JPS60224778A - セラミツクス被覆硬質部品 - Google Patents
セラミツクス被覆硬質部品Info
- Publication number
- JPS60224778A JPS60224778A JP8252284A JP8252284A JPS60224778A JP S60224778 A JPS60224778 A JP S60224778A JP 8252284 A JP8252284 A JP 8252284A JP 8252284 A JP8252284 A JP 8252284A JP S60224778 A JPS60224778 A JP S60224778A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- ceramic
- coated
- hard
- amorphous state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 75
- 229910052796 boron Inorganic materials 0.000 claims abstract description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 3
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 3
- 239000010409 thin film Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 229910000997 High-speed steel Inorganic materials 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 16
- 239000000853 adhesive Substances 0.000 abstract description 14
- 230000001070 adhesive effect Effects 0.000 abstract description 14
- 238000010849 ion bombardment Methods 0.000 abstract description 5
- 239000002344 surface layer Substances 0.000 abstract description 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 2
- 239000000956 alloy Substances 0.000 abstract description 2
- 229910052723 transition metal Inorganic materials 0.000 abstract description 2
- 150000003624 transition metals Chemical class 0.000 abstract description 2
- 238000007733 ion plating Methods 0.000 abstract 1
- 230000000737 periodic effect Effects 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 37
- 239000011248 coating agent Substances 0.000 description 36
- 239000010408 film Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 21
- 238000005520 cutting process Methods 0.000 description 17
- 239000000758 substrate Substances 0.000 description 12
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 10
- 125000004429 atom Chemical group 0.000 description 9
- 239000010410 layer Substances 0.000 description 7
- 238000005524 ceramic coating Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000010062 adhesion mechanism Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/0027—Ion-implantation, ion-irradiation or ion-injection
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8252284A JPS60224778A (ja) | 1984-04-23 | 1984-04-23 | セラミツクス被覆硬質部品 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8252284A JPS60224778A (ja) | 1984-04-23 | 1984-04-23 | セラミツクス被覆硬質部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60224778A true JPS60224778A (ja) | 1985-11-09 |
JPH0250983B2 JPH0250983B2 (enrdf_load_stackoverflow) | 1990-11-06 |
Family
ID=13776859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8252284A Granted JPS60224778A (ja) | 1984-04-23 | 1984-04-23 | セラミツクス被覆硬質部品 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60224778A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63297578A (ja) * | 1987-05-29 | 1988-12-05 | Fuji Dies Kk | 銅加工用工具 |
US4801510A (en) * | 1987-09-02 | 1989-01-31 | Kennametal Inc. | Alumina coated silcon carbide whisker-alumina composition |
JPH01139751A (ja) * | 1987-11-25 | 1989-06-01 | Kobe Steel Ltd | セラミックス硬質膜被覆方法 |
US5264297A (en) * | 1990-03-09 | 1993-11-23 | Kennametal Inc. | Physical vapor deposition of titanium nitride on a nonconductive substrate |
JP2704317B2 (ja) * | 1990-03-09 | 1998-01-26 | ケンナメタル インコーポレイテツド | 窒化チタニウムの非電導体基板上への物理的蒸着 |
JP2010228087A (ja) * | 2009-03-30 | 2010-10-14 | Mitsubishi Materials Corp | 表面被覆立方晶窒化ほう素基超高圧焼結材料製切削工具 |
-
1984
- 1984-04-23 JP JP8252284A patent/JPS60224778A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63297578A (ja) * | 1987-05-29 | 1988-12-05 | Fuji Dies Kk | 銅加工用工具 |
US4801510A (en) * | 1987-09-02 | 1989-01-31 | Kennametal Inc. | Alumina coated silcon carbide whisker-alumina composition |
JPH01139751A (ja) * | 1987-11-25 | 1989-06-01 | Kobe Steel Ltd | セラミックス硬質膜被覆方法 |
US5264297A (en) * | 1990-03-09 | 1993-11-23 | Kennametal Inc. | Physical vapor deposition of titanium nitride on a nonconductive substrate |
JP2704317B2 (ja) * | 1990-03-09 | 1998-01-26 | ケンナメタル インコーポレイテツド | 窒化チタニウムの非電導体基板上への物理的蒸着 |
US5858181A (en) * | 1990-03-09 | 1999-01-12 | Kennametal Inc. | Physical vapor deposition of titanium nitride on a nonconductive substrate |
JP2010228087A (ja) * | 2009-03-30 | 2010-10-14 | Mitsubishi Materials Corp | 表面被覆立方晶窒化ほう素基超高圧焼結材料製切削工具 |
Also Published As
Publication number | Publication date |
---|---|
JPH0250983B2 (enrdf_load_stackoverflow) | 1990-11-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Voevodin et al. | Nanocrystalline WC and WC/a-C composite coatings produced from intersected plasma fluxes at low deposition temperatures | |
CA2108845C (en) | Method of making synthetic diamond film | |
EP0474369A1 (en) | Diamond-like carbon coatings | |
JPS60262961A (ja) | 時計の側 | |
SE453403B (sv) | Alster overdraget med hoggradigt hart material, forfarande for dess framstellning samt anvendning av alstret | |
KR20000005021A (ko) | 붕소와 질소를 포함하는 초경 코팅을 갖는 기재와 그 제조방법 | |
JPH0588310B2 (enrdf_load_stackoverflow) | ||
EP0446375B1 (en) | Surface-coated hard member for cutting and abrasion-resistant tools | |
Martin et al. | The preparation and characterization of optical thin films produced by ion‐assisted deposition | |
JPS60224778A (ja) | セラミツクス被覆硬質部品 | |
JPS59159983A (ja) | 硬質耐摩耗性表面層でコ−テイングされた基板からなる複合体 | |
JPH0356675A (ja) | 超硬合金基体の被覆法および該被覆法によって作製される超硬工具 | |
JP2909248B2 (ja) | 窒化硼素被覆部材 | |
JPH07109561A (ja) | 窒化クロム膜被覆基体 | |
JP3971337B2 (ja) | α型結晶構造主体のアルミナ皮膜の製造方法、α型結晶構造主体のアルミナ皮膜で被覆された部材およびその製造方法 | |
JP3884378B2 (ja) | 密着性に優れた硬質皮膜 | |
JPH06248420A (ja) | 硬質膜被覆部材 | |
JPS6257802A (ja) | 硬質炭素被覆部品 | |
JPH07150337A (ja) | 窒化膜の製造方法 | |
JPH03159978A (ja) | イオンミキシング法によるセラミックス表面への金属膜形成法 | |
JP2861753B2 (ja) | 窒化ホウ素含有膜で被覆された基体 | |
JPH02236268A (ja) | 窒化ホウ素膜の形成方法 | |
JPH07118829A (ja) | 窒化クロム膜被覆基体及びその製造方法 | |
JP2611633B2 (ja) | 窒化クロム膜被覆基体の製造方法 | |
Legg | Surface engineering with ion-assisted coatings |