JPS60183728A - 電子ビ−ム転写用位置合わせ方法 - Google Patents

電子ビ−ム転写用位置合わせ方法

Info

Publication number
JPS60183728A
JPS60183728A JP3951084A JP3951084A JPS60183728A JP S60183728 A JPS60183728 A JP S60183728A JP 3951084 A JP3951084 A JP 3951084A JP 3951084 A JP3951084 A JP 3951084A JP S60183728 A JPS60183728 A JP S60183728A
Authority
JP
Japan
Prior art keywords
frequency
lighting
electron beam
mark
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3951084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0578168B2 (enExample
Inventor
Mitsuo Tabata
光雄 田畑
Ichiro Mori
一朗 森
Toshiaki Shinozaki
篠崎　俊昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP3951084A priority Critical patent/JPS60183728A/ja
Publication of JPS60183728A publication Critical patent/JPS60183728A/ja
Publication of JPH0578168B2 publication Critical patent/JPH0578168B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
JP3951084A 1984-03-01 1984-03-01 電子ビ−ム転写用位置合わせ方法 Granted JPS60183728A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3951084A JPS60183728A (ja) 1984-03-01 1984-03-01 電子ビ−ム転写用位置合わせ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3951084A JPS60183728A (ja) 1984-03-01 1984-03-01 電子ビ−ム転写用位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS60183728A true JPS60183728A (ja) 1985-09-19
JPH0578168B2 JPH0578168B2 (enExample) 1993-10-28

Family

ID=12555033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3951084A Granted JPS60183728A (ja) 1984-03-01 1984-03-01 電子ビ−ム転写用位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS60183728A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785232A (en) * 1980-11-17 1982-05-27 Fujitsu Ltd Positional matching

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785232A (en) * 1980-11-17 1982-05-27 Fujitsu Ltd Positional matching

Also Published As

Publication number Publication date
JPH0578168B2 (enExample) 1993-10-28

Similar Documents

Publication Publication Date Title
US4528452A (en) Alignment and detection system for electron image projectors
KR910007533B1 (ko) X선 마스크의 결함 수정 방법 및 그 장치
US4933552A (en) Inspection system utilizing retarding field back scattered electron collection
JPS5856332A (ja) マスクの欠陥修正方法
US4085329A (en) Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment
US4590382A (en) Method of aligning two members utilizing marks provided thereon
EP0157457A2 (en) Electron image projector
US5004927A (en) Process for forming a fine pattern having a high aspect ratio
JPS60183728A (ja) 電子ビ−ム転写用位置合わせ方法
US4902530A (en) Method of correcting a pattern film
JPH0732119B2 (ja) Ｘ線リソグラフビームラインの均一性を改善する方法
JPS6017918A (ja) 電子ビ−ムの位置合わせ方法
JPS6098342A (ja) マスク欠陥検査方法
JPS6358446A (ja) パタ−ン形成方法
JPH062115A (ja) レーザ加工装置およびレーザ加工装置用遮蔽板の作製方法
JPS61123843A (ja) 集束イオンビ−ムを用いたマスク修正装置
JPS60157220A (ja) 電子ビ−ム露光方法
Watts Advanced lithography
Hughes Design of a medium‐power x‐ray‐lithography system
JPH02205763A (ja) レーザー微小領域光電子分光法及びその装置
Yasaka Feasibility study of spatial-phase-locked focused-ion-beam lithography
Scott Electron-image projector
JP2560871B2 (ja) エネルギービーム照射装置
JPS60111426A (ja) 電子ビ−ム転写装置の位置合せ方法
JPH01309322A (ja) Ｘ線マスク検査方法