JPS6020513A - 移動テーブルの姿勢制御方法 - Google Patents
移動テーブルの姿勢制御方法Info
- Publication number
- JPS6020513A JPS6020513A JP58126916A JP12691683A JPS6020513A JP S6020513 A JPS6020513 A JP S6020513A JP 58126916 A JP58126916 A JP 58126916A JP 12691683 A JP12691683 A JP 12691683A JP S6020513 A JPS6020513 A JP S6020513A
- Authority
- JP
- Japan
- Prior art keywords
- members
- accuracy
- movement
- guide
- table device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Control Of Position Or Direction (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58126916A JPS6020513A (ja) | 1983-07-14 | 1983-07-14 | 移動テーブルの姿勢制御方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58126916A JPS6020513A (ja) | 1983-07-14 | 1983-07-14 | 移動テーブルの姿勢制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6020513A true JPS6020513A (ja) | 1985-02-01 |
| JPH0229195B2 JPH0229195B2 (cs) | 1990-06-28 |
Family
ID=14947064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58126916A Granted JPS6020513A (ja) | 1983-07-14 | 1983-07-14 | 移動テーブルの姿勢制御方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6020513A (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6320848A (ja) * | 1986-07-15 | 1988-01-28 | Canon Inc | 位置決め装置 |
| JPH02118491A (ja) * | 1988-10-28 | 1990-05-02 | Canon Inc | 静圧気体軸受xyステージ |
| US6501532B2 (en) | 1997-12-19 | 2002-12-31 | Canon Kabushiki Kaisha | Exposure apparatus and method of controlling the same |
-
1983
- 1983-07-14 JP JP58126916A patent/JPS6020513A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6320848A (ja) * | 1986-07-15 | 1988-01-28 | Canon Inc | 位置決め装置 |
| JPH02118491A (ja) * | 1988-10-28 | 1990-05-02 | Canon Inc | 静圧気体軸受xyステージ |
| US6501532B2 (en) | 1997-12-19 | 2002-12-31 | Canon Kabushiki Kaisha | Exposure apparatus and method of controlling the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0229195B2 (cs) | 1990-06-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4575942A (en) | Ultra-precision two-dimensional moving apparatus | |
| JP2704734B2 (ja) | ステージ位置決め補正方法及び装置 | |
| US6172373B1 (en) | Stage apparatus with improved positioning capability | |
| US6937911B2 (en) | Compensating for cable drag forces in high precision stages | |
| JPS60219744A (ja) | 投影露光装置 | |
| JPH0119252B2 (cs) | ||
| JPH0547768B2 (cs) | ||
| JPS59226810A (ja) | 長さ測定装置 | |
| JPH0257333B2 (cs) | ||
| GB2120401A (en) | Dual-axis interferometer measuring system | |
| JPS5825637A (ja) | 投影焼付装置 | |
| JPS6020513A (ja) | 移動テーブルの姿勢制御方法 | |
| US4768064A (en) | Conveyor device for alignment | |
| JP2000055617A (ja) | 光学式測長機 | |
| US5493114A (en) | Method of and apparatus for measuring the movement of a lens with four measurement points | |
| JPH05259024A (ja) | 位置決め装置 | |
| JPH0360955A (ja) | 静圧ガイドの真直度補正機構 | |
| JPS60140826A (ja) | 露光装置 | |
| JPH0639042B2 (ja) | テ−ブルの駆動装置 | |
| JPS6073313A (ja) | ロボットの軌跡測定装置 | |
| JPS62273722A (ja) | 電子ビ−ム露光装置 | |
| JP2973017B2 (ja) | 焦点検出装置 | |
| JPH056848A (ja) | 位置合わせ用移動ステージ及び露光位置合わせ方法 | |
| JPH0244365B2 (cs) | ||
| JPH10221039A (ja) | 移動軸直角度測定方法 |