JPS60155668A - 磁気記憶媒体表面に炭化水素保護膜を形成する方法 - Google Patents
磁気記憶媒体表面に炭化水素保護膜を形成する方法Info
- Publication number
- JPS60155668A JPS60155668A JP59012561A JP1256184A JPS60155668A JP S60155668 A JPS60155668 A JP S60155668A JP 59012561 A JP59012561 A JP 59012561A JP 1256184 A JP1256184 A JP 1256184A JP S60155668 A JPS60155668 A JP S60155668A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic storage
- storage medium
- hydrocarbon
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229930195733 hydrocarbon Natural products 0.000 title claims abstract description 25
- 150000002430 hydrocarbons Chemical class 0.000 title claims abstract description 25
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 24
- 230000001681 protective effect Effects 0.000 title claims abstract description 21
- 239000004215 Carbon black (E152) Substances 0.000 title claims abstract description 19
- 230000015572 biosynthetic process Effects 0.000 title 1
- 238000004544 sputter deposition Methods 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 9
- 239000000314 lubricant Substances 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 27
- 239000007789 gas Substances 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 238000012844 infrared spectroscopy analysis Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 101100366935 Caenorhabditis elegans sto-2 gene Proteins 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 235000013527 bean curd Nutrition 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006268 silicone film Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/727—Inorganic carbon protective coating, e.g. graphite, diamond like carbon or doped carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59012561A JPS60155668A (ja) | 1984-01-26 | 1984-01-26 | 磁気記憶媒体表面に炭化水素保護膜を形成する方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59012561A JPS60155668A (ja) | 1984-01-26 | 1984-01-26 | 磁気記憶媒体表面に炭化水素保護膜を形成する方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60155668A true JPS60155668A (ja) | 1985-08-15 |
| JPH0424426B2 JPH0424426B2 (enrdf_load_stackoverflow) | 1992-04-27 |
Family
ID=11808755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59012561A Granted JPS60155668A (ja) | 1984-01-26 | 1984-01-26 | 磁気記憶媒体表面に炭化水素保護膜を形成する方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60155668A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63168836A (ja) * | 1986-12-31 | 1988-07-12 | バスフ アクチェンゲゼルシャフト | 円盤状磁気記録担体の製造方法 |
| US4778582A (en) * | 1987-06-02 | 1988-10-18 | International Business Machines Corporation | Process for making a thin film metal alloy magnetic recording disk with a hydrogenated carbon overcoat |
| US4983421A (en) * | 1986-09-02 | 1991-01-08 | Fuji Photo Film Co., Ltd. | Method for producing magnetic recording media |
| US5045165A (en) * | 1990-02-01 | 1991-09-03 | Komag, Inc. | Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk |
| US6367924B1 (en) | 1999-01-11 | 2002-04-09 | Sharp Kabushiki Kaisha | Thermally assisted magnetic recording medium |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5321901A (en) * | 1976-08-11 | 1978-02-28 | Fujitsu Ltd | Formation of carbonized protective film for magnetic recording medium |
| JPS5321902A (en) * | 1976-08-11 | 1978-02-28 | Fujitsu Ltd | Formation of carbonized protective film for magnetic recording medium |
| JPS53143206A (en) * | 1977-05-18 | 1978-12-13 | Nec Corp | Magnetic disc |
| US4277540A (en) * | 1971-05-03 | 1981-07-07 | Aine Harry E | Thin film magnetic recording medium |
-
1984
- 1984-01-26 JP JP59012561A patent/JPS60155668A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4277540A (en) * | 1971-05-03 | 1981-07-07 | Aine Harry E | Thin film magnetic recording medium |
| JPS5321901A (en) * | 1976-08-11 | 1978-02-28 | Fujitsu Ltd | Formation of carbonized protective film for magnetic recording medium |
| JPS5321902A (en) * | 1976-08-11 | 1978-02-28 | Fujitsu Ltd | Formation of carbonized protective film for magnetic recording medium |
| JPS53143206A (en) * | 1977-05-18 | 1978-12-13 | Nec Corp | Magnetic disc |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4983421A (en) * | 1986-09-02 | 1991-01-08 | Fuji Photo Film Co., Ltd. | Method for producing magnetic recording media |
| JPS63168836A (ja) * | 1986-12-31 | 1988-07-12 | バスフ アクチェンゲゼルシャフト | 円盤状磁気記録担体の製造方法 |
| US4778582A (en) * | 1987-06-02 | 1988-10-18 | International Business Machines Corporation | Process for making a thin film metal alloy magnetic recording disk with a hydrogenated carbon overcoat |
| US5045165A (en) * | 1990-02-01 | 1991-09-03 | Komag, Inc. | Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk |
| US5397644A (en) * | 1990-02-01 | 1995-03-14 | Komag, Incorporated | Magnetic disk having a sputtered hydrogen-doped carbon protective film |
| US6367924B1 (en) | 1999-01-11 | 2002-04-09 | Sharp Kabushiki Kaisha | Thermally assisted magnetic recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0424426B2 (enrdf_load_stackoverflow) | 1992-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |