JPS6031261Y2 - ガス置換装置 - Google Patents
ガス置換装置Info
- Publication number
- JPS6031261Y2 JPS6031261Y2 JP4840779U JP4840779U JPS6031261Y2 JP S6031261 Y2 JPS6031261 Y2 JP S6031261Y2 JP 4840779 U JP4840779 U JP 4840779U JP 4840779 U JP4840779 U JP 4840779U JP S6031261 Y2 JPS6031261 Y2 JP S6031261Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- opening
- replacement
- wafer
- core tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4840779U JPS6031261Y2 (ja) | 1979-04-11 | 1979-04-11 | ガス置換装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4840779U JPS6031261Y2 (ja) | 1979-04-11 | 1979-04-11 | ガス置換装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55147742U JPS55147742U (enrdf_load_stackoverflow) | 1980-10-23 |
JPS6031261Y2 true JPS6031261Y2 (ja) | 1985-09-18 |
Family
ID=28932068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4840779U Expired JPS6031261Y2 (ja) | 1979-04-11 | 1979-04-11 | ガス置換装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6031261Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2549093Y2 (ja) * | 1987-06-22 | 1997-09-24 | 東京エレクトロン株式会社 | 石英延長管 |
-
1979
- 1979-04-11 JP JP4840779U patent/JPS6031261Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS55147742U (enrdf_load_stackoverflow) | 1980-10-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0727895B2 (ja) | 半導体ウエハーの処理方法と装置 | |
JPH04234119A (ja) | 半導体ウエハの処理装置および方法 | |
JPS6031261Y2 (ja) | ガス置換装置 | |
JP4355441B2 (ja) | 熱処理装置及び熱処理方法及び半導体デバイスの製造方法 | |
JP2510035Y2 (ja) | 熱処理炉 | |
JPH0465146B2 (enrdf_load_stackoverflow) | ||
JPH0342678Y2 (enrdf_load_stackoverflow) | ||
JPH05243365A (ja) | 基板熱処理装置 | |
JP2601083Y2 (ja) | 縦型熱処理装置 | |
JPH0582460A (ja) | 横型熱処理装置と熱処理方法 | |
JPS5943970B2 (ja) | 雰囲気熱処理炉における装入・抽出ベスチブルのパ−ジ方法 | |
JPH11135446A (ja) | 半導体基板に対する表面処理用炉心管装置 | |
JPH03257919A (ja) | 熱処理装置 | |
JP2734261B2 (ja) | 処理炉 | |
JPH086007Y2 (ja) | 真空炉 | |
JPH0473588A (ja) | 雰囲気炉 | |
JPH0226019A (ja) | 半導体ウエハの拡散装置 | |
JPS6127176Y2 (enrdf_load_stackoverflow) | ||
JP2883157B2 (ja) | 基板用縦型熱処理装置 | |
JP2002110575A (ja) | 熱処理装置 | |
JPS62193117A (ja) | ウエハ収納用治具 | |
JPS60211913A (ja) | 処理装置 | |
JPS6348950B2 (enrdf_load_stackoverflow) | ||
JPH0350394Y2 (enrdf_load_stackoverflow) | ||
JPH0351744Y2 (enrdf_load_stackoverflow) |