JPS60251273A - 真空蒸発装置の蒸発量制御方法 - Google Patents

真空蒸発装置の蒸発量制御方法

Info

Publication number
JPS60251273A
JPS60251273A JP59106396A JP10639684A JPS60251273A JP S60251273 A JPS60251273 A JP S60251273A JP 59106396 A JP59106396 A JP 59106396A JP 10639684 A JP10639684 A JP 10639684A JP S60251273 A JPS60251273 A JP S60251273A
Authority
JP
Japan
Prior art keywords
evaporation
shutter
amount
control
extent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59106396A
Other languages
English (en)
Japanese (ja)
Other versions
JPH037751B2 (OSRAM
Inventor
Yoshio Shimozato
下里　省夫
Tetsuyoshi Wada
哲義 和田
Kenichi Yanagi
謙一 柳
Mitsuo Kato
光雄 加藤
Heizaburo Furukawa
古川　平三郎
Kanji Wake
和気　完治
Arihiko Morita
森田　有彦
Norio Tsukiji
築地　憲夫
Takuya Aiko
愛甲　琢哉
Toshiharu Kikko
橘高　敏晴
Koji Nakanishi
康二 中西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP59106396A priority Critical patent/JPS60251273A/ja
Priority to CA000481704A priority patent/CA1249491A/en
Priority to US06/735,442 priority patent/US4587134A/en
Priority to EP85106511A priority patent/EP0166960B1/en
Priority to DE8585106511T priority patent/DE3583829D1/de
Priority to AU43056/85A priority patent/AU574469B2/en
Priority to KR1019850003652A priority patent/KR890004044B1/ko
Publication of JPS60251273A publication Critical patent/JPS60251273A/ja
Publication of JPH037751B2 publication Critical patent/JPH037751B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP59106396A 1984-05-28 1984-05-28 真空蒸発装置の蒸発量制御方法 Granted JPS60251273A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP59106396A JPS60251273A (ja) 1984-05-28 1984-05-28 真空蒸発装置の蒸発量制御方法
CA000481704A CA1249491A (en) 1984-05-28 1985-05-16 Method of rapidly changing deposition amount in a continuous vacuum deposition process
US06/735,442 US4587134A (en) 1984-05-28 1985-05-17 Method of rapidly changing deposition amount in a continuous vacuum deposition process
EP85106511A EP0166960B1 (en) 1984-05-28 1985-05-24 Method of rapidly changing deposition amount in a continuous vacuum deposition process
DE8585106511T DE3583829D1 (de) 1984-05-28 1985-05-24 Verfahren zur raschen veraenderung der abgeschiedenen menge beim kontinuierlichen bedampfen.
AU43056/85A AU574469B2 (en) 1984-05-28 1985-05-28 Changing rate of deposition of metal in vacuum evaporation process
KR1019850003652A KR890004044B1 (ko) 1984-05-28 1985-05-28 연속 증착 공정에서의 부착량 급속 변화 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59106396A JPS60251273A (ja) 1984-05-28 1984-05-28 真空蒸発装置の蒸発量制御方法

Publications (2)

Publication Number Publication Date
JPS60251273A true JPS60251273A (ja) 1985-12-11
JPH037751B2 JPH037751B2 (OSRAM) 1991-02-04

Family

ID=14432526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59106396A Granted JPS60251273A (ja) 1984-05-28 1984-05-28 真空蒸発装置の蒸発量制御方法

Country Status (7)

