JPS6234134B2 - - Google Patents

Info

Publication number
JPS6234134B2
JPS6234134B2 JP56209762A JP20976281A JPS6234134B2 JP S6234134 B2 JPS6234134 B2 JP S6234134B2 JP 56209762 A JP56209762 A JP 56209762A JP 20976281 A JP20976281 A JP 20976281A JP S6234134 B2 JPS6234134 B2 JP S6234134B2
Authority
JP
Japan
Prior art keywords
electron beam
exposure
deflection
sub
main field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56209762A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58114425A (ja
Inventor
Takayuki Myazaki
Haruo Tsuchikawa
Hiroshi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP20976281A priority Critical patent/JPS58114425A/ja
Publication of JPS58114425A publication Critical patent/JPS58114425A/ja
Publication of JPS6234134B2 publication Critical patent/JPS6234134B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP20976281A 1981-12-28 1981-12-28 電子ビ−ム露光方法 Granted JPS58114425A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20976281A JPS58114425A (ja) 1981-12-28 1981-12-28 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20976281A JPS58114425A (ja) 1981-12-28 1981-12-28 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS58114425A JPS58114425A (ja) 1983-07-07
JPS6234134B2 true JPS6234134B2 (enrdf_load_stackoverflow) 1987-07-24

Family

ID=16578204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20976281A Granted JPS58114425A (ja) 1981-12-28 1981-12-28 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS58114425A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530435U (ja) * 1991-09-27 1993-04-23 株式会社クボタ 過給機付きデイーゼルエンジンのブーストコンペンセータ
JPH0530436U (ja) * 1991-09-27 1993-04-23 株式会社クボタ 過給機付きデイーゼルエンジンのブーストコンペンセータ
US9947509B2 (en) 2015-05-27 2018-04-17 Nuflare Technology, Inc. Multiple charged particle beam lithography apparatus and multiple charged particle beam lithography method

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2553032B2 (ja) * 1985-03-19 1996-11-13 株式会社ニコン 荷電粒子ビ−ム偏向回路
JPH0713937B2 (ja) * 1985-09-18 1995-02-15 富士通株式会社 電子ビ−ム露光方法
JP5079410B2 (ja) * 2007-07-06 2012-11-21 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
JP5828610B2 (ja) * 2007-07-12 2015-12-09 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画方法および荷電粒子ビーム描画装置
JP5350523B2 (ja) * 2012-08-29 2013-11-27 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5311832A (en) * 1976-07-20 1978-02-02 Ishikawajima Harima Heavy Ind Method and device for gas cutting in continuous casting equipment
JPS5452987A (en) * 1977-10-05 1979-04-25 Fujitsu Ltd Electron beam exposure device
JPS5640244A (en) * 1979-09-11 1981-04-16 Mitsubishi Electric Corp Beam scanning correction at electron beam exposure
JPS57646A (en) * 1980-06-03 1982-01-05 Konishiroku Photo Ind Co Ltd Film type leader strip for discrimination of characteristics

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530435U (ja) * 1991-09-27 1993-04-23 株式会社クボタ 過給機付きデイーゼルエンジンのブーストコンペンセータ
JPH0530436U (ja) * 1991-09-27 1993-04-23 株式会社クボタ 過給機付きデイーゼルエンジンのブーストコンペンセータ
US9947509B2 (en) 2015-05-27 2018-04-17 Nuflare Technology, Inc. Multiple charged particle beam lithography apparatus and multiple charged particle beam lithography method

Also Published As

Publication number Publication date
JPS58114425A (ja) 1983-07-07

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