JPH0229195B2 - - Google Patents

Info

Publication number
JPH0229195B2
JPH0229195B2 JP58126916A JP12691683A JPH0229195B2 JP H0229195 B2 JPH0229195 B2 JP H0229195B2 JP 58126916 A JP58126916 A JP 58126916A JP 12691683 A JP12691683 A JP 12691683A JP H0229195 B2 JPH0229195 B2 JP H0229195B2
Authority
JP
Japan
Prior art keywords
guide
moving
movable table
fluid supply
moving table
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58126916A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6020513A (ja
Inventor
Junji Isohata
Mikio Nakasugi
Takao Yokomatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58126916A priority Critical patent/JPS6020513A/ja
Publication of JPS6020513A publication Critical patent/JPS6020513A/ja
Publication of JPH0229195B2 publication Critical patent/JPH0229195B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
JP58126916A 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法 Granted JPS6020513A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58126916A JPS6020513A (ja) 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58126916A JPS6020513A (ja) 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法

Publications (2)

Publication Number Publication Date
JPS6020513A JPS6020513A (ja) 1985-02-01
JPH0229195B2 true JPH0229195B2 (cs) 1990-06-28

Family

ID=14947064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58126916A Granted JPS6020513A (ja) 1983-07-14 1983-07-14 移動テーブルの姿勢制御方法

Country Status (1)

Country Link
JP (1) JPS6020513A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320848A (ja) * 1986-07-15 1988-01-28 Canon Inc 位置決め装置
JP2631396B2 (ja) * 1988-10-28 1997-07-16 キヤノン株式会社 静圧気体軸受xyステージ
JP3809268B2 (ja) 1997-12-19 2006-08-16 キヤノン株式会社 デバイス製造方法

Also Published As

Publication number Publication date
JPS6020513A (ja) 1985-02-01

Similar Documents

Publication Publication Date Title
JP2704734B2 (ja) ステージ位置決め補正方法及び装置
JPH0119252B2 (cs)
CN102639289B (zh) 加工工具及其操作方法
SE8204293L (sv) Sett och anordning for metning av konturen av en yta
JPS6215801B2 (cs)
JPH0257333B2 (cs)
JP3450580B2 (ja) 露光装置および露光方法
US4610089A (en) Bridge type coordinate measuring machine
JPH0229195B2 (cs)
US6144719A (en) Exposure method, exposure device and device producing method
US5119566A (en) Stationary gantry for a precision coordinate measuring instrument
JP2816272B2 (ja) 位置決め装置
JPH07246547A (ja) 自動工作機械
JPH04317Y2 (cs)
JPH0229194B2 (cs)
JPH04140691A (ja) 位置決め装置
JP3288799B2 (ja) ワイヤ放電加工機
JPS60140826A (ja) 露光装置
JPH0360955A (ja) 静圧ガイドの真直度補正機構
JPH0670951B2 (ja) 投影露光装置
JPH0382013A (ja) ステージ位置決め制御方法
JPS632137B2 (cs)
JPS60140827A (ja) 露光装置
JP3274959B2 (ja) 半導体露光装置
JPS61209854A (ja) 工作機械