JPH0469409B2 - - Google Patents

Info

Publication number
JPH0469409B2
JPH0469409B2 JP58243845A JP24384583A JPH0469409B2 JP H0469409 B2 JPH0469409 B2 JP H0469409B2 JP 58243845 A JP58243845 A JP 58243845A JP 24384583 A JP24384583 A JP 24384583A JP H0469409 B2 JPH0469409 B2 JP H0469409B2
Authority
JP
Japan
Prior art keywords
wafer
light
optical system
light beam
photoresist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58243845A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60136311A (ja
Inventor
Tsutomu Tanaka
Yoshitada Oshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58243845A priority Critical patent/JPS60136311A/ja
Publication of JPS60136311A publication Critical patent/JPS60136311A/ja
Publication of JPH0469409B2 publication Critical patent/JPH0469409B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58243845A 1983-12-26 1983-12-26 パターン露光装置 Granted JPS60136311A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58243845A JPS60136311A (ja) 1983-12-26 1983-12-26 パターン露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58243845A JPS60136311A (ja) 1983-12-26 1983-12-26 パターン露光装置

Publications (2)

Publication Number Publication Date
JPS60136311A JPS60136311A (ja) 1985-07-19
JPH0469409B2 true JPH0469409B2 (enrdf_load_stackoverflow) 1992-11-06

Family

ID=17109802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58243845A Granted JPS60136311A (ja) 1983-12-26 1983-12-26 パターン露光装置

Country Status (1)

Country Link
JP (1) JPS60136311A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101112A (en) * 1980-01-16 1981-08-13 Fujitsu Ltd Exposure method

Also Published As

Publication number Publication date
JPS60136311A (ja) 1985-07-19

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