JPS60138067A - ア−ク安定化方法および装置 - Google Patents
ア−ク安定化方法および装置Info
- Publication number
- JPS60138067A JPS60138067A JP59191396A JP19139684A JPS60138067A JP S60138067 A JPS60138067 A JP S60138067A JP 59191396 A JP59191396 A JP 59191396A JP 19139684 A JP19139684 A JP 19139684A JP S60138067 A JPS60138067 A JP S60138067A
- Authority
- JP
- Japan
- Prior art keywords
- target
- arc
- stabilizing device
- ring
- arc stabilizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000006641 stabilisation Effects 0.000 title claims description 25
- 238000011105 stabilization Methods 0.000 title claims description 25
- 230000000087 stabilizing effect Effects 0.000 claims description 109
- 239000000463 material Substances 0.000 claims description 62
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 44
- 239000002245 particle Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 31
- 238000001704 evaporation Methods 0.000 claims description 23
- 239000012535 impurity Substances 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 21
- 238000004140 cleaning Methods 0.000 claims description 19
- 239000013077 target material Substances 0.000 claims description 18
- 230000008020 evaporation Effects 0.000 claims description 15
- 229910000889 permalloy Inorganic materials 0.000 claims description 10
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 9
- 229910052742 iron Inorganic materials 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 6
- 229910052582 BN Inorganic materials 0.000 claims description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 230000035699 permeability Effects 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 3
- 230000002265 prevention Effects 0.000 claims description 3
- 230000008016 vaporization Effects 0.000 claims description 3
- 239000003381 stabilizer Substances 0.000 claims 3
- 239000000779 smoke Substances 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 230000003628 erosive effect Effects 0.000 description 13
- 230000004907 flux Effects 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910000859 α-Fe Inorganic materials 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000008713 feedback mechanism Effects 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 230000014616 translation Effects 0.000 description 2
- 206010000117 Abnormal behaviour Diseases 0.000 description 1
- 101100537937 Caenorhabditis elegans arc-1 gene Proteins 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- HESCAJZNRMSMJG-KKQRBIROSA-N epothilone A Chemical compound C/C([C@@H]1C[C@@H]2O[C@@H]2CCC[C@@H]([C@@H]([C@@H](C)C(=O)C(C)(C)[C@@H](O)CC(=O)O1)O)C)=C\C1=CSC(C)=N1 HESCAJZNRMSMJG-KKQRBIROSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US531258 | 1983-09-12 | ||
| US06/531,258 US4448659A (en) | 1983-09-12 | 1983-09-12 | Method and apparatus for evaporation arc stabilization including initial target cleaning |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60138067A true JPS60138067A (ja) | 1985-07-22 |
Family
ID=24116910
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59191396A Pending JPS60138067A (ja) | 1983-09-12 | 1984-09-12 | ア−ク安定化方法および装置 |
Country Status (8)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200063203A (ko) * | 2017-10-03 | 2020-06-04 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 한정된 자기장을 가진 아크 소스 |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4559121A (en) * | 1983-09-12 | 1985-12-17 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization for permeable targets |
| US4559125A (en) * | 1983-09-12 | 1985-12-17 | Vac-Tec Systems, Inc. | Apparatus for evaporation arc stabilization during the initial clean-up of an arc target |
