JPS60138925A - レジスト塗布方法 - Google Patents

レジスト塗布方法

Info

Publication number
JPS60138925A
JPS60138925A JP24933283A JP24933283A JPS60138925A JP S60138925 A JPS60138925 A JP S60138925A JP 24933283 A JP24933283 A JP 24933283A JP 24933283 A JP24933283 A JP 24933283A JP S60138925 A JPS60138925 A JP S60138925A
Authority
JP
Japan
Prior art keywords
resist
substance
coated
speed
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24933283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0460333B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Hashimoto
宏 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP24933283A priority Critical patent/JPS60138925A/ja
Publication of JPS60138925A publication Critical patent/JPS60138925A/ja
Publication of JPH0460333B2 publication Critical patent/JPH0460333B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP24933283A 1983-12-27 1983-12-27 レジスト塗布方法 Granted JPS60138925A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24933283A JPS60138925A (ja) 1983-12-27 1983-12-27 レジスト塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24933283A JPS60138925A (ja) 1983-12-27 1983-12-27 レジスト塗布方法

Publications (2)

Publication Number Publication Date
JPS60138925A true JPS60138925A (ja) 1985-07-23
JPH0460333B2 JPH0460333B2 (enrdf_load_stackoverflow) 1992-09-25

Family

ID=17191433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24933283A Granted JPS60138925A (ja) 1983-12-27 1983-12-27 レジスト塗布方法

Country Status (1)

Country Link
JP (1) JPS60138925A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6033728A (en) * 1993-05-13 2000-03-07 Fujitsu Limited Apparatus for spin coating, a method for spin coating and a method for manufacturing semiconductor device
JP2002158162A (ja) * 2000-11-21 2002-05-31 Tokyo Electron Ltd 塗布方法および塗布装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6033728A (en) * 1993-05-13 2000-03-07 Fujitsu Limited Apparatus for spin coating, a method for spin coating and a method for manufacturing semiconductor device
JP2002158162A (ja) * 2000-11-21 2002-05-31 Tokyo Electron Ltd 塗布方法および塗布装置

Also Published As

Publication number Publication date
JPH0460333B2 (enrdf_load_stackoverflow) 1992-09-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees