JPS60136311A - パターン露光装置 - Google Patents

パターン露光装置

Info

Publication number
JPS60136311A
JPS60136311A JP58243845A JP24384583A JPS60136311A JP S60136311 A JPS60136311 A JP S60136311A JP 58243845 A JP58243845 A JP 58243845A JP 24384583 A JP24384583 A JP 24384583A JP S60136311 A JPS60136311 A JP S60136311A
Authority
JP
Japan
Prior art keywords
light beam
light
wafer
angle
receiving element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58243845A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0469409B2 (enrdf_load_stackoverflow
Inventor
Tsutomu Tanaka
勉 田中
Yoshisada Oshida
良忠 押田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58243845A priority Critical patent/JPS60136311A/ja
Publication of JPS60136311A publication Critical patent/JPS60136311A/ja
Publication of JPH0469409B2 publication Critical patent/JPH0469409B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58243845A 1983-12-26 1983-12-26 パターン露光装置 Granted JPS60136311A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58243845A JPS60136311A (ja) 1983-12-26 1983-12-26 パターン露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58243845A JPS60136311A (ja) 1983-12-26 1983-12-26 パターン露光装置

Publications (2)

Publication Number Publication Date
JPS60136311A true JPS60136311A (ja) 1985-07-19
JPH0469409B2 JPH0469409B2 (enrdf_load_stackoverflow) 1992-11-06

Family

ID=17109802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58243845A Granted JPS60136311A (ja) 1983-12-26 1983-12-26 パターン露光装置

Country Status (1)

Country Link
JP (1) JPS60136311A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101112A (en) * 1980-01-16 1981-08-13 Fujitsu Ltd Exposure method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101112A (en) * 1980-01-16 1981-08-13 Fujitsu Ltd Exposure method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Also Published As

Publication number Publication date
JPH0469409B2 (enrdf_load_stackoverflow) 1992-11-06

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