JPS6025231A - ヘキサメチルジシラザンの塗布方法及びその装置 - Google Patents

ヘキサメチルジシラザンの塗布方法及びその装置

Info

Publication number
JPS6025231A
JPS6025231A JP13309683A JP13309683A JPS6025231A JP S6025231 A JPS6025231 A JP S6025231A JP 13309683 A JP13309683 A JP 13309683A JP 13309683 A JP13309683 A JP 13309683A JP S6025231 A JPS6025231 A JP S6025231A
Authority
JP
Japan
Prior art keywords
substrate
container
nitrogen gas
hexamethyldisilazane
hmds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13309683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6235264B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Hiroshi Oota
浩 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP13309683A priority Critical patent/JPS6025231A/ja
Publication of JPS6025231A publication Critical patent/JPS6025231A/ja
Publication of JPS6235264B2 publication Critical patent/JPS6235264B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP13309683A 1983-07-20 1983-07-20 ヘキサメチルジシラザンの塗布方法及びその装置 Granted JPS6025231A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13309683A JPS6025231A (ja) 1983-07-20 1983-07-20 ヘキサメチルジシラザンの塗布方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13309683A JPS6025231A (ja) 1983-07-20 1983-07-20 ヘキサメチルジシラザンの塗布方法及びその装置

Publications (2)

Publication Number Publication Date
JPS6025231A true JPS6025231A (ja) 1985-02-08
JPS6235264B2 JPS6235264B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-07-31

Family

ID=15096737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13309683A Granted JPS6025231A (ja) 1983-07-20 1983-07-20 ヘキサメチルジシラザンの塗布方法及びその装置

Country Status (1)

Country Link
JP (1) JPS6025231A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6221140A (ja) * 1985-07-22 1987-01-29 Fujitsu Ltd レジスト密着剤の保管方法
JPS62120031A (ja) * 1985-11-14 1987-06-01 ワツカ−・ケミトロニク・ゲゼルシヤフト・フユア・エレクトロニク・グルントシユトツフエ・ミツト・ベシユレンクテル・ハフツング 研磨したケイ素表面の保護方法
JPS62211643A (ja) * 1986-03-12 1987-09-17 Mitsubishi Electric Corp 密着強化剤塗布方法
US9244358B2 (en) 2008-10-21 2016-01-26 Tokyo Ohka Kogyo Co., Ltd. Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6221140A (ja) * 1985-07-22 1987-01-29 Fujitsu Ltd レジスト密着剤の保管方法
JPS62120031A (ja) * 1985-11-14 1987-06-01 ワツカ−・ケミトロニク・ゲゼルシヤフト・フユア・エレクトロニク・グルントシユトツフエ・ミツト・ベシユレンクテル・ハフツング 研磨したケイ素表面の保護方法
JPS62211643A (ja) * 1986-03-12 1987-09-17 Mitsubishi Electric Corp 密着強化剤塗布方法
US9244358B2 (en) 2008-10-21 2016-01-26 Tokyo Ohka Kogyo Co., Ltd. Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate
KR20160114736A (ko) 2008-10-21 2016-10-05 도오꾜오까고오교 가부시끼가이샤 표면 처리액 및 표면 처리 방법, 그리고 소수화 처리 방법 및 소수화된 기판
KR20180095121A (ko) 2008-10-21 2018-08-24 도오꾜오까고오교 가부시끼가이샤 표면 처리액 및 표면 처리 방법, 그리고 소수화 처리 방법 및 소수화된 기판
KR20190088577A (ko) 2008-10-21 2019-07-26 도오꾜오까고오교 가부시끼가이샤 표면 처리액 및 표면 처리 방법, 그리고 소수화 처리 방법 및 소수화된 기판

Also Published As

Publication number Publication date
JPS6235264B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-07-31

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