JPS6010108B2 - 窒化珪素を基体上に熱分解堆積する方法 - Google Patents

窒化珪素を基体上に熱分解堆積する方法

Info

Publication number
JPS6010108B2
JPS6010108B2 JP51139391A JP13939176A JPS6010108B2 JP S6010108 B2 JPS6010108 B2 JP S6010108B2 JP 51139391 A JP51139391 A JP 51139391A JP 13939176 A JP13939176 A JP 13939176A JP S6010108 B2 JPS6010108 B2 JP S6010108B2
Authority
JP
Japan
Prior art keywords
silicon nitride
furnace
substrate
ammonia
depositing silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51139391A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5265199A (en
Inventor
ジヨン・チヤールズ・ゴールドマン
ジエームズ・ブリアン・ブライス
ラリー・ドナルド・マツクミラン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of JPS5265199A publication Critical patent/JPS5265199A/ja
Publication of JPS6010108B2 publication Critical patent/JPS6010108B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP51139391A 1975-11-25 1976-11-19 窒化珪素を基体上に熱分解堆積する方法 Expired JPS6010108B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63501275A 1975-11-25 1975-11-25
US635012 1975-11-25

Publications (2)

Publication Number Publication Date
JPS5265199A JPS5265199A (en) 1977-05-30
JPS6010108B2 true JPS6010108B2 (ja) 1985-03-15

Family

ID=24546063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51139391A Expired JPS6010108B2 (ja) 1975-11-25 1976-11-19 窒化珪素を基体上に熱分解堆積する方法

Country Status (5)

Country Link
JP (1) JPS6010108B2 (mo)
DE (1) DE2652449C2 (mo)
FR (1) FR2332802A1 (mo)
GB (1) GB1518564A (mo)
HK (1) HK881A (mo)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248706U (mo) * 1988-09-27 1990-04-04
JPH10309777A (ja) * 1997-02-10 1998-11-24 Saint Gobain Vitrage 少なくとも一つの薄層を備えた透明基材及びその製法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3118848C2 (de) * 1980-05-12 1983-05-19 Mitsubishi Denki K.K., Tokyo Niederdruck-Beschichtungsvorrichtung
GB2213836B (en) * 1987-12-18 1992-08-26 Gen Electric Co Plc Vacuum deposition process
JP2004071970A (ja) * 2002-08-08 2004-03-04 Shin Etsu Chem Co Ltd 太陽電池用シリコン基板の製造方法およびその製造システム
CN115142048B (zh) * 2022-06-30 2023-07-07 北海惠科半导体科技有限公司 晶圆载具及氮化硅介质膜的制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1251287C2 (de) * 1962-09-10 1975-10-09 United Aircraft Corporation, East Hartford, Conn. (V.St.A.) Verfahren zur herstellung von nichtporoesem siliciumnitrid
FR1521174A (fr) * 1966-05-02 1968-04-12 Siemens Ag Procédé pour réaliser une couche protectrice, notamment sur la surface d'un cristal semi-conducteur
US3549411A (en) * 1967-06-27 1970-12-22 Texas Instruments Inc Method of preparing silicon nitride films
US3652324A (en) * 1968-08-15 1972-03-28 Westinghouse Electric Corp A METHOD OF VAPOR DEPOSITING A LAYER OF Si{11 N{11 {0 ON A SILICON BASE
US3856587A (en) * 1971-03-26 1974-12-24 Co Yamazaki Kogyo Kk Method of fabricating semiconductor memory device gate
US3900597A (en) * 1973-12-19 1975-08-19 Motorola Inc System and process for deposition of polycrystalline silicon with silane in vacuum

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248706U (mo) * 1988-09-27 1990-04-04
JPH10309777A (ja) * 1997-02-10 1998-11-24 Saint Gobain Vitrage 少なくとも一つの薄層を備えた透明基材及びその製法

Also Published As

Publication number Publication date
DE2652449C2 (de) 1982-06-09
DE2652449A1 (de) 1977-05-26
HK881A (en) 1981-01-23
GB1518564A (en) 1978-07-19
FR2332802B1 (mo) 1981-12-24
FR2332802A1 (fr) 1977-06-24
JPS5265199A (en) 1977-05-30

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