GB2196440B - Exposure method and apparatus - Google Patents

Exposure method and apparatus

Info

Publication number
GB2196440B
GB2196440B GB08719664A GB8719664A GB2196440B GB 2196440 B GB2196440 B GB 2196440B GB 08719664 A GB08719664 A GB 08719664A GB 8719664 A GB8719664 A GB 8719664A GB 2196440 B GB2196440 B GB 2196440B
Authority
GB
United Kingdom
Prior art keywords
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08719664A
Other versions
GB8719664D0 (en
GB2196440A (en
Inventor
Akiyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP59015044A external-priority patent/JPS60162258A/en
Priority claimed from JP59275751A external-priority patent/JPH0715875B2/en
Priority claimed from JP60003783A external-priority patent/JPS61162051A/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8719664D0 publication Critical patent/GB8719664D0/en
Publication of GB2196440A publication Critical patent/GB2196440A/en
Application granted granted Critical
Publication of GB2196440B publication Critical patent/GB2196440B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q7/00—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
    • B23Q7/14—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines
    • B23Q7/1426—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines with work holders not rigidly fixed to the transport devices
    • B23Q7/1436—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines with work holders not rigidly fixed to the transport devices using self-propelled work holders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
GB08719664A 1984-02-01 1987-08-20 Exposure method and apparatus Expired GB2196440B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP59015044A JPS60162258A (en) 1984-02-01 1984-02-01 Exposure device
JP59275751A JPH0715875B2 (en) 1984-12-27 1984-12-27 Exposure apparatus and method
JP60003783A JPS61162051A (en) 1985-01-12 1985-01-12 Exposing method

Publications (3)

Publication Number Publication Date
GB8719664D0 GB8719664D0 (en) 1987-09-30
GB2196440A GB2196440A (en) 1988-04-27
GB2196440B true GB2196440B (en) 1988-12-21

Family

ID=27275969

Family Applications (2)

Application Number Title Priority Date Filing Date
GB08501764A Expired GB2155647B (en) 1984-02-01 1985-01-24 Exposure method and apparatus
GB08719664A Expired GB2196440B (en) 1984-02-01 1987-08-20 Exposure method and apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB08501764A Expired GB2155647B (en) 1984-02-01 1985-01-24 Exposure method and apparatus

Country Status (2)

Country Link
DE (1) DE3503273C2 (en)
GB (2) GB2155647B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2155650B (en) * 1984-02-14 1988-11-16 Canon Kk Method and apparatus for exposure
EP0302124A1 (en) * 1987-08-03 1989-02-08 Mercotrust Aktiengesellschaft Apparatus for projection copying from masks onto a substrate
US4804978A (en) * 1988-02-19 1989-02-14 The Perkin-Elmer Corporation Exposure control system for full field photolithography using pulsed sources
US5250797A (en) * 1990-10-05 1993-10-05 Canon Kabushiki Kaisha Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters
JPH06260384A (en) * 1993-03-08 1994-09-16 Nikon Corp Method for controlling amount of exposure
WO2008150422A1 (en) * 2007-05-31 2008-12-11 Corning Incorporated Optical modulator with beam-pointing correction

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100843A (en) * 1981-12-11 1983-06-15 Minolta Camera Co Ltd Light source device for exposure
FR2519156A1 (en) * 1981-12-28 1983-07-01 Thomson Csf Image transfer for photolithographic mfr. of integrated circuits - uses constant duration pulse type laser and cumulative measurement of radiant energy transport and comparator to control laser output
DE3318978A1 (en) * 1983-05-25 1984-11-29 Werner Dr. Vaduz Tabarelli Apparatus for projection printing masks onto a workpiece
GB2155650B (en) * 1984-02-14 1988-11-16 Canon Kk Method and apparatus for exposure

Also Published As

Publication number Publication date
GB2155647A (en) 1985-09-25
DE3503273C2 (en) 1995-05-04
DE3503273A1 (en) 1985-08-08
GB2155647B (en) 1988-12-21
GB8719664D0 (en) 1987-09-30
GB2196440A (en) 1988-04-27
GB8501764D0 (en) 1985-02-27

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20050123