JPS60204613A - 高純度シリカゲルの製造方法 - Google Patents
高純度シリカゲルの製造方法Info
- Publication number
- JPS60204613A JPS60204613A JP59062893A JP6289384A JPS60204613A JP S60204613 A JPS60204613 A JP S60204613A JP 59062893 A JP59062893 A JP 59062893A JP 6289384 A JP6289384 A JP 6289384A JP S60204613 A JPS60204613 A JP S60204613A
- Authority
- JP
- Japan
- Prior art keywords
- silica gel
- mineral acid
- acid
- purity
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 150
- 239000000741 silica gel Substances 0.000 title claims abstract description 122
- 229910002027 silica gel Inorganic materials 0.000 title claims abstract description 122
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000002253 acid Substances 0.000 claims abstract description 61
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 45
- 239000011707 mineral Substances 0.000 claims abstract description 45
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 23
- 239000000203 mixture Substances 0.000 claims abstract description 21
- 239000007864 aqueous solution Substances 0.000 claims abstract description 11
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 239000000243 solution Substances 0.000 claims description 22
- 239000011259 mixed solution Substances 0.000 claims description 21
- 150000002894 organic compounds Chemical class 0.000 claims description 9
- 239000007795 chemical reaction product Substances 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000000468 ketone group Chemical group 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 19
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 15
- 239000000377 silicon dioxide Substances 0.000 abstract description 13
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract description 7
- 239000004115 Sodium Silicate Substances 0.000 abstract description 5
- 229910052911 sodium silicate Inorganic materials 0.000 abstract description 5
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052681 coesite Inorganic materials 0.000 abstract description 4
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 4
- 229910052682 stishovite Inorganic materials 0.000 abstract description 4
- 229910052905 tridymite Inorganic materials 0.000 abstract description 4
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 238000007865 diluting Methods 0.000 abstract 1
- 229960001866 silicon dioxide Drugs 0.000 description 119
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 30
- 239000000499 gel Substances 0.000 description 23
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 238000005406 washing Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 11
- 239000002994 raw material Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 239000012535 impurity Substances 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- 238000006482 condensation reaction Methods 0.000 description 5
- 239000005368 silicate glass Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229960004029 silicic acid Drugs 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 235000019353 potassium silicate Nutrition 0.000 description 3
- 125000005372 silanol group Chemical group 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- -1 Tj- and Zr Chemical class 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 230000003670 easy-to-clean Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 238000001637 plasma atomic emission spectroscopy Methods 0.000 description 2
- 238000000918 plasma mass spectrometry Methods 0.000 description 2
- 229940113115 polyethylene glycol 200 Drugs 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 241000951471 Citrus junos Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 159000000011 group IA salts Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000019351 sodium silicates Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- PPDADIYYMSXQJK-UHFFFAOYSA-N trichlorosilicon Chemical compound Cl[Si](Cl)Cl PPDADIYYMSXQJK-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59062893A JPS60204613A (ja) | 1984-03-30 | 1984-03-30 | 高純度シリカゲルの製造方法 |
| US06/785,806 US4678652A (en) | 1984-03-30 | 1985-10-09 | Process for producing silica in fine powder form |
| DE3536106A DE3536106C2 (de) | 1984-03-30 | 1985-10-09 | Verfahren zur Herstellung von feinpulvrigem Siliciumdioxid |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59062893A JPS60204613A (ja) | 1984-03-30 | 1984-03-30 | 高純度シリカゲルの製造方法 |
| DE3536106A DE3536106C2 (de) | 1984-03-30 | 1985-10-09 | Verfahren zur Herstellung von feinpulvrigem Siliciumdioxid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60204613A true JPS60204613A (ja) | 1985-10-16 |
| JPH0479976B2 JPH0479976B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-12-17 |
Family
ID=37872187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59062893A Granted JPS60204613A (ja) | 1984-03-30 | 1984-03-30 | 高純度シリカゲルの製造方法 |
Country Status (3)
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6283313A (ja) * | 1985-10-08 | 1987-04-16 | Kawatetsu Kogyo Kk | シリカの高純度化方法 |
| US4683128A (en) * | 1985-06-27 | 1987-07-28 | Nitto Chemical Industry Co., Ltd. | Process for manufacturing high purity silica |