| US4600489A (en) * | 1984-01-19 | 1986-07-15 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring |
| EP0174977A4 (en) * | 1984-03-02 | 1987-02-12 | Univ Minnesota | METHOD AND DEVICE FOR THE CONTROLLED APPLICATION OF MATERIAL BY ARC ARC IN A VACUUM. |
| US4724058A (en) * | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
| US4610774A (en) * | 1984-11-14 | 1986-09-09 | Hitachi, Ltd. | Target for sputtering |
| CH664303A5 (de) * | 1985-04-03 | 1988-02-29 | Balzers Hochvakuum | Haltevorrichtung fuer targets fuer kathodenzerstaeubung. |
| US4793975A (en) * | 1985-05-20 | 1988-12-27 | Tegal Corporation | Plasma Reactor with removable insert |
| US4728406A (en) * | 1986-08-18 | 1988-03-01 | Energy Conversion Devices, Inc. | Method for plasma - coating a semiconductor body |
| DE3707545A1 (de) * | 1987-02-03 | 1988-08-11 | Balzers Hochvakuum | Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode |
| DE3881256D1 (de) * | 1987-03-06 | 1993-07-01 | Balzers Hochvakuum | Verfahren und vorrichtungen zum vakuumbeschichten mittels einer elektrischen bogenentladung. |
| US4943325A (en) * | 1988-10-19 | 1990-07-24 | Black & Veatch, Engineers-Architects | Reflector assembly |
| US4936960A (en) * | 1989-01-03 | 1990-06-26 | Advanced Energy Industries, Inc. | Method and apparatus for recovery from low impedance condition during cathodic arc processes |
| BG49771A1 (en) * | 1989-07-13 | 1992-02-14 | T I Vakuumni Sistemi | Electric- bow evaparator |
| CA2065581C (en) | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
| US5380421A (en) * | 1992-11-04 | 1995-01-10 | Gorokhovsky; Vladimir I. | Vacuum-arc plasma source |
| DE4329155A1 (de) * | 1993-08-30 | 1995-03-02 | Bloesch W Ag | Magnetfeldkathode |
| WO1995032517A1 (fr) * | 1994-05-24 | 1995-11-30 | Rossiisko-Shveitsarskoe Aktsionernoe Obschestvo Zakrytogo Tipa 'nova' | Procede de production d'une decharge electrique et son dispositif de mise en ×uvre |
| US5535906A (en) * | 1995-01-30 | 1996-07-16 | Advanced Energy Industries, Inc. | Multi-phase DC plasma processing system |
| WO1996031899A1 (en) | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
| DE19521419C2 (de) * | 1995-06-14 | 1997-11-27 | Plasma Applikation Mbh Ges | Verdampfereinheit zur Verdampfung von Materialien im elektrischen Vakuumbogen |
| CH689558A5 (de) | 1995-07-11 | 1999-06-15 | Erich Bergmann | Bedampfungsanlage und Verdampfereinheit. |
| DE19708344A1 (de) * | 1997-03-01 | 1998-09-03 | Leybold Systems Gmbh | Sputterkathode |
| IL127236A0 (en) * | 1997-11-26 | 1999-09-22 | Vapor Technologies Inc | Apparatus for sputtering or arc evaporation |
| WO2000016373A1 (de) * | 1998-09-14 | 2000-03-23 | Unaxis Trading Ag | Targetanordnung für eine arc-verdampfungs-kammer |
| CA2268659C (en) * | 1999-04-12 | 2008-12-30 | Vladimir I. Gorokhovsky | Rectangular cathodic arc source and method of steering an arc spot |
| US6929727B2 (en) * | 1999-04-12 | 2005-08-16 | G & H Technologies, Llc | Rectangular cathodic arc source and method of steering an arc spot |
| US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
| US6551470B1 (en) | 1999-06-15 | 2003-04-22 | Academy Precision Materials | Clamp and target assembly |
| JP2001257144A (ja) * | 2000-03-09 | 2001-09-21 | Tokyo Electron Ltd | 基板の加熱処理装置 |
| CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
| US7300559B2 (en) * | 2000-04-10 | 2007-11-27 | G & H Technologies Llc | Filtered cathodic arc deposition method and apparatus |
