Classifications

• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/48—Generating plasma using an arc
  • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/24—Vacuum evaporation
  • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
  • C23C14/325—Electric arc evaporation

Definitions

• ⁇ ⁇ a ⁇ m us ⁇ ys ⁇ ve with ⁇ m ⁇ schyu dug ⁇ v ⁇ g ⁇ ⁇ az ⁇ yada is ⁇ a ⁇ yae ⁇ sya ⁇ as ⁇ dueyy ⁇ a ⁇ d
• ⁇ b ⁇ azue ⁇ sya ⁇ lazmenny ⁇ - ⁇ is ⁇ a ⁇ yaem ⁇ g ⁇ ⁇ le ⁇ alla in siln ⁇ i ⁇ niz ⁇ vann ⁇ m s ⁇ s- ⁇ yani ⁇ ⁇ i vys ⁇ m value enesgi ⁇ and ⁇ ntsen ⁇ atsin chas- ⁇ its, ⁇ y za ⁇ em ⁇ ndensi ⁇ ue ⁇ sya, ⁇ b ⁇ azuya ⁇ y ⁇ e.
• the vacuum-arc plasma devices create an expanse plasma discharge of the evaporated material, the use of non-plasma application. There is a need for a plasma application: it is necessary to receive an opportunity to get rid of it.
• ⁇ - ⁇ of the vacant vacuum-arc devices / see autoswitch. ⁇ . '. " - 416759 on 25.II.74 / /, which is equipped with a separate appliance, connected with an anode, it is operated; electronic;
• a generatrix is generated by the operating process of a metallic appliance
• the pulse generator of the metal plasma is known (see ⁇ .8. ⁇ & physio ⁇ Communication ⁇ , B.. ⁇ a ⁇ d, s ⁇ sshy with ⁇ a ⁇ d ⁇ m s ⁇ len ⁇ id, ⁇ azmeschenny in s ⁇ len ⁇ ide an ⁇ d, ⁇ dzhigaschy ele ⁇ d.
• the aforementioned device increases the efficiency of use • of the evaporated material of the consumed product.
• an increase in the flow rate of the evaporated material of the consumable at the outlet of the device is limited to the partial loss of business by the manufacturer. Because of this, the generators described are not suitable for incinerating elec- tric products due to the presence of inconvenient electronic components.
• the device is equipped with a working unit, a direct coupled unit is located in the middle of the unit, and the unit is connected to the unit.
• the working anode 5 is secured inside the cylinder ⁇ , and the solenoid 4 is installed on the drive.
• P ⁇ l ⁇ vina chas ⁇ i 9 s ⁇ le ⁇ ida 4 na ⁇ di ⁇ sya for ⁇ d ⁇ iga ⁇ schim ele ⁇ d ⁇ l 6 s ⁇ e ⁇ ny, ⁇ - ⁇ iv ⁇ l ⁇ zhn ⁇ y ⁇ ab ⁇ chemu ⁇ tsu 3 ⁇ as ⁇ duem ⁇ g ⁇ ⁇ a ⁇ da I.
• the vacuum-arc device operates in the following way.

Landscapes

• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Plasma & Fusion (AREA)
• Physics & Mathematics (AREA)
• Metallurgy (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Materials Engineering (AREA)
• Mechanical Engineering (AREA)
• Spectroscopy & Molecular Physics (AREA)
• Organic Chemistry (AREA)
• Plasma Technology (AREA)
• Physical Vapour Deposition (AREA)
• Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
• ing And Chemical Polishing (AREA)
• Electron Sources, Ion Sources (AREA)
• Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)

Applications Claiming Priority (2)

Publications (1)

Family

ID=20899404

Family Applications (1)

Country Status (12)

Cited By (1)

Families Citing this family (31)

Citations (2)

Family Cites Families (7)

• 1980
  • 1980-06-25 SU SU802933851A patent/SU1040631A1/ru active
• 1981
  • 1981-03-02 WO PCT/SU1981/000022 patent/WO1982000075A1/en active Application Filing
  • 1981-03-02 GB GB8203756A patent/GB2092419B/en not_active Expired
  • 1981-03-02 JP JP56503490A patent/JPS6036468B2/ja not_active Expired
  • 1981-03-02 DE DE3152131A patent/DE3152131C2/de not_active Expired
  • 1981-03-02 US US06/640,554 patent/US4551221A/en not_active Expired - Fee Related
  • 1981-03-02 CH CH91282A patent/CH655632B/de not_active IP Right Cessation
  • 1981-05-28 CA CA000378498A patent/CA1170315A/en not_active Expired
  • 1981-06-15 BR BR8103781A patent/BR8103781A/pt unknown
  • 1981-06-24 IT IT48744/81A patent/IT1171327B/it active
  • 1981-06-24 FR FR8112420A patent/FR2485863B1/fr not_active Expired
• 1982
  • 1982-02-16 SE SE8200941A patent/SE427003B/sv not_active IP Right Cessation

Patent Citations (2)

Non-Patent Citations (1)

Also Published As

Similar Documents

Legal Events