JPS60222862A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS60222862A
JPS60222862A JP59079085A JP7908584A JPS60222862A JP S60222862 A JPS60222862 A JP S60222862A JP 59079085 A JP59079085 A JP 59079085A JP 7908584 A JP7908584 A JP 7908584A JP S60222862 A JPS60222862 A JP S60222862A
Authority
JP
Japan
Prior art keywords
optical system
wavelength
light source
alignment
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59079085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548612B2 (enExample
Inventor
Takamasa Hirose
広瀬　隆昌
Akiyoshi Suzuki
章義 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59079085A priority Critical patent/JPS60222862A/ja
Publication of JPS60222862A publication Critical patent/JPS60222862A/ja
Publication of JPH0548612B2 publication Critical patent/JPH0548612B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59079085A 1984-04-19 1984-04-19 露光装置 Granted JPS60222862A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59079085A JPS60222862A (ja) 1984-04-19 1984-04-19 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59079085A JPS60222862A (ja) 1984-04-19 1984-04-19 露光装置

Publications (2)

Publication Number Publication Date
JPS60222862A true JPS60222862A (ja) 1985-11-07
JPH0548612B2 JPH0548612B2 (enExample) 1993-07-22

Family

ID=13680042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59079085A Granted JPS60222862A (ja) 1984-04-19 1984-04-19 露光装置

Country Status (1)

Country Link
JP (1) JPS60222862A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62196825A (ja) * 1986-02-24 1987-08-31 Nippon Kogaku Kk <Nikon> 露光装置
JPS6310520A (ja) * 1986-07-02 1988-01-18 Matsushita Electric Ind Co Ltd 露光装置および露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62196825A (ja) * 1986-02-24 1987-08-31 Nippon Kogaku Kk <Nikon> 露光装置
JPS6310520A (ja) * 1986-07-02 1988-01-18 Matsushita Electric Ind Co Ltd 露光装置および露光方法

Also Published As

Publication number Publication date
JPH0548612B2 (enExample) 1993-07-22

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