |
| SE427003B (sv) | 1983-02-21 |
| GB2092419B (en) | 1983-12-14 |
| SE8200941L (sv) | 1982-02-16 |
| FR2485863A1 (fr) | 1981-12-31 |
| US4551221A (en) | 1985-11-05 |
| DE3152131A1 (en) | 1982-08-26 |
| GB2092419A (en) | 1982-08-11 |
| JPS57500931A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-05-27 |
| DE3152131C2 (de) | 1986-09-04 |
| CA1170315A (en) | 1984-07-03 |
| IT8148744A0 (it) | 1981-06-24 |
| WO1982000075A1 (en) | 1982-01-07 |
| CH655632B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-04-30 |
| BR8103781A (pt) | 1982-03-09 |
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