JPS6016897A - 分子線結晶成長方法 - Google Patents

分子線結晶成長方法

Info

Publication number
JPS6016897A
JPS6016897A JP12469883A JP12469883A JPS6016897A JP S6016897 A JPS6016897 A JP S6016897A JP 12469883 A JP12469883 A JP 12469883A JP 12469883 A JP12469883 A JP 12469883A JP S6016897 A JPS6016897 A JP S6016897A
Authority
JP
Japan
Prior art keywords
single crystal
crystal
gaas
grown
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12469883A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6327317B2 (enrdf_load_html_response
Inventor
Kazuhiro Kondo
和博 近藤
Shunichi Muto
俊一 武藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP12469883A priority Critical patent/JPS6016897A/ja
Publication of JPS6016897A publication Critical patent/JPS6016897A/ja
Publication of JPS6327317B2 publication Critical patent/JPS6327317B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP12469883A 1983-07-11 1983-07-11 分子線結晶成長方法 Granted JPS6016897A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12469883A JPS6016897A (ja) 1983-07-11 1983-07-11 分子線結晶成長方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12469883A JPS6016897A (ja) 1983-07-11 1983-07-11 分子線結晶成長方法

Publications (2)

Publication Number Publication Date
JPS6016897A true JPS6016897A (ja) 1985-01-28
JPS6327317B2 JPS6327317B2 (enrdf_load_html_response) 1988-06-02

Family

ID=14891877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12469883A Granted JPS6016897A (ja) 1983-07-11 1983-07-11 分子線結晶成長方法

Country Status (1)

Country Link
JP (1) JPS6016897A (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPS6327317B2 (enrdf_load_html_response) 1988-06-02

Similar Documents

Publication Publication Date Title
JP3093904B2 (ja) 化合物半導体結晶の成長方法
JPH0484418A (ja) 異種基板上への3―v族化合物半導体のヘテロエピタキシャル成長法
JPH0562911A (ja) 半導体超格子の製造方法
Crumbaker et al. Growth of InP on Si substrates by molecular beam epitaxy
JPS6016897A (ja) 分子線結晶成長方法
JP2004519837A (ja) エピタキシャルウェハ装置
Weyher et al. Influence of substrate defects on the structure of epitaxial GaAs grown by MOCVD
JPH02295127A (ja) 半導体装置の製造方法およびヘテロ接合バイポーラトランジスタ
JPS63137414A (ja) 半導体薄膜の製造方法
JP3458413B2 (ja) 結晶成長方法
JPS6012775B2 (ja) 異質基板上への単結晶半導体層形成方法
KR960004904B1 (ko) 다공성 실리콘기판위에 갈륨비소를 성장하는 방법
JPH01120011A (ja) InP半導体薄膜の製造方法
JPS63124408A (ja) 3−5族化合物半導体の結晶成長方法
JPH0360173B2 (enrdf_load_html_response)
JPS62137821A (ja) 半導体気相成長方法
JPH04299525A (ja) 素子の製造法
JP2920923B2 (ja) 半導体装置の製造方法
JPH01143220A (ja) ゲルマニウムの保護膜およびその製造方法
JPS63148616A (ja) 半導体装置の製造方法
JPH07302740A (ja) 液相エピタキシャル成長用GaAs単結晶基板
JPH0680632B2 (ja) 分子線エピタキシヤル成長方法
JPH0737819A (ja) 半導体ウエハ及びその製造方法
JPS6129121A (ja) GaAs液相エピタシヤル成長法
JPH033363A (ja) 半導体薄膜の製造方法