JPS60148178A - トンネル形ジヨセフソン接合素子及びその製法 - Google Patents
トンネル形ジヨセフソン接合素子及びその製法Info
- Publication number
- JPS60148178A JPS60148178A JP59003963A JP396384A JPS60148178A JP S60148178 A JPS60148178 A JP S60148178A JP 59003963 A JP59003963 A JP 59003963A JP 396384 A JP396384 A JP 396384A JP S60148178 A JPS60148178 A JP S60148178A
- Authority
- JP
- Japan
- Prior art keywords
- superconductor layer
- tunnel
- layer
- alloy
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000002887 superconductor Substances 0.000 claims abstract description 44
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 29
- 239000000956 alloy Substances 0.000 claims abstract description 29
- 230000004888 barrier function Effects 0.000 claims abstract description 27
- 238000004544 sputter deposition Methods 0.000 claims abstract description 21
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 10
- 230000001590 oxidative effect Effects 0.000 claims abstract description 5
- 238000010549 co-Evaporation Methods 0.000 claims abstract description 3
- 238000010894 electron beam technology Methods 0.000 claims abstract description 3
- 239000010410 layer Substances 0.000 claims description 63
- 150000001875 compounds Chemical class 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 4
- 239000002344 surface layer Substances 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 abstract description 10
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 35
- 239000007789 gas Substances 0.000 description 29
- 239000010409 thin film Substances 0.000 description 23
- 239000010408 film Substances 0.000 description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003353 gold alloy Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000257465 Echinoidea Species 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 235000019634 flavors Nutrition 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59003963A JPS60148178A (ja) | 1984-01-12 | 1984-01-12 | トンネル形ジヨセフソン接合素子及びその製法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59003963A JPS60148178A (ja) | 1984-01-12 | 1984-01-12 | トンネル形ジヨセフソン接合素子及びその製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60148178A true JPS60148178A (ja) | 1985-08-05 |
| JPH0523073B2 JPH0523073B2 (enrdf_load_stackoverflow) | 1993-03-31 |
Family
ID=11571733
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59003963A Granted JPS60148178A (ja) | 1984-01-12 | 1984-01-12 | トンネル形ジヨセフソン接合素子及びその製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60148178A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5049543A (en) * | 1988-04-05 | 1991-09-17 | U.S. Philips Corporation | Device and method of manufacturing a device |
| US20230100972A1 (en) * | 2020-03-13 | 2023-03-30 | Technische Universität Darmstadt | Method for producing a coating of a base body and functional element having a base body with a coating |
-
1984
- 1984-01-12 JP JP59003963A patent/JPS60148178A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5049543A (en) * | 1988-04-05 | 1991-09-17 | U.S. Philips Corporation | Device and method of manufacturing a device |
| US20230100972A1 (en) * | 2020-03-13 | 2023-03-30 | Technische Universität Darmstadt | Method for producing a coating of a base body and functional element having a base body with a coating |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0523073B2 (enrdf_load_stackoverflow) | 1993-03-31 |
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