JPS60238133A - 真空処理装置 - Google Patents

真空処理装置

Info

Publication number
JPS60238133A
JPS60238133A JP7627084A JP7627084A JPS60238133A JP S60238133 A JPS60238133 A JP S60238133A JP 7627084 A JP7627084 A JP 7627084A JP 7627084 A JP7627084 A JP 7627084A JP S60238133 A JPS60238133 A JP S60238133A
Authority
JP
Japan
Prior art keywords
support plate
lock chamber
vacuum
load lock
vacuum container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7627084A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6257377B2 (enrdf_load_stackoverflow
Inventor
Kyoji Kinokiri
恭治 木ノ切
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP7627084A priority Critical patent/JPS60238133A/ja
Publication of JPS60238133A publication Critical patent/JPS60238133A/ja
Publication of JPS6257377B2 publication Critical patent/JPS6257377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP7627084A 1984-04-16 1984-04-16 真空処理装置 Granted JPS60238133A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7627084A JPS60238133A (ja) 1984-04-16 1984-04-16 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7627084A JPS60238133A (ja) 1984-04-16 1984-04-16 真空処理装置

Publications (2)

Publication Number Publication Date
JPS60238133A true JPS60238133A (ja) 1985-11-27
JPS6257377B2 JPS6257377B2 (enrdf_load_stackoverflow) 1987-12-01

Family

ID=13600541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7627084A Granted JPS60238133A (ja) 1984-04-16 1984-04-16 真空処理装置

Country Status (1)

Country Link
JP (1) JPS60238133A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04124274A (ja) * 1990-09-13 1992-04-24 Hitachi Electron Eng Co Ltd 気相反応装置
WO2001053561A1 (de) * 2000-01-18 2001-07-26 Unaxis Balzers Ag Sputterkammer sowie vakuumtransportkammer und vakuumbehandlungsanlagen mit solchen kammern
JP2002198413A (ja) * 2000-10-04 2002-07-12 Boc Group Inc:The 真空チャンバロードロック構造及び物品搬送機構
JP2002285332A (ja) * 2001-03-27 2002-10-03 Shibaura Mechatronics Corp 真空処理装置
US6899795B1 (en) 2000-01-18 2005-05-31 Unaxis Balzers Aktiengesellschaft Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6570016B1 (ja) * 2018-04-05 2019-09-04 株式会社クラフト スパッタリング装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04124274A (ja) * 1990-09-13 1992-04-24 Hitachi Electron Eng Co Ltd 気相反応装置
WO2001053561A1 (de) * 2000-01-18 2001-07-26 Unaxis Balzers Ag Sputterkammer sowie vakuumtransportkammer und vakuumbehandlungsanlagen mit solchen kammern
JP2003520297A (ja) * 2000-01-18 2003-07-02 ユナキス・バルツェルス・アクチェンゲゼルシャフト スパッタチャンバならびに真空輸送チャンバおよびこれらのチャンバを備えた真空処理装置
US6899795B1 (en) 2000-01-18 2005-05-31 Unaxis Balzers Aktiengesellschaft Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
US7033471B2 (en) * 2000-01-18 2006-04-25 Unaxis Balzers Aktiengesellschaft Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
JP2002198413A (ja) * 2000-10-04 2002-07-12 Boc Group Inc:The 真空チャンバロードロック構造及び物品搬送機構
JP2002285332A (ja) * 2001-03-27 2002-10-03 Shibaura Mechatronics Corp 真空処理装置

Also Published As

Publication number Publication date
JPS6257377B2 (enrdf_load_stackoverflow) 1987-12-01

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