JPS60174241U - タ−ゲツト・チヤンバ - Google Patents
タ−ゲツト・チヤンバInfo
- Publication number
- JPS60174241U JPS60174241U JP6194584U JP6194584U JPS60174241U JP S60174241 U JPS60174241 U JP S60174241U JP 6194584 U JP6194584 U JP 6194584U JP 6194584 U JP6194584 U JP 6194584U JP S60174241 U JPS60174241 U JP S60174241U
- Authority
- JP
- Japan
- Prior art keywords
- target chamber
- flat plate
- targets
- holes
- rotation axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6194584U JPS60174241U (ja) | 1984-04-25 | 1984-04-25 | タ−ゲツト・チヤンバ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6194584U JPS60174241U (ja) | 1984-04-25 | 1984-04-25 | タ−ゲツト・チヤンバ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60174241U true JPS60174241U (ja) | 1985-11-19 |
JPH0222986Y2 JPH0222986Y2 (enrdf_load_stackoverflow) | 1990-06-21 |
Family
ID=30590691
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6194584U Granted JPS60174241U (ja) | 1984-04-25 | 1984-04-25 | タ−ゲツト・チヤンバ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60174241U (enrdf_load_stackoverflow) |
-
1984
- 1984-04-25 JP JP6194584U patent/JPS60174241U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0222986Y2 (enrdf_load_stackoverflow) | 1990-06-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS60174241U (ja) | タ−ゲツト・チヤンバ | |
JPS6056461U (ja) | 研磨治具 | |
JPS5923732U (ja) | 回転式イオン注入装置に於けるウエハ取付装置 | |
JPS60186198U (ja) | 板材用切断作業台 | |
JPS60193515U (ja) | 顕微鏡用ウエハ−ホルダ− | |
JPS5823058U (ja) | レコ−ド板サイズ選別装置 | |
JPS6340799U (enrdf_load_stackoverflow) | ||
JPS6117732U (ja) | 遠心乾燥機 | |
JPS63216335A (ja) | 密着露光方法 | |
JPS5842157U (ja) | 真空蒸着装置 | |
JPH0265333U (enrdf_load_stackoverflow) | ||
JPS5844848U (ja) | 半導体ウエハ−固定用治具 | |
JPS6298227U (enrdf_load_stackoverflow) | ||
JPS5950276U (ja) | 防虫処理板 | |
JPS617568U (ja) | 真空処理装置に於ける基板移動装置 | |
JPS58128976U (ja) | スパツタ装置 | |
JPS5895041U (ja) | 軟x線転写マスク | |
JPS5933240U (ja) | 遠心乾燥機 | |
JPS6056437U (ja) | パネル配向装置 | |
JPS5980032U (ja) | 図柄を配図した畳表 | |
JPS5868730U (ja) | 圧電振動子の保持構造 | |
JPS60118239U (ja) | 基板支持具 | |
JPS58162639U (ja) | イオン注入装置用ウエハ−保持機構 | |
JPS58110496U (ja) | 鉛筆削器のチヤツク装置 | |
JPS6042799U (ja) | ハイブリッドic用テンプレ−ト構造 |