AU574469B2 - Changing rate of deposition of metal in vacuum evaporation process - Google Patents

Changing rate of deposition of metal in vacuum evaporation process

Info

Publication number
AU574469B2
AU574469B2 AU43056/85A AU4305685A AU574469B2 AU 574469 B2 AU574469 B2 AU 574469B2 AU 43056/85 A AU43056/85 A AU 43056/85A AU 4305685 A AU4305685 A AU 4305685A AU 574469 B2 AU574469 B2 AU 574469B2
Authority
AU
Australia
Prior art keywords
deposition
metal
vacuum evaporation
evaporation process
changing rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU43056/85A
Other languages
English (en)
Other versions
AU4305685A (en
Inventor
Takuya Aiko
Heizaburo Furukawa
Mitsuo Kato
Toshiharu Kittaka
Arihiko Morita
Yasuji Nakanishi
Yoshio Shimozato
Norio Tsukiji
Tetsuyoshi Wada
Kanji Wake
Kenichi Yanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Publication of AU4305685A publication Critical patent/AU4305685A/en
Application granted granted Critical
Publication of AU574469B2 publication Critical patent/AU574469B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AU43056/85A 1984-05-28 1985-05-28 Changing rate of deposition of metal in vacuum evaporation process Ceased AU574469B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59-106396 1984-05-28
JP59106396A JPS60251273A (ja) 1984-05-28 1984-05-28 真空蒸発装置の蒸発量制御方法

Publications (2)

Publication Number Publication Date
AU4305685A AU4305685A (en) 1985-12-05
AU574469B2 true AU574469B2 (en) 1988-07-07

Family

ID=14432526

Family Applications (1)

Application Number Title Priority Date Filing Date
AU43056/85A Ceased AU574469B2 (en) 1984-05-28 1985-05-28 Changing rate of deposition of metal in vacuum evaporation process

Country Status (7)

Country Link
US (1) US4587134A (OSRAM)
EP (1) EP0166960B1 (OSRAM)
JP (1) JPS60251273A (OSRAM)
KR (1) KR890004044B1 (OSRAM)
AU (1) AU574469B2 (OSRAM)
CA (1) CA1249491A (OSRAM)
DE (1) DE3583829D1 (OSRAM)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267471A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
JPS62267465A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 連続真空蒸着装置の蒸着室内における溶融金属表面の汚れ検出方法
JPS648265A (en) * 1987-06-30 1989-01-12 Mitsubishi Heavy Ind Ltd Method for controlling evaporation rate of vacuum deposition device
JPS6465257A (en) * 1987-09-07 1989-03-10 Mitsubishi Heavy Ind Ltd Method for controlling amount of evaporation in vacuum deposition device
US4898746A (en) * 1988-06-28 1990-02-06 Rca Licensing Corporation Material deposition process analysis system
DE4442733C2 (de) * 1994-12-01 2001-04-26 Ardenne Anlagentech Gmbh Einrichtung zur Bedampfung bandförmiger Substrate im Vakuum
TW340876B (en) * 1996-03-27 1998-09-21 Nisshin Steel Co Ltd Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor
US5951769A (en) * 1997-06-04 1999-09-14 Crown Roll Leaf, Inc. Method and apparatus for making high refractive index (HRI) film
US6254934B1 (en) * 1998-07-29 2001-07-03 Litton Systems, Inc. Method for controlled deposition of mirror layers
EP1174526A1 (en) * 2000-07-17 2002-01-23 Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO Continuous vapour deposition
EP1972699A1 (fr) * 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
US9458533B2 (en) * 2007-12-21 2016-10-04 Advanced Galvanisation Ag Method and devices for controlling a vapour flow in vacuum evaporation
EP2199425A1 (fr) * 2008-12-18 2010-06-23 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)
US20120052189A1 (en) * 2010-08-30 2012-03-01 Litian Liu Vapor deposition system
KR102007697B1 (ko) * 2013-02-28 2019-08-06 삼성에스디아이 주식회사 이차전지용 전극 제조 장치
TWI582251B (zh) * 2014-10-31 2017-05-11 財團法人工業技術研究院 蒸鍍系統以及蒸鍍方法
CN104988462B (zh) * 2015-07-23 2017-05-31 京东方科技集团股份有限公司 一种坩埚装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4374162A (en) * 1975-07-15 1983-02-15 Futaba Denshi Kogyo Kabushiki Kaisha Thin-film deposition
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2440135A (en) * 1944-08-04 1948-04-20 Alexander Paul Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers
GB1010456A (en) * 1962-10-02 1965-11-17 G V Planer Ltd Means for measuring and/or controlling the evaporation rate in vacuum evaporation processes
US3281265A (en) * 1963-09-17 1966-10-25 United States Steel Corp Method and apparatus for controlling coating thickness by electron beam evaporation
US3602190A (en) * 1968-10-30 1971-08-31 Western Electric Co Multiple vaporizing system
US3690933A (en) * 1970-05-21 1972-09-12 Republic Steel Corp Apparatus and method for continuously condensing metal vapor upon a substrate
BE789818A (fr) * 1971-10-07 1973-04-06 Du Pont Composes de polycetal
BE790940A (fr) * 1971-11-04 1973-03-01 Rca Corp Procede de reglage de la composition d'un film
GB1483966A (en) * 1974-10-23 1977-08-24 Sharp Kk Vapourized-metal cluster ion source and ionized-cluster beam deposition
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US3971334A (en) * 1975-03-04 1976-07-27 Xerox Corporation Coating device
DE2548357C2 (de) * 1975-10-29 1983-05-26 Robert Bosch Gmbh, 7000 Stuttgart Einrichtung zur kontinuierlichen Vakuumbedampfung eines bandförmigen Trägermaterials mit Zink
US4425871A (en) * 1981-02-09 1984-01-17 Applied Magnetics Corporation Apparatus for sensing deposition of a thin film layer of a material
CA1163231A (en) * 1981-07-24 1984-03-06 Don E. Brodie Reactive plating method and product
US4495889A (en) * 1982-11-24 1985-01-29 Riley Thomas J Polymeric film coating apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4374162A (en) * 1975-07-15 1983-02-15 Futaba Denshi Kogyo Kabushiki Kaisha Thin-film deposition
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment

Also Published As

Publication number Publication date
KR890004044B1 (ko) 1989-10-18
US4587134A (en) 1986-05-06
EP0166960A2 (en) 1986-01-08
DE3583829D1 (de) 1991-09-26
KR850008503A (ko) 1985-12-18
EP0166960A3 (en) 1988-03-30
EP0166960B1 (en) 1991-08-21
JPS60251273A (ja) 1985-12-11
JPH037751B2 (OSRAM) 1991-02-04
AU4305685A (en) 1985-12-05
CA1249491A (en) 1989-01-31

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