| FR2622565A1 (fr) * | 1987-11-04 | 1989-05-05 | Rhone Poulenc Chimie | Silice pour compositions dentifrices compatible notamment avec le zinc |
| US5286478A (en) * | 1987-11-04 | 1994-02-15 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| US5342598A (en) * | 1989-07-03 | 1994-08-30 | Rhone-Poulenc Chimie | Precipitated silica particulates having controlled porosity |
| US5413844A (en) * | 1988-06-01 | 1995-05-09 | Rhone-Poulenc Chimie | Process for the preparation of zinc/dentifrice-compatible silica particulates |
| US5614177A (en) * | 1987-11-04 | 1997-03-25 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| KR100427264B1 (ko) * | 2001-03-20 | 2004-04-17 | 한국화학연구원 | 분말상 자율 조습재료 및 이의 제조방법 |
| JP2009530218A (ja) * | 2006-03-15 | 2009-08-27 | アールイーエスシー インベストメンツ エルエルシー | 太陽電池及びその他の用途のシリコンの製造方法 |
| WO2009130786A1 (ja) * | 2008-04-25 | 2009-10-29 | テイーアンドエス インベストメント リミテッド | 太陽電池用シリコン原料製造方法 |
| JP2013209243A (ja) * | 2012-03-30 | 2013-10-10 | Taiheiyo Cement Corp | 高純度シリカの製造方法 |
| CN114088571A (zh) * | 2021-11-08 | 2022-02-25 | 包头钢铁（集团）有限责任公司 | 一种测定高硅复合熔剂中二氧化硅含量的方法 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4872895A (en) * | 1986-12-11 | 1989-10-10 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method for fabricating articles which include high silica glass bodies |
| JP2545282B2 (ja) * | 1989-04-17 | 1996-10-16 | 日東化学工業株式会社 | 球状シリカ粒子の製造方法 |
| JP2969182B1 (ja) * | 1998-07-15 | 1999-11-02 | 工業技術院長 | 高純度非晶質ケイ酸の製造方法 |
| US7052541B2 (en) * | 2002-06-19 | 2006-05-30 | Board Of Regents, The University Of Texas System | Color compositions |
| US7425235B2 (en) * | 2005-02-11 | 2008-09-16 | The Board Of Regents Of The University Of Texas System | Color compositions and methods of manufacture |
| KR20080047343A (ko) * | 2005-06-17 | 2008-05-28 | 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 | 유기/무기 루이스산 복합 재료 |
| US7448486B1 (en) * | 2007-08-10 | 2008-11-11 | Masaba, Inc. | Telescoping conveyor drive system |
| WO2010117925A1 (en) * | 2009-04-06 | 2010-10-14 | Enrique Hernandez | Silicas and alkali metal salt compositions, detergents formed from such compositions and method of forming such composition |
| CN108190900A (zh) * | 2018-03-29 | 2018-06-22 | 广州市飞雪材料科技有限公司 | 一种低比表面积高吸油值磨擦型二氧化硅及其制备方法 |
| CN115465867B (zh) * | 2022-11-14 | 2023-02-21 | 国能龙源环保有限公司 | 一种利用废弃风电叶片制备白炭黑的方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1049834B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1951-10-09 | |||
| DE1567459B1 (de) * | 1966-06-18 | 1970-10-29 | Degussa | Verfahren zur Herstellung feinteiliger,organisch modifizierter Kieselsaeuren |
| FR2499540A2 (fr) * | 1980-07-11 | 1982-08-13 | Rhone Poulenc Ind | Procede d'obtention de silice et silicates metalliques a partir de solutions de silicates alcalins, produits obtenus et applications, notamment en verrerie |
-
1984
- 1984-03-30 JP JP59062893A patent/JPS60204613A/ja active Granted
-
1985
- 1985-10-09 US US06/785,806 patent/US4678652A/en not_active Expired - Fee Related
- 1985-10-09 DE DE3536106A patent/DE3536106C2/de not_active Expired - Fee Related
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4683128A (en) * | 1985-06-27 | 1987-07-28 | Nitto Chemical Industry Co., Ltd. | Process for manufacturing high purity silica |
| JPS6283313A (ja) * | 1985-10-08 | 1987-04-16 | Kawatetsu Kogyo Kk | シリカの高純度化方法 |
| US5616316A (en) * | 1987-11-04 | 1997-04-01 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| FR2622565A1 (fr) * | 1987-11-04 | 1989-05-05 | Rhone Poulenc Chimie | Silice pour compositions dentifrices compatible notamment avec le zinc |
| US5286478A (en) * | 1987-11-04 | 1994-02-15 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| US5612020A (en) * | 1987-11-04 | 1997-03-18 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| US5614176A (en) * | 1987-11-04 | 1997-03-25 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| US5614177A (en) * | 1987-11-04 | 1997-03-25 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| US5413844A (en) * | 1988-06-01 | 1995-05-09 | Rhone-Poulenc Chimie | Process for the preparation of zinc/dentifrice-compatible silica particulates |
| US5342598A (en) * | 1989-07-03 | 1994-08-30 | Rhone-Poulenc Chimie | Precipitated silica particulates having controlled porosity |
| US5968470A (en) * | 1989-07-03 | 1999-10-19 | Rhone-Poulenc Chimie | Precipitated silica particulates having controlled porosity |
| KR100427264B1 (ko) * | 2001-03-20 | 2004-04-17 | 한국화학연구원 | 분말상 자율 조습재료 및 이의 제조방법 |
| JP2009530218A (ja) * | 2006-03-15 | 2009-08-27 | アールイーエスシー インベストメンツ エルエルシー | 太陽電池及びその他の用途のシリコンの製造方法 |
| WO2009130786A1 (ja) * | 2008-04-25 | 2009-10-29 | テイーアンドエス インベストメント リミテッド | 太陽電池用シリコン原料製造方法 |
| JP2013209243A (ja) * | 2012-03-30 | 2013-10-10 | Taiheiyo Cement Corp | 高純度シリカの製造方法 |
| CN114088571A (zh) * | 2021-11-08 | 2022-02-25 | 包头钢铁（集团）有限责任公司 | 一种测定高硅复合熔剂中二氧化硅含量的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4678652A (en) | 1987-07-07 |
| JPH0479976B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-12-17 |
| DE3536106C2 (de) | 1995-02-09 |
| DE3536106A1 (de) | 1987-04-09 |
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