JPS60153982A - 表面洗浄方法 - Google Patents
表面洗浄方法Info
- Publication number
- JPS60153982A JPS60153982A JP863084A JP863084A JPS60153982A JP S60153982 A JPS60153982 A JP S60153982A JP 863084 A JP863084 A JP 863084A JP 863084 A JP863084 A JP 863084A JP S60153982 A JPS60153982 A JP S60153982A
- Authority
- JP
- Japan
- Prior art keywords
- ozone
- cleaning
- water
- ultraviolet
- cleaning effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning In General (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP863084A JPS60153982A (ja) | 1984-01-23 | 1984-01-23 | 表面洗浄方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP863084A JPS60153982A (ja) | 1984-01-23 | 1984-01-23 | 表面洗浄方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60153982A true JPS60153982A (ja) | 1985-08-13 |
JPH0466628B2 JPH0466628B2 (de) | 1992-10-23 |
Family
ID=11698268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP863084A Granted JPS60153982A (ja) | 1984-01-23 | 1984-01-23 | 表面洗浄方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60153982A (de) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6333824A (ja) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | 表面洗浄方法 |
JPH01140727A (ja) * | 1987-11-27 | 1989-06-01 | Dainippon Screen Mfg Co Ltd | 基板洗浄方法 |
EP0341069A2 (de) * | 1988-05-05 | 1989-11-08 | Elopak Systems Ag | Sterilisierung |
JPH04179225A (ja) * | 1990-11-14 | 1992-06-25 | Ebara Res Co Ltd | 洗浄方法 |
US5269850A (en) * | 1989-12-20 | 1993-12-14 | Hughes Aircraft Company | Method of removing organic flux using peroxide composition |
US5695570A (en) * | 1991-02-28 | 1997-12-09 | Texas Instruments Incorporated | Method for the photo-stimulated removal of trace metals from a semiconductor surface |
WO2000039025A1 (en) * | 1998-12-28 | 2000-07-06 | Daewoo Electronics Co., Ltd. | Radical generating system |
WO2001078793A1 (en) * | 2000-04-12 | 2001-10-25 | Purizer Corporation | Sterilization process for air, liquid and surfaces |
CN104195575A (zh) * | 2014-08-27 | 2014-12-10 | 富乐德科技发展(天津)有限公司 | 去除附着于金属零件表面TiN及Ti薄膜的清洗方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320375A (en) * | 1976-08-10 | 1978-02-24 | Toshiba Corp | Cleaning method of turbidimeter |
JPS57180132A (en) * | 1981-04-30 | 1982-11-06 | Fujitsu Ltd | Washing method of substrate |
JPS58210538A (ja) * | 1982-05-31 | 1983-12-07 | Mitsubishi Electric Corp | 水質センサ−用採水装置 |
JPS60143884A (ja) * | 1983-12-28 | 1985-07-30 | 富士通株式会社 | 洗浄方法 |
-
1984
- 1984-01-23 JP JP863084A patent/JPS60153982A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320375A (en) * | 1976-08-10 | 1978-02-24 | Toshiba Corp | Cleaning method of turbidimeter |
JPS57180132A (en) * | 1981-04-30 | 1982-11-06 | Fujitsu Ltd | Washing method of substrate |
JPS58210538A (ja) * | 1982-05-31 | 1983-12-07 | Mitsubishi Electric Corp | 水質センサ−用採水装置 |
JPS60143884A (ja) * | 1983-12-28 | 1985-07-30 | 富士通株式会社 | 洗浄方法 |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6333824A (ja) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | 表面洗浄方法 |
JPH01140727A (ja) * | 1987-11-27 | 1989-06-01 | Dainippon Screen Mfg Co Ltd | 基板洗浄方法 |
EP1080734A3 (de) * | 1988-05-05 | 2001-04-11 | Elopak Systems Ag | Sterilisierung |
EP0341069A2 (de) * | 1988-05-05 | 1989-11-08 | Elopak Systems Ag | Sterilisierung |
EP0722741A3 (de) * | 1988-05-05 | 1996-11-13 | Elopak Systems | Sterilisierung |
US5269850A (en) * | 1989-12-20 | 1993-12-14 | Hughes Aircraft Company | Method of removing organic flux using peroxide composition |
JPH04179225A (ja) * | 1990-11-14 | 1992-06-25 | Ebara Res Co Ltd | 洗浄方法 |
US5695570A (en) * | 1991-02-28 | 1997-12-09 | Texas Instruments Incorporated | Method for the photo-stimulated removal of trace metals from a semiconductor surface |
WO2000039025A1 (en) * | 1998-12-28 | 2000-07-06 | Daewoo Electronics Co., Ltd. | Radical generating system |
US6303085B1 (en) | 1998-12-28 | 2001-10-16 | Daewoo Electronics Co., Ltd. | Radical generating system |
AU764349B2 (en) * | 1998-12-28 | 2003-08-14 | Daewoo Electronics Corporation | Radical generating system |
WO2001078793A1 (en) * | 2000-04-12 | 2001-10-25 | Purizer Corporation | Sterilization process for air, liquid and surfaces |
CN104195575A (zh) * | 2014-08-27 | 2014-12-10 | 富乐德科技发展(天津)有限公司 | 去除附着于金属零件表面TiN及Ti薄膜的清洗方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0466628B2 (de) | 1992-10-23 |
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