JPS60220348A - 位置合せ装置 - Google Patents

位置合せ装置

Info

Publication number
JPS60220348A
JPS60220348A JP59075843A JP7584384A JPS60220348A JP S60220348 A JPS60220348 A JP S60220348A JP 59075843 A JP59075843 A JP 59075843A JP 7584384 A JP7584384 A JP 7584384A JP S60220348 A JPS60220348 A JP S60220348A
Authority
JP
Japan
Prior art keywords
light
mask
detecting
detection device
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59075843A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0358529B2 (enrdf_load_stackoverflow
Inventor
Yoichi Kuroki
黒木　洋一
Ryozo Hiraga
平賀　亮三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59075843A priority Critical patent/JPS60220348A/ja
Publication of JPS60220348A publication Critical patent/JPS60220348A/ja
Publication of JPH0358529B2 publication Critical patent/JPH0358529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59075843A 1984-04-17 1984-04-17 位置合せ装置 Granted JPS60220348A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59075843A JPS60220348A (ja) 1984-04-17 1984-04-17 位置合せ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59075843A JPS60220348A (ja) 1984-04-17 1984-04-17 位置合せ装置

Publications (2)

Publication Number Publication Date
JPS60220348A true JPS60220348A (ja) 1985-11-05
JPH0358529B2 JPH0358529B2 (enrdf_load_stackoverflow) 1991-09-05

Family

ID=13587887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59075843A Granted JPS60220348A (ja) 1984-04-17 1984-04-17 位置合せ装置

Country Status (1)

Country Link
JP (1) JPS60220348A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS636840A (ja) * 1986-06-26 1988-01-12 Nikon Corp アライメント装置
JP2007043199A (ja) * 1994-08-17 2007-02-15 Asml Us Inc 走査形写真平版のためのオフ軸アライメント装置及び写真平版ツール

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS636840A (ja) * 1986-06-26 1988-01-12 Nikon Corp アライメント装置
JP2007043199A (ja) * 1994-08-17 2007-02-15 Asml Us Inc 走査形写真平版のためのオフ軸アライメント装置及び写真平版ツール

Also Published As

Publication number Publication date
JPH0358529B2 (enrdf_load_stackoverflow) 1991-09-05

Similar Documents

Publication Publication Date Title
US5048968A (en) Alignment mark detecting optical system
GB1519469A (en) Position determination
US4710029A (en) Projection type exposing apparatus
JPS60220348A (ja) 位置合せ装置
US4380395A (en) Reduction projection aligner system
JPH056564A (ja) 光デイスク読取り装置におけるトラツキング誤差検出方式
JPS6370110A (ja) 距離測定装置
RU2840105C1 (ru) Рефлектометр
JPS60169706A (ja) 表面形状測定装置
JPS61223604A (ja) ギヤツプ測定装置
SU781891A1 (ru) Звукосниматель
JP3204726B2 (ja) エッジセンサ
JPS63206682A (ja) 光電スイツチ
JPS6172214A (ja) 焦点検出装置
JPS6266112A (ja) 位置検出装置
RU1768967C (ru) Устройство дл контрол шероховатости поверхности
SU1404816A1 (ru) Устройство дл измерени отклонени от пр молинейности
JPS60181745A (ja) 光学装置
JPH0412407Y2 (enrdf_load_stackoverflow)
JPS62217125A (ja) 赤外線検知装置
JPH03123812A (ja) 面ブレセンサ
JPS59160371A (ja) 画像走査記録装置における記録用投影光の調節方法
JPH02226034A (ja) レンズ偏心測定装置
JPH02204712A (ja) 面倒れ測定装置
JPH0888171A (ja) 多機能光検出器