JPS60162258A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS60162258A
JPS60162258A JP59015044A JP1504484A JPS60162258A JP S60162258 A JPS60162258 A JP S60162258A JP 59015044 A JP59015044 A JP 59015044A JP 1504484 A JP1504484 A JP 1504484A JP S60162258 A JPS60162258 A JP S60162258A
Authority
JP
Japan
Prior art keywords
exposure
light
output
light source
excimer laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59015044A
Other languages
English (en)
Japanese (ja)
Other versions
JPH059933B2 (enrdf_load_stackoverflow
Inventor
Akiyoshi Suzuki
章義 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59015044A priority Critical patent/JPS60162258A/ja
Priority to GB08501764A priority patent/GB2155647B/en
Priority to DE19853503273 priority patent/DE3503273C2/de
Publication of JPS60162258A publication Critical patent/JPS60162258A/ja
Priority to GB08719665A priority patent/GB2196132B/en
Priority to GB08719664A priority patent/GB2196440B/en
Priority to GB8817065A priority patent/GB2204706B/en
Priority to US07/811,915 priority patent/US5171965A/en
Publication of JPH059933B2 publication Critical patent/JPH059933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59015044A 1984-02-01 1984-02-01 露光装置 Granted JPS60162258A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP59015044A JPS60162258A (ja) 1984-02-01 1984-02-01 露光装置
GB08501764A GB2155647B (en) 1984-02-01 1985-01-24 Exposure method and apparatus
DE19853503273 DE3503273C2 (de) 1984-02-01 1985-01-31 Verfahren und Vorrichtung zur Übertragung eines Musters auf einen Wafer
GB08719665A GB2196132B (en) 1984-02-01 1987-08-20 Exposure method and apparatus
GB08719664A GB2196440B (en) 1984-02-01 1987-08-20 Exposure method and apparatus
GB8817065A GB2204706B (en) 1984-02-01 1988-07-18 Exposure method and apparatus
US07/811,915 US5171965A (en) 1984-02-01 1991-12-23 Exposure method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59015044A JPS60162258A (ja) 1984-02-01 1984-02-01 露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2288367A Division JPH03196512A (ja) 1990-10-29 1990-10-29 露光方法

Publications (2)

Publication Number Publication Date
JPS60162258A true JPS60162258A (ja) 1985-08-24
JPH059933B2 JPH059933B2 (enrdf_load_stackoverflow) 1993-02-08

Family

ID=11877832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59015044A Granted JPS60162258A (ja) 1984-02-01 1984-02-01 露光装置

Country Status (1)

Country Link
JP (1) JPS60162258A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62187815A (ja) * 1986-02-14 1987-08-17 Canon Inc 光量制御装置
JPS631030A (ja) * 1986-06-20 1988-01-06 Matsushita Electric Ind Co Ltd 露光装置
JPH0276219A (ja) * 1988-09-12 1990-03-15 Sony Corp 配線形成法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device
JPS5845533U (ja) * 1981-09-24 1983-03-26 株式会社日立製作所 照度分布測定装置
JPS5852818A (ja) * 1981-09-25 1983-03-29 Hitachi Ltd フオトレジスト自動露光装置
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device
JPS5845533U (ja) * 1981-09-24 1983-03-26 株式会社日立製作所 照度分布測定装置
JPS5852818A (ja) * 1981-09-25 1983-03-29 Hitachi Ltd フオトレジスト自動露光装置
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62187815A (ja) * 1986-02-14 1987-08-17 Canon Inc 光量制御装置
JPS631030A (ja) * 1986-06-20 1988-01-06 Matsushita Electric Ind Co Ltd 露光装置
JPH0276219A (ja) * 1988-09-12 1990-03-15 Sony Corp 配線形成法

Also Published As

Publication number Publication date
JPH059933B2 (enrdf_load_stackoverflow) 1993-02-08

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term