JPS6032363U - インライン式スパツタリング装置 - Google Patents

インライン式スパツタリング装置

Info

Publication number
JPS6032363U
JPS6032363U JP12329783U JP12329783U JPS6032363U JP S6032363 U JPS6032363 U JP S6032363U JP 12329783 U JP12329783 U JP 12329783U JP 12329783 U JP12329783 U JP 12329783U JP S6032363 U JPS6032363 U JP S6032363U
Authority
JP
Japan
Prior art keywords
chamber
sputtering
sputtering equipment
line sputtering
take
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12329783U
Other languages
English (en)
Japanese (ja)
Other versions
JPH02441Y2 (en, 2012
Inventor
隆 松本
小日向　久治
附田　武信
Original Assignee
日本真空技術株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本真空技術株式会社 filed Critical 日本真空技術株式会社
Priority to JP12329783U priority Critical patent/JPS6032363U/ja
Publication of JPS6032363U publication Critical patent/JPS6032363U/ja
Application granted granted Critical
Publication of JPH02441Y2 publication Critical patent/JPH02441Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP12329783U 1983-08-10 1983-08-10 インライン式スパツタリング装置 Granted JPS6032363U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12329783U JPS6032363U (ja) 1983-08-10 1983-08-10 インライン式スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12329783U JPS6032363U (ja) 1983-08-10 1983-08-10 インライン式スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS6032363U true JPS6032363U (ja) 1985-03-05
JPH02441Y2 JPH02441Y2 (en, 2012) 1990-01-08

Family

ID=30281504

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12329783U Granted JPS6032363U (ja) 1983-08-10 1983-08-10 インライン式スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS6032363U (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011013525A1 (ja) * 2009-07-30 2011-02-03 国立大学法人東北大学 プラズマ処理装置及びプリント配線基板の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3904506A (en) * 1972-11-13 1975-09-09 Shatterproof Glass Corp Apparatus for continuous production of sputter-coated glass products
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3904506A (en) * 1972-11-13 1975-09-09 Shatterproof Glass Corp Apparatus for continuous production of sputter-coated glass products
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011013525A1 (ja) * 2009-07-30 2011-02-03 国立大学法人東北大学 プラズマ処理装置及びプリント配線基板の製造方法
JP2011032508A (ja) * 2009-07-30 2011-02-17 Tohoku Univ 配線基板プラズマ処理装置及び配線基板の製造方法

Also Published As

Publication number Publication date
JPH02441Y2 (en, 2012) 1990-01-08

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