JPS60126827A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS60126827A
JPS60126827A JP58235868A JP23586883A JPS60126827A JP S60126827 A JPS60126827 A JP S60126827A JP 58235868 A JP58235868 A JP 58235868A JP 23586883 A JP23586883 A JP 23586883A JP S60126827 A JPS60126827 A JP S60126827A
Authority
JP
Japan
Prior art keywords
electron beam
sub
deflector
mark
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58235868A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0515056B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Yasuda
洋 安田
Takayuki Miyazaki
宮崎　隆之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58235868A priority Critical patent/JPS60126827A/ja
Publication of JPS60126827A publication Critical patent/JPS60126827A/ja
Publication of JPH0515056B2 publication Critical patent/JPH0515056B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58235868A 1983-12-13 1983-12-13 電子ビ−ム露光方法 Granted JPS60126827A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58235868A JPS60126827A (ja) 1983-12-13 1983-12-13 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58235868A JPS60126827A (ja) 1983-12-13 1983-12-13 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS60126827A true JPS60126827A (ja) 1985-07-06
JPH0515056B2 JPH0515056B2 (enrdf_load_stackoverflow) 1993-02-26

Family

ID=16992435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58235868A Granted JPS60126827A (ja) 1983-12-13 1983-12-13 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS60126827A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138757A (en) * 1981-02-23 1982-08-27 Hitachi Ltd Correction of deflection distortion

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138757A (en) * 1981-02-23 1982-08-27 Hitachi Ltd Correction of deflection distortion

Also Published As

Publication number Publication date
JPH0515056B2 (enrdf_load_stackoverflow) 1993-02-26

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