Country Link
US (1) US4587134A (OSRAM)
EP (1) EP0166960B1 (OSRAM)
JP (1) JPS60251273A (OSRAM)
KR (1) KR890004044B1 (OSRAM)
AU (1) AU574469B2 (OSRAM)
CA (1) CA1249491A (OSRAM)
DE (1) DE3583829D1 (OSRAM)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267465A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 連続真空蒸着装置の蒸着室内における溶融金属表面の汚れ検出方法
JPS62267471A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
JPS648265A (en) * 1987-06-30 1989-01-12 Mitsubishi Heavy Ind Ltd Method for controlling evaporation rate of vacuum deposition device
JPS6465257A (en) * 1987-09-07 1989-03-10 Mitsubishi Heavy Ind Ltd Method for controlling amount of evaporation in vacuum deposition device
JP2004504487A (ja) * 2000-07-17 2004-02-12 コールス　テクノロジー　ベー．フェー． 蒸着方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4898746A (en) * 1988-06-28 1990-02-06 Rca Licensing Corporation Material deposition process analysis system
DE4442733C2 (de) * 1994-12-01 2001-04-26 Ardenne Anlagentech Gmbh Einrichtung zur Bedampfung bandförmiger Substrate im Vakuum
TW340876B (en) * 1996-03-27 1998-09-21 Nisshin Steel Co Ltd Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor
US5951769A (en) * 1997-06-04 1999-09-14 Crown Roll Leaf, Inc. Method and apparatus for making high refractive index (HRI) film
US6254934B1 (en) * 1998-07-29 2001-07-03 Litton Systems, Inc. Method for controlled deposition of mirror layers
EP1972699A1 (fr) * 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
US9458533B2 (en) * 2007-12-21 2016-10-04 Advanced Galvanisation Ag Method and devices for controlling a vapour flow in vacuum evaporation
EP2199425A1 (fr) * 2008-12-18 2010-06-23 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)
US20120052189A1 (en) * 2010-08-30 2012-03-01 Litian Liu Vapor deposition system
KR102007697B1 (ko) * 2013-02-28 2019-08-06 삼성에스디아이 주식회사 이차전지용 전극 제조 장치
TWI582251B (zh) * 2014-10-31 2017-05-11 財團法人工業技術研究院 蒸鍍系統以及蒸鍍方法
CN104988462B (zh) * 2015-07-23 2017-05-31 京东方科技集团股份有限公司 一种坩埚装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2440135A (en) * 1944-08-04 1948-04-20 Alexander Paul Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers
GB1010456A (en) * 1962-10-02 1965-11-17 G V Planer Ltd Means for measuring and/or controlling the evaporation rate in vacuum evaporation processes
US3281265A (en) * 1963-09-17 1966-10-25 United States Steel Corp Method and apparatus for controlling coating thickness by electron beam evaporation
US3602190A (en) * 1968-10-30 1971-08-31 Western Electric Co Multiple vaporizing system
US3690933A (en) * 1970-05-21 1972-09-12 Republic Steel Corp Apparatus and method for continuously condensing metal vapor upon a substrate
BE789818A (fr) * 1971-10-07 1973-04-06 Du Pont Composes de polycetal
BE790940A (fr) * 1971-11-04 1973-03-01 Rca Corp Procede de reglage de la composition d'un film
GB1483966A (en) * 1974-10-23 1977-08-24 Sharp Kk Vapourized-metal cluster ion source and ionized-cluster beam deposition
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US3971334A (en) * 1975-03-04 1976-07-27 Xerox Corporation Coating device
JPS5210869A (en) * 1975-07-15 1977-01-27 Toshinori Takagi Thin film forming method
DE2548357C2 (de) * 1975-10-29 1983-05-26 Robert Bosch Gmbh, 7000 Stuttgart Einrichtung zur kontinuierlichen Vakuumbedampfung eines bandförmigen Trägermaterials mit Zink
US4425871A (en) * 1981-02-09 1984-01-17 Applied Magnetics Corporation Apparatus for sensing deposition of a thin film layer of a material
CA1163231A (en) * 1981-07-24 1984-03-06 Don E. Brodie Reactive plating method and product
US4495889A (en) * 1982-11-24 1985-01-29 Riley Thomas J Polymeric film coating apparatus
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267465A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 連続真空蒸着装置の蒸着室内における溶融金属表面の汚れ検出方法
JPS62267471A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
JPS648265A (en) * 1987-06-30 1989-01-12 Mitsubishi Heavy Ind Ltd Method for controlling evaporation rate of vacuum deposition device
JPS6465257A (en) * 1987-09-07 1989-03-10 Mitsubishi Heavy Ind Ltd Method for controlling amount of evaporation in vacuum deposition device
JP2004504487A (ja) * 2000-07-17 2004-02-12 コールス　テクノロジー　ベー．フェー． 蒸着方法

Also Published As

Publication number Publication date
KR890004044B1 (ko) 1989-10-18
US4587134A (en) 1986-05-06
EP0166960A2 (en) 1986-01-08
DE3583829D1 (de) 1991-09-26
AU574469B2 (en) 1988-07-07
KR850008503A (ko) 1985-12-18
EP0166960A3 (en) 1988-03-30
EP0166960B1 (en) 1991-08-21
JPH037751B2 (OSRAM) 1991-02-04
AU4305685A (en) 1985-12-05
CA1249491A (en) 1989-01-31

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