JPS6020513A - 移動テーブルの姿勢制御方法 - Google Patents

移動テーブルの姿勢制御方法

Info

Publication number
JPS6020513A
JPS6020513A JP58126916A JP12691683A JPS6020513A JP S6020513 A JPS6020513 A JP S6020513A JP 58126916 A JP58126916 A JP 58126916A JP 12691683 A JP12691683 A JP 12691683A JP S6020513 A JPS6020513 A JP S6020513A
Authority
JP
Japan
Prior art keywords
members
accuracy
movement
guide
table device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58126916A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0229195B2 (cs
Inventor
Junji Isohata
磯端 純二
Mikio Nakasugi
幹夫 中杉
Takao Yokomatsu
横松 孝夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58126916A priority Critical patent/JPS6020513A/ja
Publication of JPS6020513A publication Critical patent/JPS6020513A/ja
Publication of JPH0229195B2 publication Critical patent/JPH0229195B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58126916A 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法 Granted JPS6020513A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58126916A JPS6020513A (ja) 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58126916A JPS6020513A (ja) 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法

Publications (2)

Publication Number Publication Date
JPS6020513A true JPS6020513A (ja) 1985-02-01
JPH0229195B2 JPH0229195B2 (cs) 1990-06-28

Family

ID=14947064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58126916A Granted JPS6020513A (ja) 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法

Country Status (1)

Country Link
JP (1) JPS6020513A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320848A (ja) * 1986-07-15 1988-01-28 Canon Inc 位置決め装置
JPH02118491A (ja) * 1988-10-28 1990-05-02 Canon Inc 静圧気体軸受xyステージ
US6501532B2 (en) 1997-12-19 2002-12-31 Canon Kabushiki Kaisha Exposure apparatus and method of controlling the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320848A (ja) * 1986-07-15 1988-01-28 Canon Inc 位置決め装置
JPH02118491A (ja) * 1988-10-28 1990-05-02 Canon Inc 静圧気体軸受xyステージ
US6501532B2 (en) 1997-12-19 2002-12-31 Canon Kabushiki Kaisha Exposure apparatus and method of controlling the same

Also Published As

Publication number Publication date
JPH0229195B2 (cs) 1990-06-28

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