JPS6033294A - 単結晶半導体引上装置 - Google Patents
単結晶半導体引上装置Info
- Publication number
- JPS6033294A JPS6033294A JP13925583A JP13925583A JPS6033294A JP S6033294 A JPS6033294 A JP S6033294A JP 13925583 A JP13925583 A JP 13925583A JP 13925583 A JP13925583 A JP 13925583A JP S6033294 A JPS6033294 A JP S6033294A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- double
- single crystal
- internal
- pulling device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title claims description 20
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000004020 conductor Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052710 silicon Inorganic materials 0.000 abstract description 18
- 239000010703 silicon Substances 0.000 abstract description 18
- 239000012535 impurity Substances 0.000 abstract description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 9
- 239000001301 oxygen Substances 0.000 abstract description 9
- 229910052760 oxygen Inorganic materials 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 6
- 230000000149 penetrating effect Effects 0.000 abstract 2
- 239000007858 starting material Substances 0.000 abstract 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 10
- 230000000704 physical effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000008710 crystal-8 Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000001012 protector Effects 0.000 description 3
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
- C30B15/305—Stirring of the melt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13925583A JPS6033294A (ja) | 1983-07-29 | 1983-07-29 | 単結晶半導体引上装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13925583A JPS6033294A (ja) | 1983-07-29 | 1983-07-29 | 単結晶半導体引上装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6033294A true JPS6033294A (ja) | 1985-02-20 |
JPH0359040B2 JPH0359040B2 (enrdf_load_stackoverflow) | 1991-09-09 |
Family
ID=15241041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13925583A Granted JPS6033294A (ja) | 1983-07-29 | 1983-07-29 | 単結晶半導体引上装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6033294A (enrdf_load_stackoverflow) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6311595A (ja) * | 1986-07-01 | 1988-01-19 | Sumitomo Electric Ind Ltd | 不純物の均一ド−ピング法 |
JPH01215788A (ja) * | 1988-02-22 | 1989-08-29 | Toshiba Corp | 結晶引上げ方法 |
JPH026382A (ja) * | 1988-06-13 | 1990-01-10 | Toshiba Ceramics Co Ltd | 単結晶引上げ装置 |
JPH0248492A (ja) * | 1988-08-08 | 1990-02-19 | Osaka Titanium Co Ltd | 単結晶成長装置 |
JPH0283295A (ja) * | 1988-09-20 | 1990-03-23 | Toshiba Ceramics Co Ltd | 単結晶引上げ装置 |
US5196085A (en) * | 1990-12-28 | 1993-03-23 | Massachusetts Institute Of Technology | Active magnetic flow control in Czochralski systems |
DE19700403B4 (de) * | 1996-01-12 | 2013-04-11 | Mitsubishi Materials Silicon Corp. | Einkristallziehvorrichtung |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5547300A (en) * | 1978-09-27 | 1980-04-03 | Sony Corp | Crystal pulling device |
JPS57149894A (en) * | 1981-03-09 | 1982-09-16 | Nippon Telegr & Teleph Corp <Ntt> | Method and apparatus for growing grystal |
-
1983
- 1983-07-29 JP JP13925583A patent/JPS6033294A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5547300A (en) * | 1978-09-27 | 1980-04-03 | Sony Corp | Crystal pulling device |
JPS57149894A (en) * | 1981-03-09 | 1982-09-16 | Nippon Telegr & Teleph Corp <Ntt> | Method and apparatus for growing grystal |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6311595A (ja) * | 1986-07-01 | 1988-01-19 | Sumitomo Electric Ind Ltd | 不純物の均一ド−ピング法 |
JPH01215788A (ja) * | 1988-02-22 | 1989-08-29 | Toshiba Corp | 結晶引上げ方法 |
JPH026382A (ja) * | 1988-06-13 | 1990-01-10 | Toshiba Ceramics Co Ltd | 単結晶引上げ装置 |
JPH0248492A (ja) * | 1988-08-08 | 1990-02-19 | Osaka Titanium Co Ltd | 単結晶成長装置 |
JPH0283295A (ja) * | 1988-09-20 | 1990-03-23 | Toshiba Ceramics Co Ltd | 単結晶引上げ装置 |
US5196085A (en) * | 1990-12-28 | 1993-03-23 | Massachusetts Institute Of Technology | Active magnetic flow control in Czochralski systems |
DE19700403B4 (de) * | 1996-01-12 | 2013-04-11 | Mitsubishi Materials Silicon Corp. | Einkristallziehvorrichtung |
Also Published As
Publication number | Publication date |
---|---|
JPH0359040B2 (enrdf_load_stackoverflow) | 1991-09-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6702892B2 (en) | Production device for high-quality silicon single crystals | |
US20100107968A1 (en) | Method and apparatus for producing a single crystal | |
CA1336061C (en) | High-oxygen-content silicon monocrystal substrate for semiconductor devices and production method therefor | |
JPS6046998A (ja) | 単結晶引上方法及びそのための装置 | |
CN1323196C (zh) | 单晶硅的制造方法及单晶硅以及硅晶片 | |
JPS6033294A (ja) | 単結晶半導体引上装置 | |
US6607594B2 (en) | Method for producing silicon single crystal | |
JPH0212920B2 (enrdf_load_stackoverflow) | ||
JP2688137B2 (ja) | シリコン単結晶の引上げ方法 | |
JPS6153187A (ja) | 単結晶成長装置 | |
JPS62153188A (ja) | ド−ピングされた単結晶の製造方法 | |
KR20050120707A (ko) | 단결정의 제조방법 | |
JPS6168389A (ja) | 単結晶成長装置 | |
JPS6036392A (ja) | 単結晶引上装置 | |
JPS6033296A (ja) | 単結晶半導体引上装置 | |
JP2000044387A (ja) | シリコン単結晶製造方法 | |
JP3018738B2 (ja) | 単結晶製造装置 | |
JPWO2002036861A1 (ja) | シリコン半導体単結晶の製造装置及び製造方法 | |
JPS61261288A (ja) | シリコン単結晶引上装置 | |
JPS6033297A (ja) | 単結晶半導体引上装置 | |
JPH01145391A (ja) | 単結晶引上装置 | |
JPS6033293A (ja) | 単結晶半導体引上装置 | |
JPS5891097A (ja) | 単結晶製造装置 | |
JPS6051691A (ja) | 単結晶半導体育成装置 | |
JPS6033287A (ja) | 単結晶半導体の製造方法 |