| US20050176251A1 (en) * | 2004-02-05 | 2005-08-11 | Duong Chau H. | Polishing pad with releasable slick particles |
| US7498587B2 (en) * | 2006-05-01 | 2009-03-03 | Vapor Technologies, Inc. | Bi-directional filtered arc plasma source |
| US9893223B2 (en) | 2010-11-16 | 2018-02-13 | Suncore Photovoltaics, Inc. | Solar electricity generation system |
| KR102234456B1 (ko) * | 2013-07-09 | 2021-04-01 | 외를리콘 서피스 솔루션즈 아게, 페피콘 | 전기적 절연층의 반응성 스퍼터 침착을 위한 타깃 |
| CN113745081B (zh) * | 2020-05-27 | 2024-03-12 | 中微半导体设备(上海)股份有限公司 | 一种隔离环组件、等离子体处理装置及处理方法 |
| DE102024107070A1 (de) | 2024-03-12 | 2025-09-18 | Oerlikon Surface Solutions AG, Pfäffikon, Zweigniederlassung Balzers | ARC Quelle mit Confinementringsystem mit veränderbarer Höhe |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4874431A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-01-08 | 1973-10-06 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2972695A (en) * | 1957-05-24 | 1961-02-21 | Vickers Electrical Co Ltd | Stabilisation of low pressure d.c. arc discharges |
| US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
| US3836451A (en) * | 1968-12-26 | 1974-09-17 | A Snaper | Arc deposition apparatus |
| US3793179A (en) * | 1971-07-19 | 1974-02-19 | L Sablev | Apparatus for metal evaporation coating |
| US3783231A (en) * | 1972-03-22 | 1974-01-01 | V Gorbunov | Apparatus for vacuum-evaporation of metals under the action of an electric arc |
| SU636266A1 (ru) * | 1976-04-05 | 1978-02-10 | Предприятие П/Я В-8851 | Электродуговой испаритель металлов |
| US4180450A (en) * | 1978-08-21 | 1979-12-25 | Vac-Tec Systems, Inc. | Planar magnetron sputtering device |
| DE3012999C2 (de) * | 1980-04-03 | 1984-02-16 | Degussa Ag, 6000 Frankfurt | Bad und Verfahren zur galvanischen Abscheidung von hochglänzenden und duktiler Goldlegierungsüberzügen |
| JPS6011103B2 (ja) * | 1981-02-23 | 1985-03-23 | レオニド パフロヴイツチ サブレフ | 電弧金属蒸発装置用の消耗性陰極 |
| GB2140040B (en) * | 1983-05-09 | 1986-09-17 | Vac Tec Syst | Evaporation arc stabilization |
-
1983
- 1983-09-12 US US06/531,258 patent/US4448659A/en not_active Expired - Fee Related
-
1984
- 1984-09-04 GB GB08422333A patent/GB2148329B/en not_active Expired
- 1984-09-10 DE DE19843433166 patent/DE3433166A1/de active Granted
- 1984-09-11 FR FR848413919A patent/FR2557151B1/fr not_active Expired
- 1984-09-11 CA CA000462927A patent/CA1248493A/en not_active Expired
- 1984-09-12 JP JP59191396A patent/JPS60138067A/ja active Pending
- 1984-09-12 NL NL8402788A patent/NL8402788A/nl not_active Application Discontinuation
- 1984-09-12 BE BE2/60494A patent/BE900558A/nl not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4874431A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-01-08 | 1973-10-06 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200063203A (ko) * | 2017-10-03 | 2020-06-04 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 한정된 자기장을 가진 아크 소스 |
| KR20200063204A (ko) * | 2017-10-03 | 2020-06-04 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 아크 소스 |
| JP2020536171A (ja) * | 2017-10-03 | 2020-12-10 | エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン | 高効率低温コーティングを行うコーティング装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4448659A (en) | 1984-05-15 |
| NL8402788A (nl) | 1985-04-01 |
| GB8422333D0 (en) | 1984-10-10 |
| DE3433166A1 (de) | 1985-03-28 |
| GB2148329B (en) | 1987-10-21 |
| FR2557151A1 (fr) | 1985-06-28 |
| GB2148329A (en) | 1985-05-30 |
| CA1248493A (en) | 1989-01-10 |
| FR2557151B1 (fr) | 1989-04-21 |
| DE3433166C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-10-25 |
| BE900558A (nl) | 1985-01-02 |
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