JPS60124833A - 多層回路パターン検査装置 - Google Patents
多層回路パターン検査装置Info
- Publication number
- JPS60124833A JPS60124833A JP58231363A JP23136383A JPS60124833A JP S60124833 A JPS60124833 A JP S60124833A JP 58231363 A JP58231363 A JP 58231363A JP 23136383 A JP23136383 A JP 23136383A JP S60124833 A JPS60124833 A JP S60124833A
- Authority
- JP
- Japan
- Prior art keywords
- light
- lsi
- lsi wafer
- wafer
- circuit pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58231363A JPS60124833A (ja) | 1983-12-09 | 1983-12-09 | 多層回路パターン検査装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58231363A JPS60124833A (ja) | 1983-12-09 | 1983-12-09 | 多層回路パターン検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60124833A true JPS60124833A (ja) | 1985-07-03 |
JPH0329177B2 JPH0329177B2 (enrdf_load_stackoverflow) | 1991-04-23 |
Family
ID=16922443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58231363A Granted JPS60124833A (ja) | 1983-12-09 | 1983-12-09 | 多層回路パターン検査装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60124833A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5270222A (en) * | 1990-12-31 | 1993-12-14 | Texas Instruments Incorporated | Method and apparatus for semiconductor device fabrication diagnosis and prognosis |
KR20140085325A (ko) * | 2012-12-27 | 2014-07-07 | 삼성전자주식회사 | 결함 검사 장치 및 결함 검사 방법 |
JP2015111161A (ja) * | 2015-03-17 | 2015-06-18 | 大日本印刷株式会社 | 異物検査装置、異物検査方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57208153A (en) * | 1981-06-17 | 1982-12-21 | Hitachi Ltd | Inspecting method for defective aluminum pattern of semiconductor or the like |
JPS5852335A (ja) * | 1981-09-21 | 1983-03-28 | Tokuyama Soda Co Ltd | ポリプロピレン組成物 |
-
1983
- 1983-12-09 JP JP58231363A patent/JPS60124833A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57208153A (en) * | 1981-06-17 | 1982-12-21 | Hitachi Ltd | Inspecting method for defective aluminum pattern of semiconductor or the like |
JPS5852335A (ja) * | 1981-09-21 | 1983-03-28 | Tokuyama Soda Co Ltd | ポリプロピレン組成物 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5270222A (en) * | 1990-12-31 | 1993-12-14 | Texas Instruments Incorporated | Method and apparatus for semiconductor device fabrication diagnosis and prognosis |
US5719495A (en) * | 1990-12-31 | 1998-02-17 | Texas Instruments Incorporated | Apparatus for semiconductor device fabrication diagnosis and prognosis |
KR20140085325A (ko) * | 2012-12-27 | 2014-07-07 | 삼성전자주식회사 | 결함 검사 장치 및 결함 검사 방법 |
JP2014126557A (ja) * | 2012-12-27 | 2014-07-07 | Samsung R&D Institute Japan Co Ltd | 欠陥検査装置及び欠陥検査方法 |
JP2015111161A (ja) * | 2015-03-17 | 2015-06-18 | 大日本印刷株式会社 | 異物検査装置、異物検査方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0329177B2 (enrdf_load_stackoverflow) | 1991-04-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4529366B2 (ja) | 欠陥検査装置、欠陥検査方法及びホールパターンの検査方法 | |
US8319960B2 (en) | Defect inspection system | |
JP4274572B2 (ja) | 同軸狭角暗視野照明 | |
JPS6129712A (ja) | 微細パタ−ンの欠陥検出方法及びその装置 | |
JP4591802B2 (ja) | 表面検査装置および方法 | |
JP3936959B2 (ja) | パターンの欠陥検査方法およびその装置 | |
CN116754565B (zh) | 一种光学元件全口径表面微缺陷光致荧光检测用自动对焦检测方法 | |
US20020093647A1 (en) | Surface inspection apparatus and surface inspection method | |
JPS6330570B2 (enrdf_load_stackoverflow) | ||
JPS62103548A (ja) | リ−ドフレ−ムの欠陥検査装置 | |
JP2822937B2 (ja) | 半導体装置の製造システム及び欠陥検査方法 | |
JPS62127652A (ja) | 半導体ウエハの表面欠陥検査装置 | |
JPS60124833A (ja) | 多層回路パターン検査装置 | |
JP2705764B2 (ja) | 透明ガラス基板の欠陥検出装置 | |
JP2010107465A (ja) | 欠陥検査装置及び欠陥検査方法 | |
JP2000028536A (ja) | 欠陥検査装置 | |
JP2000028535A (ja) | 欠陥検査装置 | |
JPS6342222B2 (enrdf_load_stackoverflow) | ||
JPH01173172A (ja) | パターン欠陥検査方法 | |
JP2008180601A (ja) | 基板端面検査装置 | |
JPH09218162A (ja) | 表面欠陥検査装置 | |
JPH01143904A (ja) | 薄膜検査装置 | |
JPH11326228A (ja) | 鏡面体外観検査装置 | |
JPS59178421A (ja) | 光電顕微鏡用の照明方法及び照明装置 | |
JPS6165444A (ja) | 被検査チツプの回路パタ−ン外観検査方法並びにその装置 |