JPS60173837A - 組合せ回折格子によるギヤツプ・位置合せ制御法 - Google Patents

組合せ回折格子によるギヤツプ・位置合せ制御法

Info

Publication number
JPS60173837A
JPS60173837A JP59199433A JP19943384A JPS60173837A JP S60173837 A JPS60173837 A JP S60173837A JP 59199433 A JP59199433 A JP 59199433A JP 19943384 A JP19943384 A JP 19943384A JP S60173837 A JPS60173837 A JP S60173837A
Authority
JP
Japan
Prior art keywords
diffraction grating
gap
diffracted
light
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59199433A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0582727B2 (enExample
Inventor
Atsunobu Une
宇根　篤▲のぶ▼
Makoto Inoshiro
猪城　真
Nobuyuki Takeuchi
竹内　信行
Kimikichi Deguchi
出口　公吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59199433A priority Critical patent/JPS60173837A/ja
Priority to US06/695,698 priority patent/US4656347A/en
Priority to DE3587921T priority patent/DE3587921T2/de
Priority to EP85300622A priority patent/EP0151032B1/en
Priority to CA000473187A priority patent/CA1226682A/en
Publication of JPS60173837A publication Critical patent/JPS60173837A/ja
Publication of JPH0582727B2 publication Critical patent/JPH0582727B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP59199433A 1984-01-30 1984-09-26 組合せ回折格子によるギヤツプ・位置合せ制御法 Granted JPS60173837A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59199433A JPS60173837A (ja) 1984-09-26 1984-09-26 組合せ回折格子によるギヤツプ・位置合せ制御法
US06/695,698 US4656347A (en) 1984-01-30 1985-01-28 Diffraction grating position adjuster using a grating and a reflector
DE3587921T DE3587921T2 (de) 1984-01-30 1985-01-30 Verfahren für die gegenseitige Ausrichtung zweier Objekte mittels eines Beugungsgitters, sowie die Steuervorrichtung dafür.
EP85300622A EP0151032B1 (en) 1984-01-30 1985-01-30 Method of adjusting relative positions of two objects by using diffraction grating and control apparatus therefor
CA000473187A CA1226682A (en) 1984-01-30 1985-01-30 Method of adjusting relative positions of two objects by using diffraction grating and control apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59199433A JPS60173837A (ja) 1984-09-26 1984-09-26 組合せ回折格子によるギヤツプ・位置合せ制御法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP59014692A Division JPS60173835A (ja) 1984-01-30 1984-01-30 回折格子によるギヤツプ制御法

Publications (2)

Publication Number Publication Date
JPS60173837A true JPS60173837A (ja) 1985-09-07
JPH0582727B2 JPH0582727B2 (enExample) 1993-11-22

Family

ID=16407735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59199433A Granted JPS60173837A (ja) 1984-01-30 1984-09-26 組合せ回折格子によるギヤツプ・位置合せ制御法

Country Status (1)

Country Link
JP (1) JPS60173837A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5337144A (en) * 1990-06-19 1994-08-09 Applied Materials, Inc. Etch rate monitor using collimated light and method of using same
KR100697095B1 (ko) * 2004-02-06 2007-03-20 주식회사 토이랩 조립식 크린 벤치
JP2007149722A (ja) * 2005-11-24 2007-06-14 Canon Inc 加圧加工装置、加圧加工方法および加圧加工用モールド

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5337144A (en) * 1990-06-19 1994-08-09 Applied Materials, Inc. Etch rate monitor using collimated light and method of using same
KR100697095B1 (ko) * 2004-02-06 2007-03-20 주식회사 토이랩 조립식 크린 벤치
JP2007149722A (ja) * 2005-11-24 2007-06-14 Canon Inc 加圧加工装置、加圧加工方法および加圧加工用モールド

Also Published As

Publication number Publication date
JPH0582727B2 (enExample) 1993-11-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term