JPS6257377B2 - - Google Patents
Info
- Publication number
- JPS6257377B2 JPS6257377B2 JP7627084A JP7627084A JPS6257377B2 JP S6257377 B2 JPS6257377 B2 JP S6257377B2 JP 7627084 A JP7627084 A JP 7627084A JP 7627084 A JP7627084 A JP 7627084A JP S6257377 B2 JPS6257377 B2 JP S6257377B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- load lock
- lock chamber
- support plate
- vacuum container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Drying Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7627084A JPS60238133A (ja) | 1984-04-16 | 1984-04-16 | 真空処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7627084A JPS60238133A (ja) | 1984-04-16 | 1984-04-16 | 真空処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60238133A JPS60238133A (ja) | 1985-11-27 |
JPS6257377B2 true JPS6257377B2 (enrdf_load_stackoverflow) | 1987-12-01 |
Family
ID=13600541
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7627084A Granted JPS60238133A (ja) | 1984-04-16 | 1984-04-16 | 真空処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60238133A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019183213A (ja) * | 2018-04-05 | 2019-10-24 | 株式会社クラフト | スパッタリング装置 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2631763B2 (ja) * | 1990-09-13 | 1997-07-16 | 日立電子エンジニアリング 株式会社 | 気相反応装置 |
US6899795B1 (en) | 2000-01-18 | 2005-05-31 | Unaxis Balzers Aktiengesellschaft | Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers |
WO2001053561A1 (de) * | 2000-01-18 | 2001-07-26 | Unaxis Balzers Ag | Sputterkammer sowie vakuumtransportkammer und vakuumbehandlungsanlagen mit solchen kammern |
US6609877B1 (en) * | 2000-10-04 | 2003-08-26 | The Boc Group, Inc. | Vacuum chamber load lock structure and article transport mechanism |
JP4702867B2 (ja) * | 2001-03-27 | 2011-06-15 | 芝浦メカトロニクス株式会社 | 真空処理装置 |
-
1984
- 1984-04-16 JP JP7627084A patent/JPS60238133A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019183213A (ja) * | 2018-04-05 | 2019-10-24 | 株式会社クラフト | スパッタリング装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS60238133A (ja) | 1985-11-27 |